1. Date of download: 9/27/2017
Copyright © ASME. All rights reserved.
From: Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes
J. Micro Nano-Manuf. 2016;4(3): doi: /
Figure Legend:
Illustration of the J-FIL™ process. Courtesy of Canon Nanotechnologies, Inc.

2. Date of download: 9/27/2017
Copyright © ASME. All rights reserved.
From: Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes
J. Micro Nano-Manuf. 2016;4(3): doi: /
Figure Legend:
(Left) Example of the signature left behind from a particle event in the J-FIL™ process. The lost imprint area has been marked with a dashed circle. (Right) A zoomed in view of the particle encounter showing potentially damaged pieces from the template. Pictures courtesy of Molecular Imprints, Inc.

3. Date of download: 9/27/2017
Copyright © ASME. All rights reserved.
From: Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes
J. Micro Nano-Manuf. 2016;4(3): doi: /
Figure Legend:
Illustration of geometry during particle encounter assuming an axisymmetric system centered around the particle center. The presence of a particle leads to the formation of a dry exclusion zone, where there is no fluid, with radius R1. The transition zone radius extends from the center of the particle to the edge of the affected area and is given as R2. It includes both the dry region as well as a wet region, where the fluid film thickness is not the same as the desired mean film thickness, h0. The particle height is given by hp.

4. Date of download: 9/27/2017
Copyright © ASME. All rights reserved.
From: Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes
J. Micro Nano-Manuf. 2016;4(3): doi: /
Figure Legend:
Frequency distribution of 67 random particle events encountered in a class 10–100 cleanroom environment while carrying out the J-FIL™ process. The exclusion zone radius was measured using a calibrated optical microscope. The x-axis represents the upper limit for the interval in which the exclusion zone was placed. For example, the x-axis value of 200 represents 12 exclusion zone radii measured between 100 and 200 μm.

5. Date of download: 9/27/2017
Copyright © ASME. All rights reserved.
From: Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes
J. Micro Nano-Manuf. 2016;4(3): doi: /
Figure Legend:
Comparison of model prediction against experimental data for the film thickness profile in the wet region of the geometry. The model took as inputs the exclusion zone radius and film thickness at the beginning of the wet region, both of which were measured on the profilometer.

6. Date of download: 9/27/2017
Copyright © ASME. All rights reserved.
From: Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes
J. Micro Nano-Manuf. 2016;4(3): doi: /
Figure Legend:
Model estimated contact force and transition zone diameters for four particle events

7. Date of download: 9/27/2017
Copyright © ASME. All rights reserved.
From: Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes
J. Micro Nano-Manuf. 2016;4(3): doi: /
Figure Legend:
Variation of transition zone with height of particle assuming that the particle is a rigid cone with a cone angle of 45 deg. The model also assumes that the deformation due to particle contact is 5 nm at the transition zone edge. This confirms the hypothesis that the transition zone can be much larger than the particle height and can also allow for easier measurement than the particle itself.