1. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Experimental ALD system with residual gas analyzer (RGA) to characterize the methane emissions

2. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Contour plots of gaseous species distributions and the bulk species deposition rates: (a) 0.02 s at the end of TMA pulse and (b) 10.04 s at the end of water pulse

3. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Gaseous species distributions during the full Al2O3 ALD cycle

4. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Surface coverage for the main surface species during the full ALD cycle

5. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Contour plots of surface coverage and precursor distributions in the entire ALD system: (a) 0.02 s at the end of TMA pulse and (b) 10.04 s at the end of water pulse

6. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Correlation of the bulk species deposition rate and precursors concentration during the ALD cycle

7. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Effects of chamber temperatures on the process wastes and emissions: (a) precursor dosage, precursor wastes, and methane emissions and (b) film growth rate and precursor waste rate

8. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Effects of pulse time on the process wastes and emissions: (a) precursor dosage, precursor wastes, and methane emissions and (b) film growth rate and precursor waste rate

9. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Effects of purge time on the process wastes and emissions: (a) precursor dosage, precursor wastes, and methane emissions and (b) film growth rate and precursor waste rate

10. Date of download: 11/6/2017
Copyright © ASME. All rights reserved.
From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films
J. Manuf. Sci. Eng. 2016;138(10): doi: /
Figure Legend:
Effects of carrier gas flow rate on the process wastes and emissions: (a) precursor dosage, precursor wastes, and methane emissions and (b) film growth rate and precursor waste rate