1. Effect of Heat Treatment on Properties of Sputtered Co100-xCux Film
G. Chaloeipote and W. Rattanasakulthong
Department of Physics, Faculty of Science,
Kasetsart University, Chatuchak, Bangkok, 10900, Thailand

2. Outline Introduction Experimental procedures Results and discussion
Conclusions

3. Granular magnetic films
Introduction 3
Granular magnetic films
Magnetic (Ni, Co and Fe )
H=0
Non-magnetic (Cr, Ag and etc.)
H≠0

4. Introduction 4 Applications Hard disk head Magnetic sensor Biosensors
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Biosensors
Memory

5. Introduction 5
Effect of heat treatment on the morphological, structural and magnetic properties of CoCu film

6. Experimental procedure6
RF-sputtering W
1.0 x 10-5 mbar
in Argon 90 min
400 °C for 30 min Ar atmosphere Ar
The Co100-xCux thin films
Glass substrate

7. Magnetic Measurement : VSM Chemical Composition : EDX
Experimental procedure 7
Phase Structure :
XRD
Magnetic Measurement : VSM
Surface Morphology
: AFM and SEM
Chemical Composition : EDX

8. Results and Discussion

9. Fig. 1 Phase Structure of annealed Co-Cu thin films from XRD8
annealed at 400°C
31°
37°
39°
45°
59°
36°
CuO (020)
Co3O4 (511)
Cu (111)
Co (220)
Fig. 1 Phase Structure of annealed Co-Cu thin films from XRD

10. 9 Scherrer’s Equation Films Average crystallite size (nm)
Wave length of X-Ray
Average crystallite size
Angle of Bragg’s diffraction
FWHM
 Films
Average crystallite size (nm)
CuCoO,Co3O4
(311)
(222)
Co3O4
(220)
Co81Cu19
33.39 -
35.48
Co60Cu40
41.05
23.98
48.78
Co46Cu54
29.14
24.38
24.70
Co35Cu65
32.45
23.56
32.56
Co24Cu76
30.50
24.56
32.16
CuCoO,Co3O4(311)
CuCoO,Co3O4(222)
Co3O4(220)
Co81Cu19
Co60Cu40
Co46Cu54
Co35Cu65
Co24Cu76

11. Fig. 2 Mapping result of annealed Co-Cu thin films from EDX10
Co81Cu19
Co24Cu76
Co35Cu65
Co46Cu54
Co60Cu40
Co atom
Cu atom
Fig. 2 Mapping result of annealed Co-Cu thin films from EDX

12. Fig. 3 Surface morphology of annealed Co-Cu thin films from AFM11
Co81Cu19
Co60Cu40
Co46Cu54
Co35Cu65
Co24Cu76
Fig. 3 Surface morphology of annealed Co-Cu thin films from AFM

13. Surface roughness of annealed Co-Cu thin films from AFM12
Roughness (nm) 19 40 54 65 76
% Cu

14. 13 Perpendicular Magnetic Field
Fig. 4 Hysteresis loop of annealed Co-Cu thin films from VSM

15. 14 Parallel Magnetic Field
Fig. 5 Hysteresis loop of annealed Co-Cu thin films from VSM

16. Conclusions
The annealed CoCu films showed Co(220), Cu(111) and oxide phases of CuCoO(222) Co3O4 in (222), (311) and CuO(-111).
The surface roughness of annealed CoCu films is decreased with increasing Cu from 19 to 65 % but it is increased with increasing Cu 76%.
The annealed CoCu films show ferromagnetic phase in perpendicular direction. Whereas films show paramagnetic phase in parallel direction.
Heat treatment affects on properties by virtual of phase, distribution and surface.

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