1. Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Points are the nominal spot locations on the calibration standard and the test specimen. The numbers are the sequence of captured images. The first image is at 1 on the Standard, the second is at 2 on the Test, and so on. Figure Legend: From: Traceable pitch metrology: supporting the development of patterned media and more J. Micro/Nanolith. MEMS MOEMS. 2012;11(1):011008-1-011008-12. doi:10.1117/1.JMM.11.1.011008

2. Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Height images (3000 nm wide) and average de-skewed height profiles (600 nm wide) for the 144 nm and 70 nm specimens. Panels (a) and (b) are contact mode (run 1) and tapping mode (run 2) images of the 144 nm grid. Panel (c) shows height profiles for both runs. Likewise, panels (d), (e), and (f) show contact and tapping mode images of the 70 nm grating and the corresponding de- skewed height profiles. Figure Legend: From: Traceable pitch metrology: supporting the development of patterned media and more J. Micro/Nanolith. MEMS MOEMS. 2012;11(1):011008-1-011008-12. doi:10.1117/1.JMM.11.1.011008

3. Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Pitch results for run 1, data set 5. (a) Normalized raw pitch (pitch/mean pitch) as a function of position in the image. Points labeled 144 nm are pitch values measured in the calibration images captured before and after the test specimen image. Points labeled 70 nm are pitch values from the test image. The scan nonlinearity was about 10% and affected the Standard and Test images in a similar way. (b) Raw and calibrated pitch for the test specimen. The dashed vertical lines in panels (a) and (b) indicate data exclusion borders. Because the AFM nonlinearity is hard to correct at the start of scan, we exclude pitch results from the leftmost 10% of the calibration images [dashed line in panel (a)] and from the leftmost 20% of the test image [dashed line in panel (b)]. Figure Legend: From: Traceable pitch metrology: supporting the development of patterned media and more J. Micro/Nanolith. MEMS MOEMS. 2012;11(1):011008-1-011008-12. doi:10.1117/1.JMM.11.1.011008

4. Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Comparison of Global and Normal calibration methods, showing mean pitch at each spot for both methods and both runs. Global refers to a method where the nonlinearity within each image was corrected using a global calibration function. Normal refers to the interleaved, bookend calibration procedure. Figure Legend: From: Traceable pitch metrology: supporting the development of patterned media and more J. Micro/Nanolith. MEMS MOEMS. 2012;11(1):011008-1-011008-12. doi:10.1117/1.JMM.11.1.011008

5. Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Spot means of run 2 plotted versus the spot means of run 1. There is no significant correlation from run-to-run. Figure Legend: From: Traceable pitch metrology: supporting the development of patterned media and more J. Micro/Nanolith. MEMS MOEMS. 2012;11(1):011008-1-011008-12. doi:10.1117/1.JMM.11.1.011008

6. Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Relative precision of pitch measurements in AFM and SEM images of gratings, with pitch from 35 to 2000 nm. Figure Legend: From: Traceable pitch metrology: supporting the development of patterned media and more J. Micro/Nanolith. MEMS MOEMS. 2012;11(1):011008-1-011008-12. doi:10.1117/1.JMM.11.1.011008

7. Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Actual and modeled uncertainties (k=1) of existing and future calibration standards. Figure Legend: From: Traceable pitch metrology: supporting the development of patterned media and more J. Micro/Nanolith. MEMS MOEMS. 2012;11(1):011008-1-011008-12. doi:10.1117/1.JMM.11.1.011008