1. 1 Fabrication techniques (only very brief overview) Planar waveguides –Deposited thin films sputtering deposition from solutions polymerization CVD –Diffusion –Ion exchange –Ion implantation –Carrier removal –Epitaxial growth 3D Waveguides Optical fibers

2. 2

3. 3 monolitické OIC jen hybridní OIC α < 0.3 dB/cm (vlnovod) α ~ 2 dB/cm (vlnovod) (GaInAsP 1.3/1.55 μm - „telekomunikační“ vlnové délky)

4. 4 Planar waveguides

5. 5 Sputtering e.g. plasma discharge glass, KDP, Si... vacuum (2-20).10 -3 torr inert gas

6. 6 e.g. ion bean sputtering system Sputtering

7. 7 Deposition from solutions

8. 8 Diffusion Ti film

9. 9

10. 10 Ion exchange

11. 11 Ion exchange ~ 300°

12. 12 Carrier removal free carriers reduce the index of refraction GaAs, GaP the cut-off condition is independent of wavelength

13. 13 annealing

14. 14 Epitaxial growth fabrication of monolitic optical io formed on a semiconductor substrate required bangap:

15. 15

16. 16

17. 17

18. 18 Molecular beam epitaxy (MBE) e.g. GaAlAs or GaInAsP

19. 19 3D waveguides

20. 20

21. 21

22. 22 Waveguide gratings

23. 23 Optical fibers CVD:

24. 24 1st step: preform fabrication using MCVD SiCl 4 + O 2 dopants

25. 25 2nd step: fiber drawing