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Strategies for Future Laser Plasma Accelerators J. Faure, Y. Glinec, A. Lifschitz, A. Norlin, C. Rechatin, & V.Malka Laboratoire d’Optique Appliquée ENSTA-Ecole Polytechnique, CNRS 91761 Palaiseau, FRANCE LOA Partially supported by CARE/PHIN FP6 project
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Summary Part 1 : Laser plasma accelerator : motivation Part 2 : Laser plasma accelerator as booster Part 3 : Laser Plasma accelerator as injector : Production of monoenergetic electron beam Part 4 : New scheme of injection : toward a stable, tuneable and quasi monoenergetic electron beam. Part 5 : Applications Part 6 :Conclusion and perspectives LOA
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Plasma cavity 100 m 1 m RF cavity Courtesy of W. Mori & L. da Silva E-field max ≈ few 10 MeV /meter (Breakdown) R>R min Synchrotron radiation Classical accelerator limitations
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Tajima&Dawson, PRL79 How to excite Relativistic Plasma waves ? laser ≈ T p / 2 = >Short laser pulse Laser pulse F≈-grad I Electron density perturbation Phase velocity v epw =v g laser => close to c Analogy with a boat The laser wake field ez nE~ Are Relativistic Plasma waves efficient ? E z = 0.3 GV/m for 1 % Density Perturbation at 10 17 cc -1 E z = 300 GV/m for 100 % Density Perturbation at 10 19 cc -1 Tajima and Dawson, PRL (1979) LOA
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Interaction and dephasing lenghts L acc. = Z R Diffraction limited W diff. [MeV] 580 ( / p )/(1+a 0 2 /2) 1/2 P [TW] W ch [MeV] 60 ( p /w 0 ) P [TW] L acc Guiding : channel or relativistic W. P. Leemans et al., IEEE 24, 2 (1996) electron t 1 t 2 t 3 e >> >> 1=> L deph. =(=( 0 /2)(n c /n e ) 3/2 L Deph. = p 2 LOA
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Summary Part 1 : Laser plasma accelerator : motivation Part 2 : Laser plasma accelerator as booster : Part 3: Laser Plasma accelerator as injector : Production of monoenergetic electron beam Part 4 : New scheme of injection : toward a stable, tuneable and quasi monoenergetic electron beam. Part 5 : Applications Part 6 :Conclusion and perspectives LOA
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Small Laser amplitude a 0 =0.5 Homogeneous plasma Accelerating & focusing fields in Linear RPW Electron density Pulse Defocusing EzEz ErEr Focusing Accelerating Decelerating LOA
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Small Laser amplitude a 0 =0.5 Parabolic plasma channel Accelerating & focusing fields in plasma channel Electron density Pulse Focusing Defocusing Accelerating Decelerating Pulse EzEz ErEr LOA
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Focusing Defocusing Accelerating Decelerating Large Laser amplitude a 0 =2 Homogeneous plasma Accelerating & focusing fields in NL RPW Electron density Pulse relativistic shift of p LOA
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Three Injection schemes Before the pulse Low energy laser Low energy => Low charge High Energy => Short Bunch LOA
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bunch = 200 fs LOA
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Injecting the LOA e-beam @ bunch = 30 fs, 170 MeV LOA
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E=9 J P= 0.15 PW a 0 =1.5 Parabolic channel: r 0 =47 m, n(r)=n 0 (1+0.585 r/r 0 ) n 0 = 1.1×10 17 cm -3 3 GeV, 1% energy spread e-beam 3.5 GeV, with a relative energy spread FWHM of 1% and an unnormalized emittance of 0.006 mm. LOA
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Summary Part 1 : Laser plasma accelerator : motivation Part 2 : Laser plasma accelerator as booster : Part 3: Laser Plasma accelerator as injector : Production of monoenergetic electron beam Part 4 : New scheme of injection : toward a stable, tuneable and quasi monoenergetic electron beam. Part 5 : Applications Part 6 :Conclusion and perspectives LOA
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Laser plasma injector Scheme of principle Experimental set up LOA
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Charge in the peak : 200-300 pC Energy distribution improvements: The Bubble regime PIC Experiment Divergence = 6 mrad At LOA J. Faure et al. Nature (2004) LOA
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Quasi-monoenergetic beams reported in the litterature Name Article Lab EnergydE/EChargeNe Intensity L /T p Remark [MeV][%] [pC] ManglesNature (2004)RAL73622202,51,6 GeddesNature (2004)L'OASIS86232019112,2Channel FaureNature (2004)LOA17025500630,7 HiddingPRL (2006)JETI4790,3240504,6 HsiehPRL (2006)IAMS55336402,6 HosokaiPRE (2006)U. Tokyo11,510 80223,0Preplasma MiuraAPL (2005)AIST720432E-613055,1 HafzPRE (2006)KERI4,39320028133,4 MoriArXiv (2006)JAERI20240,8500,94,5 ManglesPRL (2006)Lund LC15020 51,4 [x10 18 /cm 3 ][x10 18 W/cm 2 ] Several groups have obtained quasi monoenergetic e beam but at higher density ( L > p ) LOA
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310-μm-diameter channel capillary P = 40 TW density 4.3×10 18 cm −3. GeV electron beams from a « centimetre-scale » accelerator Leemans et al., Nature Physics, september 2006 LOA
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After 5 Z r / 7.5 mm 0 0.5 1 1.5 2 2.5 800120016002000 Energy (MeV) f(E) (a.u.) w 0 20 m 30fs a 0 4 0.8 m P 200TW n p 1.5 × 10 18 cm 3 Courtesy of UCLA& Golp groups Laser plasma injector : GeV electron beams LOA
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Laser plasma injector : + good efficiency : E e-beam /E laser 10 % + simple device + with channel : GeV range is obtained 1 with moderate laser power * But since the efficiency is conserved a compromise between charge and energy must be found -Stability has been recently improved ! - Energy spread still too large for some applications : E/E few % LOA
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Summary Part 1 : Laser plasma accelerator : motivation Part 2 : Laser plasma accelerator as booster : Part 3: Laser Plasma accelerator as injector : Production of monoenergetic electron beam Part 4 : New scheme of injection : toward a stable, tuneable and quasi monoenergetic electron beam. Part 5 : Applications Part 6 :Conclusion and perspectives LOA
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Controlling the injection E. Esarey et al, PRL 79, 2682 (1997), G. Fubiani et al. (PRE 2004) Counter-propagating geometry: pump injection Plasma wave Principle: Pump beam Injection beam Ponderomotive force of beatwave: F p ~ 2a 0 a 1 /λ 0 (a 0 et a 1 can be “weak”) y Boost electrons locally and injects them: y INJECTION IS LOCAL IN FIRST BUCKET y electrons LOA
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Colliding pulse injection scheme: mechanism Plasma wave Electron motion Beatwave Buckets at 0 /2 p z =2mc(a 0 a 1 ) 1/2 Buckets at l p
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Experimental set-up Injection beam Pump beam Probe beam LANEX B Field 250 mJ, 30 fs fwhm =30 µm I ~ 4×10 17 W/cm 2 a 1 =0.4 700 mJ, 30 fs, fwhm =16 µm I ~ 3×10 18 W/cm 2 a 0 =1.2 electron spectrometer to shadowgraphy diagnostic Gas jet LOA
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Aligning the beams with shadowgraphy LOA
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PUMP BEAM INJECTION BEAM Synchronizing the beams with shadowgraphy pumpinjection Probe beam LOA
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From self-injection to external injection n e =1.25×10 19 cm -3 n e =10 19 cm -3 n e =7.5 × 10 18 cm -3 pump Single beam pump injection 2 beams Self-injection Threshold n e =7.5 × 10 18 cm -3 LOA
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Laser stability Pump pulse: I=3.4×10 18 +/- 0.2×10 18 W/cm 2 (RMS=5.5 %) Injection pulse: I=4.4×10 17 +/- 0.27×10 17 W/cm 2 (RMS=6.1 %) To camera 90° angle prisme LOA
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Stability of laser beam pointing Worse case Dx=10 µm Injection beam Pump beam RMS case Dx=5 µm LOA
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Optical injection by colliding pulses leads to stable monoenergetic beams STATISTICS value and standard deviation *Charge measurements with absolute calibration of Lanex film (ICT gave a factor of 8 higher charge) LOA Bunch charge= 19 +/- 6 pC Peak energy= 117 +/- 7 MeV DE= 13 +/- 2.5 MeV DE/E= 11 % +/- 2 % Divergence= 5.7 +/- 2 mrad Pointing stability= 2 mrad
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Monoenergetic bunch appears when Lasers are overlapped LOA
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Parallel polarization Crossed polarization Monoenergetic bunch comes from colliding pulses: polarization test LOA
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Controlling the bunch energy by controlling the acceleration length By changing delay between pulses: Change collision point Change effective acceleration length Tune bunch energy Pump beam Injection beam Gas jet 2 mm LOA
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Tunable monoenergetic bunches pump injection pump injection late injection early injection pump injection middle injection Z inj =225 μm Z inj =125 μm Z inj =25 μm Z inj =-75 μm Z inj =-175 μm Z inj =-275 μm Z inj =-375 μm LOA J. Faure et al., Nature 2006
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Tunable monoenergetic electrons bunches: 190 MeV gain in 700 µm: E=270 GV/m Compare with E max =mc p /e=250 GV/m at n e =7.5×10 18 cm -3 LOA
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Part 1 : Laser plasma accelerator : motivation Part 2 : Laser plasma accelerator as booster Part 3 : Laser Plasma accelerator as injector : Production of monoenergetic electron beam Part 4 : New scheme of injection : toward a stable, tuneable and quasi monoenergetic electron beam. Part 5 : Applications Part 6 :Conclusion and perspectives Summary LOA
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In collaboration with CEA / DAM Material science: -ray radiography High resolution radiography of dense object with a low divergence, point-like electron source Glinec et al., PRL 94 025003 (2005) LOA
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-radiography results 20mm Cut of the object in 3D Spherical hollow object in tungsten with sinusoidal structures etched on the inner part. Measured Calculated Source size estimation : 450 um Glinec et al., PRL 94 025003 (2005) LOA
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Particle beam in medicine : Radiotherapy 99% Radiotherapy with X ray LOA
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Radiation Therapy : context Depth in tissue Photon dose Photon beams are commonly used for radiation therapy tumor Photon beam Dose LOA
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Medical application : Radiotherapy VHE ELECTRONS LOA
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VHE Radiation Therapy Depth in tissue VHE dose l Reduced dose in save cells l Deep traitement l Good lateral contrast tumor VHE Dose LOA
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Monte Carlo simulation of the dose deposition in water Electron gun : quasi-monoenergetic (170MeV) with 0.5nC and 10mrad divergence Water target : 40cm x 4cm x 4cm divided in 100 pixels in all directions. Simulation parameters : CutRange=100um and N 0 =10 5 electrons In collaboration with DKFZ LOA
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Dose deposition profile in water Glinec et al., Med. Phys. 33, 1 (2006) O.P. LOA
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Fudamental aspect : fs radiolysis H 2 O (e - s, OH., H 2 O 2, H 3 O +, H 2, H. ) e-e- Very important for: Biology Ionising radiations effects B. Brozek-Pluska et al., Radiation and Chemistry, 72, 149-159 (2005) **Ar. LOA
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Compact XFEL: towards a bright X ray source Applications: study of complex structures (X-ray diffraction, EXAFS) But ps time scale <ps ~ rad 10cm LOA Reduction of accelerator Reduction of the undulator
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Conclusions / perspectives SUMMARY Optical injection by colliding pulse: it works ! Monoenergetic beams trapped in first bucket Enhances dramatically stability Energy is tunable: 15-300 MeV Charge up to 80 pC in monoenergetic bunch E/E down to 5 % (spectrometer resolution), E ~ 10-20 MeV Duration shorter than 10 fs. PERSPECTIVES Q Combine with waveguide: tunable up to few GeV’s with E/E ~ 1 % Design future accelerators Model the problem for further optimization: higher charge Stable source: extremely important accelerator development (laser based accelerator design) light source development for XFEL applications (chemistry, radiotherapy, material science) LOA
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