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(see Bowen & Tanner, High
Thin films (see Bowen & Tanner, High Resolution X-ray Diffractometry and Topography, Chap. 3) Common epilayer defects
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(see Bowen & Tanner, High
Thin films (see Bowen & Tanner, High Resolution X-ray Diffractometry and Topography, Chap. 3) Common epilayer defects Investigate using rocking curves
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(see Bowen & Tanner, High
Thin films (see Bowen & Tanner, High Resolution X-ray Diffractometry and Topography, Chap. 3) Common epilayer defects Investigate using rocking curves Layer & substrate peaks split rotation invariant
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Thin films Common epilayer defects Investigate using rocking curves
Layer & substrate peaks split varies w/rotation
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Thin films Common epilayer defects Investigate using rocking curves
Broadens layer peak invariant w/ beam size peak position invariant w/ sample position
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Thin films Common epilayer defects Investigate using rocking curves
Broadens layer peak may increase w/ beam size peak position invariant w/ sample position
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Thin films Common epilayer defects Investigate using rocking curves
Broadens layer peak increases w/ beam size peak position varies w/ sample position
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Thin films Common epilayer defects Investigate using rocking curves
Layer & substrate peaks split splitting different for symmetric & asymmetric reflections
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Thin films Common epilayer defects Investigate using rocking curves
Various effects vary w/ sample position
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Thin films Investigate using rocking curves Film thickness
Integrated intensity changes increases w/ thickness Interference fringes
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Thin films Mismatch constrained relaxed
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d/d = – cot = m* (mismatch)
Thin films Mismatch Layer & substrate peaks split – rotation invariant Measure, say, (004) peak separation , from which d/d = – cot = m* (mismatch) constrained relaxed
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Thin films Misorientation First, determine orientation of substrate
rotate to bring plane normal into counter plane do scans at this position and at + 180° orientation angle = 1/2 difference in two angles = 90°
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Thin films Misorientation First, determine orientation of substrate
Layer tilt (assume small) layer peak shifts w/ in scans = 90° shift +
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Thin films Misorientation First, determine orientation of substrate
Layer tilt (assume small) layer peak shifts w/ in scans = 90° shift –
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Thin films Misorientation First, determine orientation of substrate
Layer tilt (assume small) layer peak shifts w/ in scans = 90° no shift
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Thin films Misorientation First, determine orientation of substrate
Layer tilt (assume small) layer peak shifts w/ in scans = 90° no shift
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Thin films Dislocations From: high mismatch strain, locally relaxed
local plastic deformation due to strain growth dislocations
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Thin films Dislocations From: high mismatch strain, locally relaxed
local plastic deformation due to strain growth dislocations Estimate dislocation density from broadening (radians) & Burgers vector b (cm): = 2/9b2
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Thin films Curvature R = radius of curvature, s = beam diameter
angular broadening = s/R = beam radius broadening 5 mm m "
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Thin films Relaxation Need to measure misfit parallel to interface
Both mismatch & misorientation change on relaxation Interplanar spacings change with mismatch distortion & relaxation – changes splittings
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Thin films Relaxation Need to measure misfit parallel to interface
Both mismatch & misorientation change on relaxation So, also need misfit perpendicular to interface Then, % relaxation is
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Thin films Relaxation Grazing incidence Incidence angle usually
very low….~1-2° Limits penetration of specimen reflecting plane
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Thin films Relaxation Grazing incidence Incidence angle usually
very low….~1-2° Limits penetration of specimen Penetration depth – G(x) = fraction of total diffracted intensity from layer x cm thick compared to infinitely thick specimen
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Thin films Relaxation Grazing incidence Incidence angle usually
very low….~1-2° Limits penetration of specimen Penetration depth – G(x) = fraction of total diffracted intensity from layer x cm thick compared to infinitely thick specimen
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Thin films Relaxation Grazing incidence Incidence angle usually
very low….~1-2° Reflection not from planes parallel to specimen surface reflecting plane
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Thin films Relaxation Grazing incidence
If incidence angle ~0.1-5° & intensity measured in symmetric geometry (incident angle = reflected angle), get reflectivity curve
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Thin films Relaxation Need to measure misfit parallel to interface
Use grazing incidence e.g., (224) or (113)
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Thin films Relaxation Use grazing incidence e.g., (224) or (113)
Need to separate tilt from true splitting Tilt effect reversed on rotation of = 180° Mismatch splitting unchanged on rotation
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Thin films Relaxation Use grazing incidence e.g, (224) or (113)
For grazing incidence: i = + – splitting betwn substrate & layer
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Thin films Relaxation Use grazing incidence e.g, (224) or (113)
For grazing incidence: i = + e = – Can thus get both and
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Thin films Relaxation Also, And
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Thin films Relaxation Also, And Finally
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Thin films Homogeneity
Measure any significant parameter over a grid on specimen Ex: compositional variation get composition using Vegards law measure lattice parameter(s) – calculate relaxed mismatch
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Thin films Homogeneity
Measure any significant parameter over a grid on specimen Ex: variation of In content in InAlAs layer on GaAs
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Thin films Thickness For simple structure layer, layer peak integrated intensity increases monotonically w/ thickness calculated curves
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Thin films Thickness For simple structure layer, layer peak integrated intensity increases monotonically w/ thickness Note thickness fringes Can use to estimate thickness calculated curves
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Thin films Thickness For simple structure layer, layer peak integrated intensity increases monotonically w/ thickness calculated curves
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