1. Technical review August-2017 E-beam Lithography

2. CD Trend chart for August 2017, Raith e-line,
Process Details:
Resist: PMMA 950 A2
Spin coating : 6000rpm , 45 seconds.
Pre Bake: Hot plate: 170°C for 120 seconds
Exposure: EHT: 20KV, Aperture : 20um
Dose: 300pc
Development: 40sec in MIBK(1:3),7 degree Celsius
20.2nm
37.8nm
41nm
39.1nm
22.16nm
Developed at 7 degree celsius

3. Raith pioneer, Process Details: 21.5nm 20nm 36.18nm 39nm
Resist: PMMA 950 A2
Spin coating : 6000rpm , 45 seconds.
Pre Bake: Hot plate: 170°C for 120 seconds
Exposure: EHT: 20KV, Aperture : 20um
Dose: 300pc
Development: 30sec in MIBK(1:3)
21.5nm
19.5nm
20nm
38.7nm
36.18nm
39nm
Developed in room temperature