1. STOICHIOMETRIC DEPOSITION OF THIN FILM FROM MULTI- COMPONENT SOLID TARGET Thanh Vu Duy 09/03/2015

2. Methods of deposition of thin film ■Physical Vapor Deposition –Sputtering –Pulse laser deposition –Thermal evaporation ■Chemical Vapor Deposition ■Atomic Layer Deposition ■Electroplating ■etc

3. Sputtering http://dx.doi.org/10.1117/1.JNP.6.061502

4. Multi-component solid target ■Using one target of a fixed composition Pros: The chemical composition of thin film and of the target will be similar. Cons: Require one target for each composition. Difficult to control the stoichiometry of Ex: Single compound solid target YBa 2 Cu 3 0 7 Al doped ZnO ■Using multiple targets: Pros: Easy to control/adjust chemical composition Cons: Composition might varied at different position on substrate. Require proper system/equipment. Ex: Reactive sputtering Y, Ba, Cu or sputtering their oxides. Reactive sputtering Al, Zn

5. Case study: Stoichiometric deposition of high temperature superconducting thin films YBa 2 Cu 3 0 7 Orlando Auciello et al, 1993

6. References ■Vivek Antad ; Lionel Simonot ; David Babonneau ; Sophie Camelio ; Frédéric Pailloux, et al. "Monitoring the reactivity of Ag nanoparticles in oxygen atmosphere by usingin situ and real-time optical spectroscopy", J. Nanophoton. 6(1), 061502 (Apr 06, 2012). ; http://dx.doi.org/10.1117/1.JNP.6.061502Vivek Antad; Lionel Simonot; David Babonneau; Sophie Camelio; Frédéric Paillouxhttp://dx.doi.org/10.1117/1.JNP.6.061502 ■Orlando Auciello, Jurgen Engenmann, “Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices”, ISBN: 978-94-011-1727-2, page 156-170 ■Sami Fransilla, Introduction to Microfabrication, 2 nd edition.