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Diffractive optics for the XFEL
Applied Physics Diffractive optics for the XFEL Ulrich Vogt Biomedical and X-Ray Physics Department of Applied Physics Royal Institute of Technology (KTH) Stockholm, Sweden FEL optics group: Anders Holmberg, Julia Reinspach, Daniel Nilsson, and Hans Hertz Meeting of in-kind contributors to WPG 3, Hamburg, January 2009
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Motivation for diffractive optics
Zone plate Resolution: Typical drN: nm Focusing below 100 nm is relatively easy Low disturbance of wavefront quality Easy to use in practice
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Fabrication of diffractive optics
E-beam resist + etch mask material layer Plating mold + Plating base Substrate E-beam lithography, development, RIE RIE in material RIE in mold Electroplating Final zone plate Stripping Final zone plate
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Challenges for FEL diffractive optics
New materials for substrate and optic Cooling schemes for high heat load Large diameter optics (> 1 mm2) Diffraction-limited performance (low aberrations) Metrology for efficiency and wavefront testing ”Mass production” of single-shot optics requires advanced research and development efforts
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XFEL activity focus on heat load management and suited materials for SASE 1 radiation (1 Å) includes theoretical and experimental studies new nanofabrication process necessary - substrate 100 µm CVD diamond bonded to larger heat sink - zone plate out of Gold, Tantalum, Tungsten … (>1 µm thickness !) moderate diameters (<1 mm) Similar problems as in Harald’s group (monochromator)
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XFEL activity 1 µm gold zone plate on 100 µm diamond after SASE1 monochromator
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