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L. Ratti Università degli Studi di Pavia INFN Pavia

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Presentation on theme: "L. Ratti Università degli Studi di Pavia INFN Pavia"— Presentation transcript:

1 Noise estimation for the strip readout channel on layer 0 to 5 of the SuperB SVT
L. Ratti Università degli Studi di Pavia INFN Pavia SuperB TDR phone meeting, 18/03/2011

2 Model of the charge measuring system
reset network CD=detector capacitance+strays RS=series resistance of the detector CF shaper CF=feedback capacitance Cin=input capacitance T(stp) es en 1 tp=peaking time detector RS T(stp)=shaper transfer function Q d charge preamplifier CD Cin In a charge sensitive amplifier (CSA), noise performance are mostly dependent on the input device noise features Noise in the detector leakage current and in the reset network not considered

3 Noise model: preamplifier input device
reset network CD=detector capacitance+strays RS=series resistance of the detector CF shaper CF=feedback capacitance Cin=input capacitance T(stp) detector es en 1 tp=peaking time RS T(stp)=shaper transfer function Q d charge preamplifier CD Cin series 1/f noise technology dependent contribution both kf and αf depend on the polarity of the DUT (af,s=0.85 for NMOS, 1.05÷1.2 for PMOS) series white noise channel thermal noise Kf 1/f noise parameter αf slope-related parameter kB Boltzmann’s constant T absolute temperature αw excess noise coefficient γ channel thermal noise coefficient n proportional to the subthreshold ID-VGS slope gm transconductance IEEE TNS, vol 54,  no. 3  Jun. 2007, pp

4 thermal noise in the distributed series resistance of the strips
Noise model: strip series resistance reset network CD=detector capacitance+strays RS=series resistance of the detector CF shaper CF=feedback capacitance Cin=input capacitance T(stp) es en 1 tp=peaking time detector RS T(stp)=shaper transfer function Q d charge preamplifier CD Cin thermal noise in the distributed series resistance of the strips

5 Equivalent noise charge
The ENC expression is as follows PA input device strip resistance where A1 and A2(af) are shaping coefficients Cin and Sw depend on input device bias condition, dimensions and polarity Af depends only on gate dimensions in NMOS devices; it depends also on bias conditions in PMOS devices 1/f noise contribution to the ENC is peaking time dependent

6 ENC contribution from RS
Layer RS (f) [W] CD [pF] 57* 9* 1 214 21.5 2 260 26 3 382 38.3 4 292 43.8 5 375 56.3 * including fanout contribution RC2CR shaping

7 ENC contribution from the PA input device
RC2CR shaping Example: ENC optimized with respect to input device channel width and relevant optimum W value as a function of the peaking time for CD=9 pF (SVT layer 0)

8 ENC estimate Layer CD [pF] tp [ns] ENC from RS [e rms] ENC [e rms] Channel width [mm] Hit rate/strip [kHz] Efficiency 1/(1+N) 9.0 25 180 580 1270 2060 0.890 1 21.5 50 600 1060 272 268 0.969 2 26.0 800 1290 3050 162 0.981 3 38.3 1430 1980 3820 95.7 0.989 4 43.8 1000 310 730 10000 21.9 0.950 5 56.3 450 900 11900 28.1 0.937 RC2CR shaping, ID=500 mA (current in the PA input device), L=200 nm, N-channel input device, analog dead time=2.4 tp

9 ENC estimate Layer CD [pF] tp [ns] ENC from RS [e rms] ENC [e rms] Channel width [mm] Hit rate/strip [kHz] Efficiency 1/(1+N) 9.0 25 180 530 1510 2060 0.890 1 21.5 50 600 990 3270 268 0.969 2 26.0 800 1200 3670 162 0.981 3 38.3 1430 1870 4640 95.7 0.989 4 43.8 1000 310 700 11250 21.9 0.950 5 56.3 450 860 13650 28.1 0.937 RC2CR shaping, ID=800 mA, L=200 nm, N-channel input device, analog dead time=2.4 tp

10 ENC estimate Layer CD [pF] tp [ns] ENC from RS [e rms] ENC [e rms] Channel width [mm] Hit rate/strip [kHz] Efficiency 1/(1+N) 2 26.0 50 800 1290 3050 162 0.981 100 570 1000 3810 0.963 200 400 790 4700 0.928 3 38.3 1430 1980 3820 95.7 0.989 1010 1490 4810 0.978 720 1150 6020 0.956 RC2CR shaping, ID=500 mA, L=200 nm, N-channel input device, analog dead time=2.4 tp

11 ENC estimate Layer CD [pF] tp [ns] ENC from RS [e rms] ENC [e rms] Channel width [mm] Hit rate/strip [kHz] Efficiency 1/(1+N) 4 43.8 1000 310 730 10000 21.9 0.950 800 360 780 9470 0.960 500 450 890 8360 0.974 5 56.3 900 13650 28.1 0.937 520 970 11200 0.949 660 1040 9850 0.967 RC2CR shaping, ID=500 mA, L=200 nm, N-channel input device, analog dead time=2.4 tp

12 Proposed layer grouping (updated rates for L1-L5)
CD [pF] available tp [ns] selected tp [ns] ENC from RS [e rms] ENC [e rms] Channel width [mm] Hit rate/strip [kHz] Efficiency 1/(1+N) 11.2 25, 50, 100, 200 25 220 740 3000 2060 0.890 1 26.7 100 460 940 697 0.857 2 31.2 590 1100 422 0.908 3 34.4 200 410 325 0.865 4 52.6 400, 600, 800, 1000 (or 500 and 1000) 500 490 1000 9000 47 0.947 600 440 0.937 5 67.5 800 560 1090 28 0.949 1030 RC2CR shaping, ID=500 mA, L=200 nm, N-channel input device, analog dead time=2.4 tp


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