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Published byRosamond Lester Modified over 8 years ago
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Fig. 4 from Material and device engineering in fully depleted silicon-on-insulator transistors to realize a steep subthreshold swing using negative capacitance (Image 1 of 3) Hiroyuki Ota et al 2016 Jpn. J. Appl. Phys. 55 08PD01 doi:10.7567/JJAP.55.08PD01
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Fig. 4 from Material and device engineering in fully depleted silicon-on-insulator transistors to realize a steep subthreshold swing using negative capacitance (Image 2 of 3) Hiroyuki Ota et al 2016 Jpn. J. Appl. Phys. 55 08PD01 doi:10.7567/JJAP.55.08PD01
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Fig. 4 from Material and device engineering in fully depleted silicon-on-insulator transistors to realize a steep subthreshold swing using negative capacitance (Image 3 of 3) Hiroyuki Ota et al 2016 Jpn. J. Appl. Phys. 55 08PD01 doi:10.7567/JJAP.55.08PD01
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