1. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. (a) Traditional simplified lithographic system showing components considered in OPC modeling. (b) Required lithographic system components for 45 and 32nm including apodization filter and pellicle transmission effects. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

2. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Measured transmission and transmission predicted by ideal Gaussian model. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

3. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD through-pitch curves for 60-, 50-, 80-, and 100-nm lines generated from the OPC and traditional simulators for the nominal condition (no apodization transmission data). Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

4. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD through-pitch curves for 60-, 50-, 80-, and 100-nm lines generated from traditional lithography simulator for the nominal case (no apodization data coded in) and apodization case (with apodization data hard-coded in). Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

5. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. The measured and empirically fitted (using enhanced Gaussian model) pupil attenuation due to apodization effect. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

6. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD through-pitch curves for 60-nm lines generated from the OPC and traditional simulators for apodization case (OPC simulator uses enhanced Gaussian model). Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

7. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Delta CD through-pitch curves for 60-nm lines generated from the OPC and traditional simulators for apodization case (OPC simulator uses enhanced Gaussian model). Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

8. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD through-pitch curves for 60-, 50-, 80-, and 100-nm lines generated from the OPC and traditional simulators for apodization case (OPC simulator uses trapezoidal filter apodization model). Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

9. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Delta CD through-pitch curves for 60-, 50-, 80-, and 100-nm lines generated from the OPC and traditional simulators for apodization case (OPC uses trapezoidal filter apodization model). Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

10. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD through-pitch curves for 45-nm lines generated from OPC simulator (1.30 NA) for nominal case (no apodization data) and apodization case (with trapezoidal apodization model). Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

11. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Transmission through a traditional 193-nm organic pellicle vs. incident angle for the S (TE), P (TM), and average (unpolarized) polarization states. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

12. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Impact of incident light angle upon path length and reflectivity in a thin organic pellicle is shown. The optimal thickness for normally and non-normally incident light is different by a factor of cos α, where α is the angle of incidence upon the pellicle. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

13. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Pellicle (amplitude) transmission vs. ρ (normalized to 1.30NA) for measured, ideal Gaussian model and enhanced Gaussian model at 32-nm generation. Only a fair fit is observed for fitted ideal Gaussian value and excellent fit is observed for fitted enhanced Gaussian model. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

14. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD through-pitch curves generated for nominal case and pellicle case using enhanced Gaussian model and trapezoidal filter model. Mask CD is constant at 45nm. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

15. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD through-pitch curves generated for nominal case and case with both lens apodization and pellicle-induced transmission losses. Mask CD is constant at 45nm. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

16. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD fitting residual of a 45-nm active layer OPC model using traditional apodization model. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

17. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. CD fitting residual of a 45-nm active layer OPC model using the proposed enhanced Gaussian model. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418

18. Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Graphic and mathematical representation of a 2-D trapezoidal filter. Figure Legend: From: Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32nm J. Micro/Nanolith. MEMS MOEMS. 2007;6(3):031003-031003-11. doi:10.1117/1.2783418