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Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Electron beam lithography systems. Figure Legend: From: Datapath system for multiple.

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Presentation on theme: "Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Electron beam lithography systems. Figure Legend: From: Datapath system for multiple."— Presentation transcript:

1 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Electron beam lithography systems. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

2 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Datapath for an MEB system. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

3 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Corner2-MEB compression algorithm overview. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

4 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. The MAPPER writing strategy. Each electron beam writes a tall rectangular region in a horizontal zig-zag order. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

5 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. The application of the MAPPER writing region to the wafer. The black squares represent the starting positions of the electron beams during each writing, and each tall rectangle within a circuit region illustrates the writing region of the corresponding electron beam writer. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

6 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. The effects of block separation. The circuit layout image is partitioned and some of the partitioned blocks are rearranged. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

7 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Frequent pattern replacement. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

8 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Corner transformation process of Corner2. The new step (d) accounts for the zig-zag writing strategy. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

9 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Frequent pattern discovery from GDSII layout description. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

10 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Example of pattern mismatch due to rasterization. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

11 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Permute pixels corresponding to the writing strategy. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

12 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Corner2-MEB decompression algorithm overview. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

13 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Reconstructing the forward transformed image blocks from the flattened stream. The decoder places each incoming stream symbol into the appropriate inverse transformation data queue. All of the symbols in a queue are rearranged into a block that undergoes the inverse transformation process to produce a decoded image block. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

14 Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Frequent pattern reconstruction example. Figure Legend: From: Datapath system for multiple electron beam lithography systems using image compression J. Micro/Nanolith. MEMS MOEMS. 2013;12(3):033018-033018. doi:10.1117/1.JMM.12.3.033018

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