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Date of download: 10/29/2017 Copyright © ASME. All rights reserved.

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1 Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4): doi: / Figure Legend: Schematic representations of (a) CAD model slicing strategy in bulk lithography and (b) cured depth experimental setup and 3D microfabrication using bulk lithography [19]

2 Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4): doi: / Figure Legend: Experimental results of dimensionless cured depth against dimensionless energy at constant duration (s) of exposure for TMPTA-based resin (a) under lower energy exposure and comparison with published results and (b) under wide range of energy exposure [19]

3 Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4): doi: / Figure Legend: Experimental results of dimensionless cured depth against dimensionless energy at constant duration (s) of exposure along with proposed cure depth model: (a) resin, TMPTA and (b) resin, HDDA

4 Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4): doi: / Figure Legend: Variation of parameter “a” and “b” against exposure time for TMPTA-based resin

5 Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4): doi: / Figure Legend: SEM image of lateral surface of the 3D microstructure fabricated using conventional scanning MSL

6 Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4): doi: / Figure Legend: SEM image of the variable depth microstructure (sine wave) using bulk lithography corresponding to (a) regime I and (b) regime II

7 Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4): doi: / Figure Legend: Fabrication of microstructure having variable cured depth along radial direction


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