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Lecture 7 OUTLINE Poisson’s equation Work function

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1 Lecture 7 OUTLINE Poisson’s equation Work function
Metal-Semiconductor Contacts Equilibrium energy band diagrams Depletion-layer width Reading: Pierret 5.1.2, ; Hu 4.16

2 Poisson’s Equation Gauss’ Law: E(x) E(x+Dx) s : permittivity (F/cm)
area A E(x) E(x+Dx) Dx s : permittivity (F/cm)  : charge density (C/cm3) EE130/230M Spring 2013 Lecture 7, Slide 2

3 Charge Density in a Semiconductor
Assuming the dopants are completely ionized: r = q (p – n + ND – NA) EE130/230M Spring 2013 Lecture 7, Slide 3

4 Work Function E0: vacuum energy level FM: metal work function
FS: semiconductor work function EE130/230M Spring 2013 Lecture 7, Slide 4

5 Metal-Semiconductor Contacts
There are 2 kinds of metal-semiconductor contacts: rectifying “Schottky diode” non-rectifying “ohmic contact” EE130/230M Spring 2013 Lecture 7, Slide 5

6 Ideal M-S Contact: FM > FS, n-type
Band diagram instantly after contact formation: qVbi = FBn– (Ec – EF)FB Equilibrium band diagram: n Schottky Barrier Height: W EE130/230M Spring 2013 Lecture 7, Slide 6

7 Ideal M-S Contact: FM < FS, n-type
Band diagram instantly after contact formation: Equilibrium band diagram: EE130/230M Spring 2013 Lecture 7, Slide 7

8 Ideal M-S Contact: FM < FS, p-type
semiconductor Band diagram instantly after contact formation: Equilibrium band diagram: Schottky Barrier Height: FBp qVbi = FBp– (EF – Ev)FB W EE130/230M Spring 2013 Lecture 7, Slide 8

9 Ideal M-S Contact: FM > FS, p-type
semiconductor Band diagram instantly after contact formation: Equilibrium band diagram: EE130/230M Spring 2013 Lecture 7, Slide 9

10 Effect of Interface States on FBn
Ideal M-S contact: FBn = FM – c Real M-S contacts: A high density of allowed energy states in the band gap at the M-S interface “pins” EF to be within the range 0.4 eV to 0.9 eV below Ec FM FBn EE130/230M Spring 2013 Lecture 7, Slide 10

11 Schottky Barrier Heights: Metal on Si
FBn tends to increase with increasing metal work function EE130/230M Spring 2013 Lecture 7, Slide 11

12 Schottky Barrier Heights: Silicide on Si
Silicide-Si interfaces are more stable than metal-silicon interfaces and hence are much more prevalent in ICs. After metal is deposited on Si, a thermal annealing step is applied to form a silicide-Si contact. The term metal-silicon contact includes silicide-Si contacts. EE130/230M Spring 2013 Lecture 7, Slide 12

13 The Depletion Approximation
The semiconductor is depleted of mobile carriers to a depth W In the depleted region (0  x  W ): r = q (ND – NA) Beyond the depleted region (x > W ): r = 0 EE130/230M Spring 2013 Lecture 7, Slide 13

14 Electrostatics Poisson’s equation: The solution is:
EE130/230M Spring 2013 Lecture 7, Slide 14

15 Depletion Width, W At x = 0, V = -Vbi W decreases with increasing ND
EE130/230M Spring 2013 Lecture 7, Slide 15

16 Summary: Schottky Diode (n-type Si)
metal FM > FS n-type Si Eo cSi FM qVbi = FBn – (Ec – EFS)FB FBn Ec EF Depletion width Ev W EE130/230M Spring 2013 Lecture 7, Slide 16

17 Summary: Schottky Diode (p-type Si)
FM < FS metal p-type Si Eo cSi Ec FM EF Depletion width Ev FBp qVbi = FBp– (EF – Ev)FB W EE130/230M Spring 2013 Lecture 7, Slide 17


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