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Thermal Strain Effects in Germanium Thin Films on Silicon Travis Willett-Gies Nalin Fernando Stefan Zollner
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Outline Introduction Strain Calculation Technique: Spectroscopic Ellipsometry Results Future Studies
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Germanium Thoroughly studied group-IV semiconductor Many applications in space-based electronics, e.g.: High frequency transistors, solar cells, optical detectors Knowledge of the T dependence of the optical constants is vital for reliability and design Using spectroscopic ellipsometry, we can determine the optical properties of Germanium as a function of temperature and strain. http://www.livescience.com/29520-germanium.html, http://images-of-elements.com/germanium.php 3
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E1E1 E1+Δ1E1+Δ1 E0’E0’ E2E2 Ge Band Structure Bauer et al., SSC 127 (2003) Chelikowsky et al., PRB 14 (1976) Optical constants directly related to the T-dependence of electronic states. Ge on Si(100) 4
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Strained Films
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http://www.springerimages.com/Images/Physics/1-10.1007_978-3-540-47055-7_1-17 At 300 (K) Thermal expansivity α L (K -1 ) Lattice parameter (Å) Ge5.80 x 10 -6 5.6579 Si2.56 x 10 -6 5.4310 Roucka et al., PRB 81, 245214 (2010) Ge Films on Si(100) Substrate at growth temperature T g = 700 K Ge ε = 0 Dislocations T = 100 K Ge; ~2α Si; α Si Commensurate growth (Pseudomorphic) Incommensurate growth (relaxed at growth temperature) Ge on Si (100) substrate 6
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Thermal expansion mismatch of Ge and Si 7 Ge Si Reeber and Wang, Material Chemistry and Physics 46, 259 (1996)
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Strain on Ge films Grown on Si (100) Cannon et al., Appl. Phys. Lett. 84, 906 (2004) C 11, C 12 – elastic constants of Ge In-plane strain Out-of-plane strain Theoretical strain calculations Hydrostatic strain 8
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Strain on Ge films Grown on Si (100) Comparison with X-ray Diffraction 9
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Critical Point Shift due to Strain in Ge Layer “Silicon-Germanium Carbon Alloys, Growth, Properties and Applications”, S. Pantelides and S. Zollner, Chapter 12 E 1 CP energy shifts due to strain: (E 1 +∆ 1 ) CP energy shifts due to strain: ∆ 1 - spin orbit splitting (=198 meV) assumed to be constant 10
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Technique
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Instrument
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Fundamentals of Ellipsometry Measure the change in polarization state of light Transform to obtain the dielectric function or index of refraction 13 http://www.tcd.ie/Physics/Surfaces/ellipsometry2.php
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In this work we are particularly concerned with ε 1 and ε 2 from which we determine critical point parameters. Using a cryostat attachment, we measure these parameters as a function of temperature. Temperature-dependent Spectroscopic Ellipsometry E1E1 E1+Δ1E1+Δ1 E0’E0’ E2E2 Ge on Si(100) @ 300 K 14
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Instrumentation Issues Light Source Temperature Measurement 15
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Light Sources 16
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Light Sources 17
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Temperature Measurements Turbo Pump 10 -8 torr (UHV) LN2 Arm 77K Heater Control 800K Heater and built-in TC up here Second Thermocouple behind here 18
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Thermocouple Comparison Built-in thermocouple reading (K) New thermocouple reading (K) 19
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Results 20
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77 K Result from transitions with momentum along. E 1, E 1 +∆ 1 : 2D critical points CP parameters; E- energy, A- amplitude Γ- broadening, φ- phase E1E1 E1+Δ1E1+Δ1 E0’E0’ E2E2 2 nd Derivative Analysis of ε 1 and ε 2 Near E 1 and E 1 +∆ 1 21 Vina et al., PRB 30, 1979 (1984) 21
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Temperature Dependence of the CP Critical points shift to lower energies as T increases. Strain generated by thermal expansion causes a difference between Ge layer on Si and bulk Ge. E 1 +∆ 1 E1E1 E1E1 22
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Energy Difference due to Strain 23 Very small temperature dependence of spin-orbit splitting ∆ 1. Experimentally observed energy difference 6-8 meV larger than the theory. May be caused by impurities and threading dislocations.
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Summary 24 We used Spectroscopic Ellipsometry to determine the strain dependence of E 1 and E 1 +∆ 1 CP of Ge on Si. We modified the apparatus to provide a smoother, more accurate spectrum and more accurate temperature readings. Strain generated due to the thermal expansivity mismatch moves the E 1 and E 1 +∆ 1 CP to lower energies. A small difference (not due to strain) may be due to threading dislocations.
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Future Work 25 Determine the cause of the difference between bulk and film Analyze GeSn alloys to observe the effect of tin in controlling the band-gap
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Acknowledgements The New Mexico Space Grant consortium Air Force Office of Scientific Research: Grant # FA9550-13-1-0022 The ellipsometry group under Dr. Stefan Zollner
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Thank You!
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