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Analog Integrated Circuits Lecture 1: Introduction and MOS Physics ELC 601 – Fall 2013 Dr. Ahmed Nader Dr. Mohamed M. Aboudina anader@ieee.org maboudina@gmail.com Department of Electronics and Communications Engineering Faculty of Engineering – Cairo University
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10/2/2016© Ahmed Nader, 2013 2 MOS: Subthreshold (Weak Inversion) Subthreshold Conduction: For V GS near V TH, I D has an exponential dependence on V GS : Max transconductance efficiency Used for low currents & low frequency applications
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10/2/2016© Ahmed Nader, 2013 3 MOS: Intrinsic Capacitance C1 is the gate-channel capacitance C2 is the channel-bulk depletion capacitance C3 & C4 is the overlap gate-source(drain) capacitance C5 & C6 is the source/drain –bulk junction capacitance (bottom- plate and sidewall) Note that junction capacitors are voltage-dependent (non-linear)
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10/2/2016© Ahmed Nader, 2013 4 MOS: Intrinsic Capacitance
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10/2/2016© Ahmed Nader, 2013 5 MOS Device as a Capacitor: Varactor Assignment 1a: There is a special device with n-doping in an NWELL. Plot the characteristics of such a device. Comment on its properties.
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10/2/2016© Ahmed Nader, 2013 6 Small Signal Model The slope of the diode characteristic at the Q-point is called the diode conductance and is given by: g d is small but non-zero for I D = 0 because slope of diode equation is nonzero at the origin. Diode resistance is given by:
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10/2/2016© Ahmed Nader, 2013 7 Small Signal Operation of a Diode Subtracting I D from both sides of the equation, For i d to be a linear function of signal voltage v d, This represents the requirement for small-signal operation of the diode.
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10/2/2016© Ahmed Nader, 2013 8 Current Controlled Attenuator Magnitude of ac voltage v o developed across diode can be controlled by value of dc bias current applied to diode. From dc equivalent circuit I D = I, From ac equivalent circuit, For R I = 1 k , I S = 10 -15 A, If I = 0, v o = v i, magnitude of v i is limited to only 5 mV. If I = 100 A, input signal is attenuated by a factor of 5, and v i can have a magnitude of 25 mV.
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10/2/2016 9 Small-Signal Model of a MOS (Two-Port Model) Using 2-port y-parameter network, The port variables can represent either time-varying part of total voltages and currents or small changes in them away from Q-point values.
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10/2/2016 10 Small-Signal Model of a MOS Since gate is insulated from channel by gate-oxide input resistance of transistor is infinite. Small-signal parameters are controlled by the Q-point. For same operating point, MOSFET has lower transconductance and lower output resistance that BJT. Transconductance: Output resistance:
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MOS Transistor © Ahmed Nader, 2013 11 10/2/2016 Important Trade-Offs!! Gain Vs. Current Gain Vs. Speed Gain Vs. Voltage Swing
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MOS Transistor © Ahmed Nader, 2013 12 Small Signal Model: Body Effect 10/2/2016 Drain current depends on threshold voltage which in turn depends on v SB. Back-gate transconductance is: 0 < < 1 is called back-gate tranconductance parameter.
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10/2/2016© Ahmed Nader, 2013 13 Small-Signal Model of a MOS: High Frequency Model Voltage dependent current source (g m V gs ) models dependence of drain current on gate-source voltage Output resistance models dependence of drain current on drain- source voltage (channel length modulation) Voltage dependent current source (g mb V bs ) models dependence of drain current on bulk-source voltage (body effect)
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MOS Transistor © Ahmed Nader, 2013 14 Useful Model Small Signal: + - 10/2/2016
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MOS Transistor © Ahmed Nader, 2013 15 Special Cases Bias point 10/2/2016
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© Ahmed Nader, 2013 16 Deep Sub-Micron Technologies
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10/2/2016© Ahmed Nader, 2013 17 Analog Low-voltage – High- Speed trade-off Fixed for the technology and fixed L
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10/2/2016© Ahmed Nader, 2013 18 Deep Sub-Micron Technologies Some small geometry effects: 1- Gate leakage 2- Threshold voltage variation 3- Output impedance variation with V DS (non-linearity ) 4- Mobility degradation with vertical field 5- Velocity saturation 6- Reliability Effects (GO, Hot Carrier, NBTI,..) 7- Stress Effects (STI, Well Proximity,..) Assignment 1b: Choose one of those effects in 6 or 7 and describe it in details (physical meaning, effect on performance, etc.)
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10/2/2016 19 Deep Sub-Micron Technologies © Ahmed Nader, 2013 What about scaling of V th ?
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10/2/2016© Ahmed Nader, 2013 20 Deep Sub-Micron Technologies – Mobility degradation with Vertical Field Carriers are confined to a narrower region below oxide- silicon interface leading to more carrier scattering and hence lower mobility Assignment 1c: Find an expression for HD3
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10/2/2016© Ahmed Nader, 2013 21 Deep Sub-Micron Technologies – Velocity Saturation
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10/2/2016© Ahmed Nader, 2013 22 Deep Sub-Micron Technologies – Velocity Saturation
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10/2/2016© Ahmed Nader, 2013 23 MOS Device Models Level 3 Model BSIM (Berkeley Short-Channel IGFET Model)
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10/2/2016© Ahmed Nader, 2013 24 MOS Device Models
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10/2/2016© Ahmed Nader, 2013 25 Analog Layout
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10/2/2016© Ahmed Nader, 2013 26 Analog Layout
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10/2/2016© Ahmed Nader, 2013 27 Analog Layout
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10/2/2016© Ahmed Nader, 2013 28 Analog Layout Adding Dummies. How can dummies help in STI? Connect gate (poly) from both sides
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10/2/2016© Ahmed Nader, 2013 29 Analog Layout: Inter-digitation
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10/2/2016© Ahmed Nader, 2013 30 Analog Layout
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10/2/2016© Ahmed Nader, 2013 31 Analog Layout: Common Centroid
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10/2/2016© Ahmed Nader, 2013 32 Analog Layout
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10/2/2016© Ahmed Nader, 2013 33 Resistor Layout
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10/2/2016© Ahmed Nader, 2013 34 Capacitor Layout
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10/2/2016© Ahmed Nader, 2013 35 Inductor Layout
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10/2/2016© Ahmed Nader, 2013 36 Inductor Layout Spiral Inductor Calculator (Stanford): http://www-smirc.stanford.edu/spiralCalc.htmlhttp://www-smirc.stanford.edu/spiralCalc.html Assignment1: Using ASITIC tool: http://rfic.eecs.berkeley.edu/~niknejad/doc-05-26-02/asitic.htmlhttp://rfic.eecs.berkeley.edu/~niknejad/doc-05-26-02/asitic.html Design an Inductor with L=2nH and Q>10
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10/2/2016© Ahmed Nader, 2013 37 Analog Layout: Summary
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10/2/2016© Ahmed Nader, 2013 38 Analog Layout: Example
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10/2/2016© Ahmed Nader, 2013 39 Analog Layout: Example
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