1. Nanocrystal Diamond SEE Layer for MCP’s
Qing Peng, Anil U. Mane, Jeffrey W. Elam
Energy Systems
Anirudha V. Sumant
Center for Nanoscale Materials
Jokela, Slade J.; Veryovkin, Igor V.
Material Science Division
Henry J. Frisch
HEP
Argonne National Laboratory

2. Motivation
To achieve well-defined strike in the operation of MCPs, which could significantly decrease the widths of the transition time spread and single photon charge distributions.

3. Microchannel Plate (MCP) Configuration
Functionalized
by ALD
Electrode
Coating
Cross section
Top view
Dia: um

4. High SEE for Enhancement of Signal
Electrode layer
ALD SEE layer
High SEE layer
From Diamond
Resistive layer
Substrate

5. Diamond as High SEE candidate by PECVD
Ultrananocrystal Diamond by CNM-ANL
At <400C

6. Nanocrystal Diamond Film as Substrate for SEE testing
Substrate for diamond:
Si substrate with W coating ( W is the nucleation layer for diamond)
Thickness of the diamond: nm
Si substrate size is around 1 inch square.

7. The nanocrystal diamond as high SEE layer
Deposition conditions:
Deposition Temperature <450C.
Size of diamond crystal is 2-5 nm
98% diamond phase
Electrical insulating
Position of diamond coating:
Top surface of MCP above the electrode coating
Top um section of the channels
Concerns:
It is better to remove the solution based seeding process for diamond growth
What kind of aspect ratio structure, the diamond film could be deposited into.