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Cold atoms near surfaces beyond disorder Della Pietra Leonardo Physikalisches Institut der Universität Heidelberg Philosophenweg 12, 69120 Heidelberg, Germany dpietra@physi.uni-heidelberg.de www.atomchip.org Heidelberg 05.03.05
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Overview (1) The setup (2) Micromachining the chip: Cleaning wires E wells Playing with I (3) Next chip (4) Plans
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(1) The chamber 6''Loading 0.3''Evaporation on chip 10 5 atoms BEC Quadrupole MOT->U-MOT Lower chamber: Fast loading (~1'') Upper chamber: Good vacuum 20''RF evaporation Optical pumping Cu-Z magnetic trap ~10 8 atoms
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(1) The chamber 6''Loading 0.3''Evaporation on chip 10 5 atoms BEC Quadrupole MOT->U-MOT Lower chamber: Fast loading (~1'') Upper chamber: Good vacuum 20''RF evaporation Optical pumping Cu-Z magnetic trap ~10 8 atoms
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(1) The chamber 6''Loading 0.3''Evaporation on chip 10 5 atoms BEC Quadrupole MOT->U-MOT Lower chamber: Fast loading (~1'') Upper chamber: Good vacuum 20''RF evaporation Optical pumping Cu-Z magnetic trap ~10 8 atoms
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(1) The chamber 6''Loading 0.3''Evaporation on chip 10 5 atoms BEC Quadrupole MOT->U-MOT Lower chamber: Fast loading (~1'') Upper chamber: Good vacuum 20''RF evaporation Optical pumping Cu-Z magnetic trap ~10 8 atoms
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(1) The chip gold layer:2.3 µm thin wires:10 µm Structures:~1 µm A B C Imaging: parallel to chip Schneider et al, PRA 67,023612(2003)
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(2) The FIB Henri J. Lezec ISIS Universite' Louis Pasteur Strasbourg (FR) Small structures: ~20 nm
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(2) Polishing wires A clean Focused Ion Beam can be used to redefine wire boundaries Lateral wire definition = grain size ( 100 - 30 nm )
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(2) Polishing wires A clean Focused Ion Beam can be used to redefine wire boundaries Lateral wire definition = grain size ( 100 - 30 nm )
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(2) Polishing wires Approaching chip: BEC forms in potential well
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(2) Polishing wires Approaching chip: BEC forms in potential well Last results: Thermal cloud down to the chip
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(2) E fields U(r) = g F m F µ B B(r) – ½ E(r) 2 Electrostatic interaction does not depend on m F always attractive Typical orders of magnitude ( 7 Li) ● U B [µK] ~ 67 B [G] ● U E [µK] ~ 98 E 2 [V/µm] Already realized with 7 Li : ● Traps ● Motors ● Splitters Folman et al, Adv.At.Mol.Opt.Phys 48, 263 (2002) Krüger et al, PRL (2003)
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(2) Sharpening E Sharp structures II V Sharp E fields II V µm scale U definition
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(2) Sharpening E Sharp structures II V Sharp E fields II V µm scale U definition
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(2) 1,2,...n wells - Playing with potentials Magnetic guide keeps atoms in place; then:
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(2) 1,2,...n wells - Playing with potentials Magnetic guide keeps atoms in place; then:
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(2) 1,2,...n wells - Playing with potentials Magnetic guide keeps atoms in place; then: - Playing with positions
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(2) Disturbing I Notches: 200 x 700 nm I deviates from regular flow => Corrugation in U(B)
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(2) Q transmission T dependent on Kinetic energy
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(2) Q transmission T dependent on Kinetic energy Potential depth/width dependent on distance from chip Distance between resonance peaks changes with distance from chip
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(3) Gold grains A.Bietsch B.Michel Appl.Phys.Lett. 80, 3346 (2002) C.Durkan M.E.Welland PRB 61,14215 (2000) Times 22 Contact resistance between wire and wire up to 10 Ohm Dependent on relative crystal orientations
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(3) Next Chip Wires:Thin/Thick Narrow/Wide Transversal/Longitudinal confinement: independent NEW SAMPLES
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(3) Gold grains II 1x1µm 750nm 25°C 1x1µm 250nm 300°C Grain size << Thickness Grain size ~ Thickness NEW SAMPLES 1x1µm 250nm 25°C
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(4) Plans ● Microscopic field sensing ● Holography ● Interferometry ● Magnetic traps + optical grids
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(4) The Group Review: R.Folman, P.Krüger, J. Schmiedmayer, J.Denschlag, C.Henkel, Adv. At. Mol. Opt. Phys. 48, 263 (2002) Jörg Schmiedmayer Rb team: Leonardo Della PietraSimon Aigner Chips: Ron Folman Sönke Groth http://www.atomchip.org
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