1. LALEucard WP 10.8.2 1 IN2P3 Les deux infinis IN2P3 Les deux infinis W. Kaabi, Y. Peinaud, A. Thiebault, E. Herry, A. Variola. M. Lacroix, B. Mercier and C. Prevost Eucard WP 10.8 (LAL, 8 April, 2010) Eucard WP10.8

2. LALEucard WP 10.8.2 2 IN2P3 Les deux infinis  Introduction  Automatic Cleaning System  High Pressure Rinsing (HPR)  Plasma Discharge Cleaning  Conclusion Eucard WP 10.8 Summary

3. LALEucard WP 10.8.2 3 IN2P3 Les deux infinis Introduction Warm coupler part Cold coupler part Coupler preparation 3 Weeks Coupler parts after manufacturing Cryomodule assembly Eucard WP 10.8

4. LALEucard WP 10.8.2 4 IN2P3 Les deux infinis Process LAL Eucard WP 10.8.2 Clean with alcoholised tissues Place the parts in the MAS Place the piece in the bath Full and warm the bath (detergent+water) Ultrasonic bath Rinse the pieces Dry under laminar flow Count the particules Bake under vacuum Dirty coldparts and test waveguide 1 2 3 4 5 6 7 8 9 Assemble the parts Make a leak check Place the assembly in the MAS Place it in oven, start the TurboPumps Start the oven Start the ionic pump & stop the turbo pump Assemble the Waveguide box in ISO5 RF adjustement & conditioning Partial unassembling & Packing Dust « free » surfaces Pieces in the MAS Pieces in the bath T=50°C Time=15min Resistivity > 14MOhm.cm 48h Nb (size>0.3µm) <10part/foot3 Time=24h Parts assembled Assembly leak checked Assembly in the MAS Assembly in the oven under vacuum Time=72hours Ionic pump started & turbo pump stoped Waveguide box assembled Coupler conditionned Packed Delivery 10 11 12 13 14 15 16 17 18 Clean Dressing Room ISO 6 (class1000) Material Air Shower Air Shower ISO4 (class10) Dirty Dressing Room Oven Bench Rinsing sink Ultrasonic bath 1 2 5 4 3 6 7 8 9 Mobile clean room ISO 5 (class100) In-situ baking oven 13 RF conditionning area 10 12 14 18 15 11 16 17 LAL infrastructure

5. LALEucard WP 10.8.2 5 IN2P3 Les deux infinis Introduction Clean with alcoholised tissues Place the parts in the MAS Place the piece in the bath Full and warm the bath (detergent+water) Ultrasonic bath Rinse the pieces Dry under laminar flow Count the particules Bake under vacuum Dirty coldparts and test waveguide 1 2 3 4 5 6 7 8 9 Assemble the parts Make a leak check Place the assembly in the MAS Place it in oven, start the TurboPumps Start the oven Start the ionic pump & stop the turbo pump Assemble the Waveguide box in ISO5 RF adjustement & conditioning Partial unassembling & Packing Dust « free » surfaces Pieces in the MAS Pieces in the bath T=50°C Time=15min Resistivity > 14MOhm.cm 48h Nb (size>0.3µm) <10part/foot3 Time=24h Parts assembled Assembly leak checked Assembly in the MAS Assembly in the oven under vacuum Time=72hours Ionic pump started & turbo pump stoped Waveguide box assembled Coupler conditionned Packed Delivery 10 11 12 13 14 15 16 17 18 Cleaning Assembling Desorption Conditioning Time in days 057 11 14 34 Assembly schedule  Improvements in term of quality, reapetability & time for mass production Eucard WP 10.8

6. LALEucard WP 10.8.2 6 IN2P3 Les deux infinis  Introduction  Automatic Cleaning System  Actual LAL cleaning steps  Integration  Motion  Logical synoptic  Simulation  Schedule  High Pressure Rinsing (HPR)  Plasma Discharge Cleaning  Conclusion Eucard WP 10.8 Summary

7. LALEucard WP 10.8.2 7 IN2P3 Les deux infinis Clean with alcoholised tissues dust « free » surfaces Place the parts in the MAS Pieces in the MAS Place the piece in the bath Pieces in the bath Full and warm the bath (detergent+water) T=50°C Ultrasonic bath Time=15min Rinse the pieces Resistivity > 14MOhm.cm Dry under laminar flow 48h Count the particules Nb (size>0.3µm)<10part/pieds3 Bake under vacuum Time=24h Dirty coldparts and test waveguide Assemble the pieces 1 2 3 4 5 6 7 8 9 Clean Dressing Room ISO 6 (class1000) Material Air Shower Air Shower ISO4 (class10) Dirty Dressing Room Oven Bench Rinsing sink Ultrasonic bath 1 2 5 4 3 6 7 8 9  Actual LAL cleaning steps Drawbacks of our actual process: -Total time> 120h -No repeatability of the process -Pollution risk on pieces between each steps Automatic Cleaning System Eucard WP 10.8

8. LALEucard WP 10.8.2 8 IN2P3 Les deux infinis Clean with alcoholised tissues dust « free » surfaces Place the parts in the MAS Pieces in the MAS Place the piece in the bath Pieces in the bath Full and warm the bath (detergent+water) T=50°C Ultrasonic bath Time=15min Rinse the pieces Resistivity > 14MOhm.cm Dry under laminar flow 48h Count the particules Nb (size>0.3µm)<10part/pieds3 Bake under vacuum Time=24h Dirty coldparts and test waveguide Assemble the pieces 1 2 3 4 5 6 7 8 9 Clean Dressing Room ISO 6 (class1000) Material Air Shower Air Shower ISO4 (class10) Dirty Dressing Room Oven Bench Rinsing sink Ultrasonic bath 1 2 5 4 3 6 7 8 9 Drawbacks of our actual process: -Total time> 120h -No repeatability of the process -Pollution risk on pieces between each steps  Actual LAL cleaning steps The solution is an automatic system which will: -Reduce the total time and work as a background task (during the night for example) -Improve the repeatability of the process -Suppress the pollution risk of pieces between the steps Automatic Cleaning System Eucard WP 10.8

9. LALEucard WP 10.8.2 9 IN2P3 Les deux infinis  Actual LAL cleaning steps  Logical Synoptic: Full cleaning cycle  Ultrasonic washing  Rinsing  Resistivity measurement  Particle counting  Nitrogen Drying  Humidity measurement Automatic Cleaning System Eucard WP 10.8

10. LALEucard WP 10.8.2 10 IN2P3 Les deux infinis  Actual LAL cleaning steps  Logical synoptic  Motion:  A first rotation around the pieces axle  A second rotation around the axle of the device Automatic Cleaning System 360 ° +/- 180 ° Test waveguide Bellow Ceramic Cold parts Eucard WP 10.8

11. LALEucard WP 10.8.2 11 IN2P3 Les deux infinis Automatic Cleaning System  Actual LAL cleaning steps  Logical synoptic  Motion  Integration:  Service hatch  No room contamination  The machine can be load and started by outside  Solution easier to design Wall Clean room ISO 4 Hall (dirty environment) INOUT Eucard WP 10.8

12. LALEucard WP 10.8.2 12 IN2P3 Les deux infinis  Actual LAL cleaning steps  Logical synoptic  Motion  Integration Automatic Cleaning System Clean Dressing Room ISO 6 (class1000) Material Air Shower Air Shower ISO4 (class10) Dirty Dressing Room Cleaning Machine Bench Rinsing sink Ultrasonic bath 1 2 3 Machine loading Loaded parts Machine Cycle End of machine cycle Machine unloading Exited parts Cold (or warm) parts and test waveguide Parts assembly 1 2 3 Eucard WP 10.8

13. LALEucard WP 10.8.2 13 IN2P3 Les deux infinis  Actual LAL cleaning steps  Logical Synoptic  Motion  Integration  Simulation Automatic Cleaning System Eucard WP 10.8

14. LALEucard WP 10.8.2 14 IN2P3 Les deux infinis Automatic Cleaning System  Actual LAL cleaning steps  Logical Synoptic  Motion  Integration  Simulation  Schedule  Fonctional specifications  on going, dead line June 2010  Sub-contractor researches  on going, dead line September 2010  Selection of the manufacturing way in October 2010 : In our laboratory or outside Eucard WP 10.8

15. LALEucard WP 10.8.2 15 IN2P3 Les deux infinis Sum up of our goals:  Make a prototype  Optimise the cleaning parameters  Let the prototype updatable, for option:  Acide cleaning (reduction of the copper oxydation)  Alcohol rinsing to optimse the drying step  High Pressure Rinsing (HPR) to be closer than the cavity cleanliness Automatic Cleaning System Eucard WP 10.8

16. LALEucard WP 10.8.2 16 IN2P3 Les deux infinis  Introduction  Automatic Cleaning System  High Pressure Rinsing (HPR)  Goals  Difficulties to manage  Ceramic window  First tests  Next steps  Plasma Discharge Cleaning  Conclusion Summary Eucard WP 10.8

17. LALEucard WP 10.8.2 17 IN2P3 Les deux infinis  Goals  High pressure rinsing (HPR) is nowadays routinely used in the process of superconducting RF cavities assembly to remove residuals from the resonator wall.  The aim of our study is to:  Submit the coupler to the same treatment in order to ameliorate the rinsing step in our cleaning procedure.  Consider the possibility to integrate an HPR in the automatic coupler cleaning machine High Pressure Rinsing (HPR) Eucard WP 10.8

18. LALEucard WP 10.8.2 18 IN2P3 Les deux infinis  Goals  Weakest pieces  Copper coating on the bellows  TiN coating on the ceramic surface (used to avoid multipactor)  TiN coating on brazed junction between the ceramic and its sleeve (used to make an electrical continuity) High Pressure Rinsing (HPR) Eucard WP 10.8 Bellows Ceramic windows Cold part Ceramic-copper brazing covered by TiN deposit TiN coated surface (~ 15 nm)

19. LALEucard WP 10.8.2 19 IN2P3 Les deux infinis  Goals  Weakest pieces  First tests  HPR rinsing primary tests were performed on ceramic windows & copper coated bellows (thanks to P. Szott & A. Stephen for these tests at IPNO). The goal was to check if the TiN coating and the copper coating can be removed after the operation:  After these tests, we didn’t distinguish any visual difference (no peel off, and no discoloration). High Pressure Rinsing (HPR) Eucard WP 10.8

20. LALEucard WP 10.8.2 20 IN2P3 Les deux infinis  Goals  Weakest pieces  First tests  Next steps:  To simulate different part of the coupler in using samples in order to be able to measure them (already done)  TiN coating on:  Ceramic  Copper  brazing material (link between ceramic and copper)  Copper coating on stainless steel  To characterise the sample before and after HPR, we will:  Visualise with Scanning electron microscopy (SEM)  Measure the coating thickness  Measure the film composition High Pressure Rinsing (HPR) Eucard WP 10.8

21. LALEucard WP 10.8.2 21 IN2P3 Les deux infinis  Introduction  Automatic Cleaning System  High Pressure Rinsing (HPR)  Plasma Discharge Cleaning  Goals  Principal  Effect of oxygen addition in gas discharge  Consequences of plasma discharge cleaning  Procedure monitoring  Conclusion Eucard WP 10.8 Summary

22. LALEucard WP 10.8.2 22 IN2P3 Les deux infinis Process LAL Eucard WP 10.8.2 Clean with alcoholised tissues Place the parts in the MAS Place the piece in the bath Full and warm the bath (detergent+water) Ultrasonic bath Rinse the pieces Dry under laminar flow Count the particules Bake under vacuum Dirty coldparts and test waveguide 1 2 3 4 5 6 7 8 9 Assemble the parts Make a leak check Place the assembly in the MAS Place it in oven, start the TurboPumps Start the oven Start the ionic pump & stop the turbo pump Assemble the Waveguide box in ISO5 RF adjustement & conditioning Partial unassembling & Packing Dust « free » surfaces Pieces in the MAS Pieces in the bath T=50°C Time=15min Resistivity > 14MOhm.cm 48h Nb (size>0.3µm) <10part/foot3 Time=24h Parts assembled Assembly leak checked Assembly in the MAS Assembly in the oven under vacuum Time=72hours Ionic pump started & turbo pump stoped Waveguide box assembled Coupler conditionned Packed Delivery 10 11 12 13 14 15 16 17 18 Clean Dressing Room ISO 6 (class1000) Material Air Shower Air Shower ISO4 (class10) Dirty Dressing Room Oven Bench Rinsing sink Ultrasonic bath 1 2 5 4 3 6 7 8 9 Mobile clean room ISO 5 (class100) In-situ baking oven 13 RF conditionning area 10 12 14 18 15 11 16 17 LAL infrastructure

23. LALEucard WP 10.8.2 23 IN2P3 Les deux infinis  Goals  Test a new surface treatment procedure to decrease the degassing surface rate  Observe the effects of such treatment on coupler conditioning procedure  Suppress the in-situ baking step (72h) Plasma Discharge Cleaning Eucard WP 10.8

24. LALEucard WP 10.8.2 24 IN2P3 Les deux infinis + Ar + C C ad C C  Goals  Principal  Create a plasma discharge in an Argon gas at around 10-1 mbar and produce a cleaning of the surface by ion bombardment.  Two mechanisms can occur during surface bombardment by gas discharge ions:  Gas molecules desorption  Secondary ion emission or/and sputtering of surface elements (carbon, oxides, surface material) Plasma Discharge Cleaning Eucard WP 10.8

25. LALEucard WP 10.8.2 25 IN2P3 Les deux infinis + Ar + O2O2 OC C O2+O2+ O+O+ ad O C C  Goals  Principal  Effect of oxygen addition in gas discharge  A low percentage of Oxygen is added to:  Increase ions secondary emission yield  O2+ and O+ ions creation in the discharge in order to react with carbon emitted from the surface to form CO2 and CO pumped in the laminar flux  Create instable surface metallic oxides, easily eliminated by the discharge, that avoid exposed surfaces contamination by metallic emitted ions Plasma Discharge Cleaning Eucard WP 10.8

26. LALEucard WP 10.8.2 26 IN2P3 Les deux infinis  Goals  Principal  Effect of oxygen addition in gas discharge  Consequences of plasma discharge cleaning  Gas molecules desorption:  (+) Diminution of the surface degassing rate  benefic for the conditioning procedure  Ions secondary emission (or sputtering) of carbon:  (+) The carbon form on the surface is a good trap for gas adsorbed, its elimination will facilitate gas desorption.  (-) The carbon plays a positive role in lowering SEY, its elimination may increase this surface parameter.  Modification of the surface shape:  (+) Ions secondary emission and element sputtering cause surface roughness change. This point is benefic to lowering the SEY of the surface and thus decrease the surface electronic activity.  All this aspect have to be controlled for a better optimization of procedure parameters. Plasma Discharge Cleaning Eucard WP 10.8

27. LALEucard WP 10.8.2 27 IN2P3 Les deux infinis Gas molecules desorption RGA monitoring Ions secondary emission (and/or sputtering) of surface elements (especially carbon) RGA monitoring SEY measurement of treated surface Surface state modification by plasma eaching SEM observation SEY measurement of treated surface  Goals  Principal  Effect of oxygen addition in gas discharge  Consequences of plasma discharge cleaning  Procedure monitoring  A monitoring before, during and after plasma discharge cleaning will be done to judge the efficiency of the procedure and will permit to optimize parameters and duration Plasma Discharge Cleaning Eucard WP 10.8

28. LALEucard WP 10.8.2 28 IN2P3 Les deux infinis  Goals  Principal  Effect of oxygen addition in gas discharge  Consequences of plasma discharge cleaning  Procedure monitoring  Plasma discharge cleaning of power coupler  Gas discharge introduction into internal coupler part  Controlled pumping to reach 10-1 mbar pressure and create a laminar pumping flux  Direct current bias application with a positive antenna voltage and a grounded coupler corps  Plasma creation at all power coupler internal parts + Gas inlet Pumping Plasma Discharge Cleaning Eucard WP 10.8

29. LALEucard WP 10.8.2 29 IN2P3 Les deux infinis  Goals  Principal  Effect of oxygen addition in gas discharge  Consequences of plasma discharge cleaning  Procedure monitoring  Plasma discharge cleaning of power coupler  Experimental assemblies  First step: tests on sample in chamber with an antenna  Second step: Treatment of two cold coupler parts plug on the transition wave guide box (TWG)  Gas inlet in the top of cold coupler parts and pumping at the exit of the TWG to get a laminar flux  The RGA for pumped gas analysis  Copper samples could be placed at the internal of the coupler for SEY measurements after treatment. R.G.A Gauge Cold part Transition wave guide box (TWG) DN16CF viewport All metal valve DN40CF All metal valve DN16CF Adaptator DN40KF for turbo pumping Plasma Discharge Cleaning Eucard WP 10.8

30. LALEucard WP 10.8.2 30 IN2P3 Les deux infinis Plasma Discharge Cleaning  Goals  Principal  Effect of oxygen addition in gas discharge  Consequences of plasma discharge cleaning  Procedure monitoring  Plasma discharge cleaning of power coupler  Experimental assembly  Accomplished tasks:  Equipments ordered and delivered to the lab  Installation and first experiments plan within 2 months  Next steps:  Understand the action of each cleaning discharge parameters (gas composition, antenna voltage, gas flow rate, vacuum level…)  Optimize the parameter and define a procedure for coupler application Eucard WP 10.8

31. LALEucard WP 10.8.2 31 IN2P3 Les deux infinis  Automatic Cleaning System  A great challenge, and an important step in term of quality, repeatability and time for large mass production (for example ILC)  A lot have to be done but we are really motivated to do it  HPR  An other step to improve the coupler cleanliness to be closer to the cavity cleanliness  Similar amount of work, and same motivation than the previous task  Plasma Discharge Cleaning  A very interesting alternative to the in-situ baking with a deeper action  ….. Thank you for you attention, any question??? Eucard WP 10.8 Conclusion