1. National Nanofabrication Centre Centre for Nano Science and Engineering IISc, Bangalore, India Cleanroom Admin Committee Meeting Prabhakara Rao March 10, 2016

2.  January month charges o 169 Users - Total charges at a high of 35.4 L o 20 NON-MITO users (Paid Users) - Total charges of 1.3L o 149 MITO084 users - Total charges of 34.1 L o 110 users from CeNSE - Total charges of 29.8 L CeNSE users charged 87% of total value Reports

3. DataApril- 15 May- 15 June- 15 July- 15 Aug- 15 Sep- 15 Oct- 15 Nov-15Dec-15Jan-16 Total Users 97110120103113122151179146169 MITO084 users 799195808793122159128149 Non-MITO Users 181925232629 201820 Total users from CeNSE 556360526164768590110 Total charges for MITO084 18.75 L 15.5 L22.25 L 22.47 L 22.18 L 25.7 L27.3 L33.7 L22.6 L34.1 L Total charges for Paid users 2.3 L1.86 L2.5 L2.95 L3.54 L4 L3L1.5 L1.9 L1.3 L

4. April 2015 - Nov 2015 - INUP project Status Summary completed 32 Scheduled 2 Pending 40

5. Responsibilities and expectations from a Facility Technologist FT should involve in maintaining the equipment assigned in running condition to ensure maximum availability to user and take care of preventive and breakdown maintenance FT shall standardization, optimization, periodic monitoring, troubleshooting process and equipment. FT shall take necessary steps for housekeeping of the tools/area/safety protocols for the tools as well as the bay. FT shall support process requests by dependent/independent users, projects, lab course/services etc. FT shall support equipment and process training to users and customers. FT shall participate in continuous improvement programs to improve process and equipment capability and quality. FT shall create and maintain details documentation related to all the responsibilities stated above FT shall manage the user reservation on the equipment and to support the users as needed in operating the equipment. FT shall plan the quantity of consumable spares and materials required to achieve the above objectives and report to logistics support. FT shall support and maintain good relation with the users of the NNfC. FT shall attend technical work assigned by the immediate manager related to NNfC & CeNSE. FT shall conduct themselves honourably, responsibly, ethically, and lawfully so as to enhance the honour, reputation, and usefulness of the profession. FT shall not reveal facts, data, or information without the prior consent of the reporting manager. FT having knowledge of any alleged violation of Code shall report immediately to the reporting manager. Failing to do so will be considered as a violation of Code.

6. Responsibilities and expectations from a Process Integration: 1.PI is responsible for defining a process flow and take necessary action to develop fabrication processes and integrate the process required in executing a project request from an internal or external customers. 2.PI is responsible for the execution of a project/process/service and coordinating the efforts to assure the task /module achieves the required performance within project timelines. 3.PI shall provide the lead role in understanding the requirements of the customer and convert them into technical and process specification to the execution team (FTs, SFTs, and managers). 4.PI shall discuss with managers, COO and if required with faculty to make a feasibility study and estimate the efforts in executing a project/process/service. 5.PI shall design and execute experiments to improve yield and performance through quality control of procedures and processes. 6.PI may execute the project with FTs and SFTs. PI will primarily involve in qualifying the process. 7.PI shall drive cross-functional teams to address module deficiencies and yield failure. 8.PI shall maintain absolute confidentiality of information related to a project. 9.PI shall keep the team and management updated on the status of the projects and maintain detailed documentation. 10.PI shall provide actionable feedback to the team members and management on how to improve the efficiency of the team and execution process. 11.PI shall take additional responsibility related to NNFC or CeNSE assigned by the reporting manager and COO. 12.PI shall conduct themselves honourably, responsibly, ethically, and lawfully so as to enhance the honour, reputation, and usefulness of the profession. 13.PI shall not reveal facts, data, or information without the prior consent of the reporting manager. 14.PI having knowledge of any alleged violation of Code shall report immediately to the reporting manager. Failing to do so will be considered as a violation of Code.

7. Responsibilities and expectations from a Senior Facility Technologist:  SFT should involve in maintaining the equipment assigned in running condition to ensure maximum availability to user and take care of preventive and breakdown maintenance.  SFT shall standardization, optimization, periodic monitoring, troubleshooting process and equipment.  SFT shall be assigned to take responsibility of more than one equipment.  SFT shall take necessary steps for housekeeping of the tools/area/safety protocols for the tools as well as the bay.  SFT shall support process requests by dependent/independent users, projects, lab course/services etc.  SFT shall provide raining to FTs and encourage collaborative culture among the bay and team members.  SFT shall support equipment and process training to users and customers.  SFT shall participate in continuous improvement programs to improve process and equipment capability and quality.  SFT shall create and maintain details documentation related to all the responsibilities stated above.  SFT shall manage the user reservation on the equipment and to support the users as needed in operating the equipment.  SFT shall plan the quantity of consumable spares and materials required to achieve the above objectives and report to logistics support.  SFT shall support and maintain good relation with the users of the NNfC.  SFT shall attend technical work assigned by the immediate manager related to NNfC & CeNSE.  SFT shall take the bay responsibility in the absence of the manager.  SFT shall conduct themselves honourably, responsibly, ethically, and lawfully so as to enhance the honour, reputation, and usefulness of the profession.  SFT shall not reveal facts, data, or information without the prior consent of the reporting manager.  SFT having knowledge of any alleged violation of Code shall report immediately to the reporting manager. Failing to do so will be considered as a violation of Code.

8. Inplant chemical safety training was conducted on March 8th,2016 by National Safety Council Karnataka Chapter Total No of Participants: 43 from NNfC, PV lab & Utilities

9. Minutes of the Last Meeting-Feb 9 th,2016  Invoice Procedure is required.  Feedback form has to be circulated for the external projects and courses.  Bay wise expenditure is required  CeNSE faculty funds should be linked to the monthly invoice.  An additional check box should be included in the wafer request form whether the wafer is taken outside or inside the cleanroom and arrangements to be made to store silicon wafers inside.  Course for Contamination Procedure should be conducted.  Quotations/invoices/formalities of External projects has to go through INUP office.

10. Invoice Procedure  FOM Data and manual data(tech port sputter coater,E-beam,mask writer) are combined and uploaded in MNCF_app.exe so that an excel sheet will be generated. In that excel sheet, I need to mention MITO & Non-MITO users and then upload in http://sysef.iisc.ernet.in/nnfc/admin/ So that word document will be generated & e-mail will be sent automatically to all the users in the following formathttp://sysef.iisc.ernet.in/nnfc/admin/  E-mail for Non MITO users  PFA the cleanroom equipment invoice for the month of January, 2016. Please take a print out of the same, get it signed from your guide and return it back to me by February 11th, 2016 i.e. (Thursday) without fail. http://sysef.iisc.ernet.in/nnfc/admin/invoice_print.php?ref=".$refidhttp://sysef.iisc.ernet.in/nnfc/admin/invoice_print.php?ref=".$refid.“  Note: Kindly check once with your respective supervisor for the debit head mentioned in the invoice & please do mention it if it's blank before taking the printout & submitting the invoice in my office.  E-mail for MITO 084 users PFA the cleanroom equipment invoice for the month of January, 2016. http://sysef.iisc.ernet.in/nnfc/admin/invoice_print.php?ref=".$refid http://sysef.iisc.ernet.in/nnfc/admin/invoice_print.php?ref=".$refid.  Once the invoice is received from the user with professor's Signature and proper debit head i will prepare a cover letter & send it to the chairman for signature.Once its back from the signature I will prepare summary and will send it to the schemes for processing through Manjula (INUP) she will follow it up.

11. Bay Wise Budget  Dry Etch & Thin Films : Rs.1,62,88,467  Wet Bench & diffusion : Rs.74,13,866  Lithography : Rs.3,54,74,941  Utility : Rs.3,05,71,014

12. Sl.no OrganizationProject/Services Amount in Rs 1. SITAR Bangalore Gold Evaporation2,00,000 2. TIFRMicrofluidics SU8 master22,000 3. Delhi University DRIE work91,000 External Projects/Services Completed Upto Nov,2015 Total Amount – Rs. 3,13,000

13. Penalty Points (Nov-2015-Jan- 2016) 1 4/11/ 2015 Amiya BanrejeeGraduate Prof.Srin ivas Vasu Raghava nCeNSE15 Violation of wet bench Protocols 2 9/11/ 2015 Sandeep vuraGraduate Prof.Srin ivas Vasu Raghava nCeNSE15 Violation of protocols Removed the access from cleanroom (9thNov-15 thNov) 3 10/11 /2015 Nivedita BasuGraduate Prof. Navakan ta Bhat CeNSE15 Not Switching off the tools 4 23/11 /2015 Vineet Kumar SinghPHD Student Prof. Sushobh an AvasthiCeNSE3060 For not wearing goggles and using without booking slot. Removed the access from cleanroom( 23rd Nov- 29th Nov2015) 5 26/11 /2015 Vishal Baloria Prof. Navakan ta Bhat CeNSE30 Violation of Protocols Removed the access from cleanroom (26thNov - 9thDec 2015) 6 27/11 /2015 Nithin Bhandari Prof.KN BhatCeNSE15 Not using goggles in litho wet benches 1DateNameDesignation Professor Departmen t Penalty points Cumulative Points Remarks Suspension Status

14. Penalty Points S.NoDateNameDesignationProf.Department Penalty Points Cumulative Points Remarks Suspension Status 7 27/11 /2015AnushreeT.SrinivasECE15 Not using goggles in litho wet benches 8 27/11 /2015 Debadrita PariaGraduate Dr.Ambaris h GhoshPhysics15 Not using goggles in litho wet benches 9 27/11 /2015 Nayana rameshPost Doc Prof.Sriniva s vasuCeNSE15 For not wearing goggle in litho wet bench 10 27/11 /2015 Anumitra Sil Prof.Anil kumarPhysics15 For not wearing goggle in litho wet bench 11 30/11 /2015 Samatha BenedictPhD Student Prof.Navan kanta BhatCeNSE1535 For not wearing goggle in litho wet bench 12 30/11 /2015 Ajay DangiGraduate Prof.Rudra PratapCeNSE15115 For not wearing goggle in litho wet bench

15. Penalty Points S. No DateNameDesignationProf. Depar tment Penalty Points Cumulative Points Remarks Suspension Status 13 1/12/ 2015 Samatha BenedictPhD Student Prof.Navankan ta BhatCeNSE1550 For not wearing goggle in litho wet bench Removed the access from cleanroom(1st Dec-7th Dec) 14 1/12/ 2015 Chandan KumarGraduate Prof.Anindya das Physic s15 For not wearing goggle in litho wet bench 15 3/12/ 2015 Nalla SomaiahGraduate Prof.Praveen kumar Materi als Engine ering15 For not wearing goggle in litho wet bench 16 4/12/ 2015 Swanand SolankeGraduate Prof.Digbijoy Nath Physic s15 For not wearing goggle in litho wet bench 17 5/1/2 016 Chandan SamathaGraduate Prof.Akshay Naik Physic s15 For not wearing goggle in litho wet bench 18 5/1/2 016 Parames hwarGraduate Prof.Akshay NaikCeNSE15 For not wearing goggle in litho wet bench

16. Penalty Points S.NoDateNameDesignationProf. Departme nt Penalt y Points Cumulative Points Remarks Suspension Status 446/1/2016 Jafar hasanPost Doc Prof.Kaushik Chaterjee Material Engineering15 For not wearing goggle in litho wet bench 456/1/2016 Swapnil MoreGraduateProf.Akshay NaikCeNSE15 For not wearing goggle in litho wet bench 46 11/1/201 6 Meera GarudGraduate Prof. Rudra PratapCeNSE15 Violation of Protocols 47 25/1/201 6 Ajay DangiGraduateProf.Rudra PratapCeNSE1530 Failed to follow standard operating procedures while handling spin coater. Independent status of spin coater is suspended for two weeks from 25 th jan,2016 to 7 th feb 2016. 48 25/1/201 6 Anisha KalraGraduate Prof.Digbijoy NathCeNSE15 Failed to cleanup equipment work space after the slot Independent status is suspended 49 27/1/201 6 Awanash PandyGraduate Prof.Shankar K SelvarajaCeNSE15 For not wearing the goggles in litho wet bench. 50 18/2/201 6 Richa MithraPhD StudentProf.Anindya dasPhysics1525 For not wearing the goggles in litho wet bench. 51 29/2/201 6 Sandip MondalStudent Prof.Venkatarama nPhysics3045 clean room access is suspended for a week from 29 th Feb to 6 th Mar 2016.

17. Lithography Bay 10 th March, 2016 Equipment's: Laser writer, MicroTech Laser writer, Heidelberg EVG Mask aligner MJB4 mask aligner EVG Bonder E‐Line system Pioneer E‐beam system Gopal

19. Raith Systems Utilization Chart – February-2016

20. Furnaces and wet benches Savitha P

22. Furnace - Updates  LPCVD PolySi/Ge (MOS clean) tube partially down: doping gases unavailable  PLC problem, PLC ordered, available, bottle neck is IISc ordering system  Would like to propose that we run 1 micron oxide only on Tuesdays  Thermocouples changed 3 times last time, due to long high temperature process  Waste of gases, thermocouple and electrical energy: sometime 1 wafer only loaded  Batch process can be done and the wafers cleaned just before the next process

23. LPCVD maintenance  Temperature drift rectified  New quartzware installed for all tubes  Managed to clean SiN, SiO2 quartzwares  PolySi tubes still getting cleaned  Exhaust maintenance could not be done due to spare parts failing leak tests (Nanoclean)  TEOS trap waiting to be fixed

24. Dry Etch & Thin films & Process Integration March 10 th,2016 Sunanda Babu

25. Equipment Utilization Dry Etch

26. Equipment Utilization Thin Films & PV lab

27. Equipment Downtime  PECVD Downtime  LL pump failure. Bearings faulty.  Initial containment was a replacement pump from Prof. Akshay Naik’s lab.  Pfeiffer service engineer inspected the pump, recommended replacement of bearings which was to be done at Hyderabad,  Raghu & Mirji inspected, bought bearings locally and replaced them. Pump was connected back to PECVD tool. Past 1 week of monitoring shows no issues.  Suspect previous wafer breakages might have caused pump to fail. Filter traps to be installed in the bellows before pump inlet. Proper clean-up to be done after any wafer breakage.N2 purge to be connected to all Pfeiffer LL pumps in dry etch bay.ECD end Apr’16.  Order placed for 2 new Pfeiffer pumps. RIE-Cl LL pump to be brought back from Hyderabad and local repair option to be explored.  Techport Sputter Downtime  Malfunctioning pressure gauges ( full range Penning gauge), stuck at 10E-3 torr.  Pfeiffer service engineer inspected, initial clean up did not help.  Replaced the ignition aid and Pirani element, gauge now working satisfactorily.  Sputter 2 was temporarily down ( swapped gauge to Sputter 1 system which is highly utilized)  Order placed for new Full Range Pirani Gauge ( Spare)

28. Equipment Utilization Dry etch

29. Equipment Utilization Thin Films

30. INUP External Projects Status Stage IV- NNfC Fabrication

31. INUP External Project Status(Feb’16) ProjectPI OwnerStart Date ECD Mask Layers Status CP_2002_TWT SWS Owner: Siva Bkup:Sabiha Jun’15May’1621.First prototype device handed over to customer on 15 Dec’2015. 2.Met dimensional requirements set by customer. 3.Communicated to customer that CeNSE will work on any fine tuning, if required.( based on testing results feedback). CP_2001_Acceler ometer Owner: Siva Bkup:Sabiha Oct’15Mar’1671.Fabrication on customer wafers started. 2.Hermetic seal :Revert back to IITB regarding the film thickness measurement issues.

32. INUP External Project Status(Feb’16) ProjectPI OwnerStart Date ECD Mask Layers Status CP_2004_microh eater Owner: Sabiha Bkup:Siva Aug’12continu ous 5User has been requested to update all their required process specifications into a single document and provide the same to PI team, NNfC. User has also been asked for a NDA. CP_1006_Micron eedles Owner: Sabiha Bkup:Siva Jul’14continu ous 24” DSP wafers available, pending customer feedback on requirement. CP_1007_Graphe ne FET Owner: SangeethJan’16Feb’164Samples handed over to User(8 th Feb, 2016) for Terahertz testing at TIFR,Mumbai. Customer feedback that results are good.

33. INUP External Project Status(Feb’16) ProjectOwner / Back upStart Date ECD Mask Layers Status CP_2006_Collab oration with SCL Chandigarh Owner: Suresh/Chandra Mar’16May’16NAHfO2,Ta2O5, B doped a-Si, ITO optimizations( thin film, litho, etch) and MNCF characterization. Optical requirements and thickness provided by user. Film Optimization work initiated.

34. INUP External Projects Status Stage II- Design

35. Project Status(Feb’16) ProjectPI Owner WhenMask Layers Status CP_1001_Pressure sensor Owner: Siva Bkup:Sabiha Feb’168Feasible, Process estimate provided. Design and Verification process started on 8 th Feb, 2016. Awaiting design freeze from user end. CP_1003_MicrofluidicsOwner: Sabiha Bkup: Siva Feb’161 or 2Design discussions done, awaiting user feedback on mask writing method:or direct write process.

36. Thank you