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Published byLeslie Glenn Modified over 8 years ago
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Specular reflectivity and off-specular scattering
Tools for roughness investigation Hugues Guerault 15/12/2000
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Outline Introduction Flat surface/interface - Dynamical theory
Layer thickness and electronic density determination Rough surface/interface - Kinematical theory Roughness and diffuseness (Non-)periodic roughness Differential cross-section Correlation lengths Investigation geometries Specular reflectivity (specular scan) Off-specular scattering (longitudinal, transverse and detector scans) Conclusions
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Introduction Increasing ability to structure solids in 1, 2 or 3D at nanoscopic scale Mesoscopic layered superstructures (multilayers, superlattices, layered gratings, quantum wires –and dots) Perfection depends on Perfection of the superstructure (grating shape, periodicity, layer thickness) Interface quality (roughness, interdiffusion) Crystalline properties (strain, defects, mosaicity,…) Roughness affects the physical behavior of interfaces Optical : reduces the specular reflectivity – creates diffuse scattering Magnetic : changes the interface magnetization Electronic : disturbs the band structure in semiconductor devices (resistivity)
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Dynamical Theory Electric field in layer p
Substrate N p+1 p 2 1 0 Air (n=1) ZS Zp hn - + kn Through the layer p (Tp : Translation Matrix) At p,p+1 interface (Rp,p+1 : Refraction Matrix ; pp, mp Fresnel coef.) Transfer Matrix [M]ij M=R01T1R12……………TN-1RNN-1TNRNS Reflection coefficient r=M12/M22 Absolute Reflectivity R=r.r* Transmission coefficient t=1/M22
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N=1 , N=2 Single Layer Bilayer 2 oscillation frequencies are evidenced
R=r.r* max. each time As Then (Kiessig fringes) Cu thickness CuO2 thickness For <c Total external reflection For p=0, =c leading to el via Bilayer 2 oscillation frequencies are evidenced
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Kinematical Theory Rough interfaces Dynamical theory not appropriated anymore Born approximations No multiple reflections No refraction R function of d/dz Substrate 100 A 300 A TF-1 Disturbance of el at interface
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Interface disturbance
What kind of disturbance ? Rough interface Diffuse interface 2 Diffuseness / Graded interface Graded composition (electronic density) from j to i layer with l steps
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Differential cross-section
kin ksc Q q//(x,y) qz Um+1(x,y) Um (x,y) Um (x’,y’) hmideal zm+1 zm Q qz If Then Differential cross-section (detected intensity) depends on p(W=Um(x,y)) (Height distribution at interfaces)
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Periodic Roughness Flat substrate Discrete Height Distribution D
Pure specular Discrete Height Distribution Kiessig fringes function of D U1 U2 D
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Non-periodic Roughness
Random Height Distribution Gaussian height distribution Height-Height correlation function Two contributions Specular contribution observed in the specular direction Diffuse contribution observed when Q(x,y)0 +
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Correlation Lengths Height-Height correlation function
where h : roughness exponent : lateral correlation length Increasing and decreasing roughness in periodic multilayers : vertical correlation length No Increasing Partial Identical replication roughness replication replication
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Specular reflectivity
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Off-specular (diffuse) scattering
inaccessible q-area rocking curve 2q=1.5 detector scan w=0.9 Transverse scan (Rocking curve) at 2=2º Si layer (64 nm) on Si substrate s=7 A , h=0.2 , various Large lateral correlation at interface Specular peak Yoneda wings : each time ai or af = ac Yoneda Wings
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Longitudinal and detector scans
Si (30 nm) // Ge (50 nm) // SiO2 (1.5 nm) Schlomka et al. PRB 51(4) 1995 Offset (longitudinal) scan Detector scan Curve depends on ai (penetration depth) ai < ac No penetration Increasing ai different modulations Specular contribution of the diffuse scattering Same oscillations than reflectivity curve
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Conclusions Grazing Incidence X-Ray Reflection
Surface/interface investigation at atomic scale Non destructive technique Vertical periodicity & in-plane morphology Layer thickness, electronic density profile (composition profile) Surface and interface roughness In-plane and between plane correlations No information on the crystalline structure Application 01/2001: Collaboration IKS / VSM / IMEC Roughness characterization of Co1-xNixSi2 layers (MBE) Roughness influence on the resistivity
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