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CMOS Inverter First Glance
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The CMOS Inverter: A First Glance
out C L DD
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CMOS Inverter N Well V DD PMOS 2l Contacts Out In Metal 1 Polysilicon
NMOS GND
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Two Inverters Share power and ground Abut cells Connect in Metal
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CMOS Inverter First-Order DC Analysis
DD V DD Rp VOL = 0 VOH = VDD VM = f(Rn, Rp) Vout Vin = 0 Vin = 1 Vout Rn
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CMOS Inverter: Transient Response
DD DD t pHL = f(R on .C L ) = 0.69 R C R p V out V out C L C t V out DD R on C L 1 0.5 0.36 L R n V 5 V 5 V in in DD (a) Low-to-high (b) High-to-low
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CMOS Voltage Transfer Characteristic
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The CMOS Inverter VTC:
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PMOS Load Lines S G D D G S V I V = V -V = V +V I = - I V = V -V = V
out I Dn V = V -V in DD SGp = V +V DD GSp D I = - I Dn Dp V = V -V = V +V D out DD SDp DD DSp G S V DSp I Dp GSp =-2.5 =-1 V DSp I Dn in =0 =1.5 V out I Dn in =0 =1.5 V in = V DD +V GSp I Dn = - I Dp V out = V DD +V DSp
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CMOS Inverter Load Characteristics
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CMOS Inverter VTC
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Switching Threshold as a function of Transistor Ratio
10 1 0.8 0.9 1.1 1.2 1.3 1.4 1.5 1.6 1.7 1.8 M V (V) W p /W n
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Determining VIH and VIL
OH OL in out M IL IH A simplified approach
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Inverter Gain
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Gain as a function of VDD
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Simulated VTC
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Impact of Process Variations
0.5 1 1.5 2 2.5 V in (V) out Good PMOS Bad NMOS Good NMOS Bad PMOS Nominal
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MOS Capacitances Dynamic Behavior
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MOS Transistor 3-D perspective
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Dynamic Behavior of MOS Transistor
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The Gate Capacitance x L Polysilicon gate Top view Gate-bulk overlap
d L Polysilicon gate Top view Gate-bulk overlap Source n + Drain W t ox n + Cross section L Gate oxide
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Average Gate Capacitance
Different distributions of gate capacitance for varying operating conditions Most important regions in digital design: saturation and cut-off
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Gate Capacitance Capacitance as a function of VGS
(with VDS = 0) Capacitance as a function of the degree of saturation
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Measuring the Gate Cap by Simulation
_ 16 X 10 10 9 V GS 8 I 7 6 Gate Capacitance (F) 5 4 Gate Capacitance (F) 3 2 -2 -1.5 -1 -0.5 0.5 1 1.5 2 V (V) GS
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Diffusion Capacitance
Channel-stop implant N 1 A Side wall Source W N D Bottom x Side wall j Channel L S Substrate N A
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Junction Capacitance
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Linearizing the Junction Capacitance
Replace non-linear capacitance by large-signal equivalent linear capacitance which displaces equal charge over voltage swing of interest
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Cpacitive Device Model
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Capacitances in 0.25 mm CMOS process
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Computing the Capacitances
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CMOS Inverters V DD PMOS 1.2 m m =2l Out In Metal1 Polysilicon NMOS
GND
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The Miller Effect
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Computing the Capacitances
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Propagation Delay
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CMOS Inverter Propagation Delay Approach 1
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CMOS Inverter Propagation Delay Approach 2
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Transient Response ? tp = 0.69 CL (Reqn+Reqp)/2 tpLH tpHL
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Design for Performance
Keep capacitances small Increase transistor sizes watch out for self-loading! Increase VDD (????)
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Delay as a function of VDD
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Device Sizing (for fixed load) Self-loading effect:
Intrinsic capacitances dominate
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NMOS/PMOS ratio tpLH tpHL tp b = Wp/Wn = 1.9
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Impact of Rise Time on Delay
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