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Solution-Processed Zinc Oxide Field-Effect Transistors Based on Self-Assembly of Colloidal Nanorods EE C235 Tim Bakhishev.

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Presentation on theme: "Solution-Processed Zinc Oxide Field-Effect Transistors Based on Self-Assembly of Colloidal Nanorods EE C235 Tim Bakhishev."— Presentation transcript:

1 Solution-Processed Zinc Oxide Field-Effect Transistors Based on Self-Assembly of Colloidal Nanorods
EE C235 Tim Bakhishev

2 Why Solution Processing?
Flexible Substrates - Displays, Packaging, Solar Cells Low Cost Low Temperature Environmentally Friendly

3 Process Step 1 – Preparation of ZnO Nano-Spheres and Nano-Rods
Zinc Acetate [Zn(Ac)2] Methanol [CH3OH] Potassium Hydroxide [KOH] Water, Temp, Time Nano-Spheres or Nano-Rods

4 Process Step 2 – Post-Deposition Growth
(i) Spin-Cast Nano-Spheres/Rods Anneal (230 ºC) (ii) Submerge in Aqueous Solution of: - Zinc Nitrate - Ethyldiamine (iii) Growth at 90 ºC (iv) N2/H2 Anneal (200 ºC)

5 Without Post-Deposition
Results Without Post-Deposition Nano-Spheres Ion/Ioff = 5 x 103 μ.sat= 4.6 x 10-4 cm2/V-s (b) Nano-Rods Ion/Ioff = 1.1 x 105 μ.sat= cm2/V-s

6 Results Effects of Post-Deposition (a) As-Deposited
Ion/Ioff = 1.1 x 105 μ.sat= cm2/V-s (b) After Post-Deposition Ion/Ioff = 3 x 105 μ.sat= 0.6 cm2/V-s Post-Deposition Effects: Vt shift Increased Leakage (higher intrinsic conductivity) Only Marginal Improvement for Nano-Spheres Kink ???

7 Results Effects of Post-Deposition
(a) Nano-Rods (b) Nano-Spheres The film is “well packed” as-deposited No structural benefit of Post-Dep Orientation is Preserved Nano-Rods Fuse

8 Conclusion Low temperature ZnO FET process is demonstrated Questions:
- Size Effects - Post-Deposition effects Carrier concentration, conduction mechanism, electrostatics, defect density


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