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Published byAshlee Rich Modified over 8 years ago
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Update from ALD group IN ANL Qing Peng, Anil Mane, Jeff Elam Energy System
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NEW IV MEASUREMENT METHOD With collaboration from Seon Woo Lee and Hau Wang
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Picture of pattern electrodes on the ALD film with two electrode under measurement Size of the Metal pad: 300 um, 200um, 100um, 50um Distance between the metal pad: 50um, 100 um, 200um, 400 um, 800 um, Generated by Shadow Mask Benefit: Electrical study without needs for MCPs More precise measurement system Fast rate for screening materials glass ALD film Electrode Pad
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First result of IV on MgZnO from the New Method 300 um pat size, 100 um distance 300 um pat size, 1600um distance More data are/will be collecting for systematic study of the electrical properties of Resistive materials
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Update of Synkera AAO plates
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