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Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Process of repair and postrepair treatment. Figure Legend: From: Evaluation of multilayer.

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Presentation on theme: "Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Process of repair and postrepair treatment. Figure Legend: From: Evaluation of multilayer."— Presentation transcript:

1 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Process of repair and postrepair treatment. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

2 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Simulated influence of postrepair protective layer treatment versus wafer CD change. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

3 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Correlation result of repaired site between EUV microscope and simulation. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

4 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Characteristics change of repaired site: cleaning changes mask pattern wider and deeper. (a) EUV microscopic image and (b) mask AFM profile. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

5 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Repair target size dependency to cleaning influence. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

6 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Postrepair treatment comparison between pre- and postcleaning at best focus. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

7 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Through-focus images of postrepair treatment between pre- and postcleaning through-focus. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

8 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Postrepair treatment comparison for aerial CD change between pre- and postcleaning through-focus. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

9 Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. TEM cross-section images of EUV patterns: (a) postrepair without treatment and (b) postrepair with treatment. Figure Legend: From: Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks J. Micro/Nanolith. MEMS MOEMS. 2016;15(2):021010. doi:10.1117/1.JMM.15.2.021010

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