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Work Package 2 Exploring Novel Materials Systems
Sérgio Miranda Djibril Ndiack Faye Victor Alarcon Diez
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Purpose Exploring Novel Materials Systems Semiconductors
SiC, Ge, AlGaN,… Devices (electronic)
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Rutherford Backscattering Spectroscopy (RBS)
Ion beam technique Stopping powerEnergy loss Scattering cross section (Chu, Wei-kan; Mayer, James W.; Nicolet 1978) Information: Composition Depht Structure Damage (Schmaus & Vickridge, 2005)
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RBS-channelling SrTO3 Impurities measures
Damage due to ion-material interaction
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Large Area Charged Particle Detector
Single detectors area are between 25 mm2 and 300 mm2; our segdet area is 900mm2 area between 36 and 3 times bigger!! Pa represent how quick the material goes to the amorphization state.
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Segmentation (H. Spieler, Semiconductor Detector Systems, 2005)
particle rate less counts per segment, therefore data more manageable Capacitance decrease so it works as a filter less electrical noise Mass/depth ambiguity different mass emerging from different depth can be collected by detector with same energy (H. Spieler, Semiconductor Detector Systems, 2005) (G. Dearnaley and D.C. Northrop, semiconductor counters for nuclear radiations, 1964)
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Segmented Detector Energy Resolution
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Segmented Detector Aplication Example
Determination of Mn in Ga1-xMnxAs 1.8MeV 4He+ 35mC
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Digital Pulse Processing Data Acquisition
High number of detectors 16 Channels Low price Comfortable equipment PC software application More information High number of extracted data Analogue
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Digital Pulse Processing: Energy resolution
Experiment: alpha particle at 1.5 MeV in Au monolayer over TiO2 substrate
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Future Studies Damage Another Ion beam technique: ERDA
Polymers: RBS RBS-channelling microbeams Another Ion beam technique: ERDA Small component amount
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XRD What is X-Ray-Diffraction? X-Ray Source Sample
The atomic planes of a crystal cause on incident beam of X-rays to interfere with one another as they leave the crystal. The phenomenon is called X-ray diffraction. X-Ray Source Sample Monochromator detector
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Bragg’s Law and Diffraction: How waves reveal the atomic structure of crystals?
Diffraction occurs only when Bragg’s Law is satisfied Condition for constructive interference (X-rays 1 & 2) from planes with spacing d Peak position 2theta BRAGG’s EQUATION: n = 2d Sin d dSin The path difference between ray 1 and ray 2 = 2d Sin For constructive interference: n = 2d Sin Ray 1 Ray 2 Deviation = 2
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Why XRD? To identify crystalline phases and orientation
To determine structural properties: Lattice parameters (10-4Å), strain, grain size, To measure thickness of thin films To determine atomic arrangement
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AlGaN? White-light–emitting devices requires the introduction of optically active REs elements Ion implantation is an attractive technique. Unfortunately generates structural damage, Degrading the properties of the materials A good understanding of the damage of AlxGa1-xN alloys implanted by rare earth elements: XRD,RBS, to study the mechanism of damage formation improve of Rare Earth luminescence efficiency in AlxGa1-xN alloys
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XRD strain evolution
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SiC and Ge Materials Property @ 300 K Si 4H-SiC Ge 1.1 3.2 0.67 0.3
Band gap (eV) 1.1 3.2 0.67 Breakdown field (106 V/cm) 0.3 3 - 5 1 Electron mobility (cm2/(V*s)) 1400 900 3900 Hole mobility (cm2/(V*s)) 450 120 1900 Electron saturated drift velocity (106 cm/s) 10 8 - 22 Thermal conductivity (Watts/cm2 K) 1.5 0.58 Ge → Fast processor devices Electrical contacts SiC → Power devices
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SiC SiC Ni Good performance at higher Temperature Ni2Si annealing
hypothesis: 1- C vacancies 2- C precipitates 3 – Silicides 1º - Ni deposition 2º - SiC dissociation 3º - C out-diffuses to surface 4º - Silicide formation 5º - C accumulates at interface → precipitates 6º - Low resistivity (graphitisation) Temperature Jung et al., Journal of The Electrochemical Society, 158 (5) H551-H553 (2011) Cao et al., Materials Science and Technology, vol. 22, 10 (2006) 1227
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Ge Low formation temperature Low resistivity
______________________________________________________________ Poor thermal stability (400 ºC): Agglomeration Oxidation Ni NiGe Ge Ge Ni Pd or Pt Pt2NiGe PtGe Phase formation or not → similar results (low at.%)? Higher Pt content better → Not true for Pd! Ge Kang et al., IEEE Transactions on Nanotechnology, vol. 11, no. 4, 2012 Zhang et al., Recent advances in electronics, hardware, wireless and optical communications, 2010 Zhang et al., IEEE Transactions on Nanotechnology, vol. 9, no. 2, 2010 Majhi et al., Electrochemical and Solid-State Letters 12 (11), H402-H404, 2009
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C interlayer affect contact performance? The diffusion of elements;
SiC: C interlayer affect contact performance? The diffusion of elements; Phase formation and texture; Ge: How do Pt or Pd stabilize contacts?
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X-ray diffraction → texture
Strong texture No texture
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Preliminary results: XRD real time
Ge - realtime X-ray diffraction Preliminary results: XRD real time 20nm Ni 0.3nm Pt + 20nm Ni HEX ɛ-Ni5Ge3 HEX ɛ-Ni5Ge3 NiGe NiGe Ni Ni 1nm Pt + 20nm Ni 4nm Pt + 20nm Ni Pt germanide NiGe NiGe Ni Ni
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Ge - realtime X-ray diffraction
20nm Ni 0.3nm Pd + 20nm Ni HEX ɛ-Ni5Ge3 HEX ɛ-Ni5Ge3 NiGe NiGe Ni Ni 1nm Pd + 20nm Ni 4nm Pd + 20nm Ni HEX ɛ-Ni5Ge3 NiGe NiGe Ni ?PdGe + Ni3Ge
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SiC – realtime X-ray diffraction
20nm Ni SiC Ni23Si2 + Ni74Si26 Ni2Si Ni Ni31Si12 6nm Ni SiC Ni74Si26 Ni2Si + C Ni Ni31Si12
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Future work Confirm phases/textures detected
Elements diffusion – Ion Beam techniques SiC – Determine critical thickness Ge – Explore differences Pt or Pd
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Modification damage Electrical contacts Detection
Work Package 2 Exploring Novel Materials Systems - Semiconductors Modification damage Electrical contacts Detection
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A BIG thank you. SPRITE and Partners. Promotors
A BIG thank you SPRITE and Partners Promotors Universities and Institutes Karen, Francine and Eduardo YOU
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