1. Presentation Title Here

2. Mega Fluid System Business
Global supplier, leader, and center of excellence for the design and manufacture of slurry and UHP chemical delivery systems for > 20 years
Largest installed base > 1,250 tools worldwide
Supplying 4 – 14/16nm node Fabs with tools today
Developing Systems for Expanding Legacy Systems (200mm)
Provide global Field Service support and training
Maintain an integrated supply chain management system
CMP R&D Lab w/ full-scale tools for developing systems, analytics & components
Joint development with most large CMP slurry suppliers
Documented knowledge of slurry and chemical properties and optimal handling

3. Our Vision & Mission VISION:
To engage with industry leaders to provide innovative and complete liquid blend and delivery solutions that enhance our customers’ success.
MISSION:
Mega Fluid Systems is a trusted industry supplier of high-performance blend and delivery systems in semiconductor, solar, and emerging manufacturing applications. We achieve this by:
Collaborating with our customers and suppliers to solve complex problems and enhancing cost of ownership
Executing with efficiency and delivering on commitments
Infusing integrity and quality into everything we do.

4. 2014 Accomplishments Developed R&D System for Custom Blends – ProQual™
Shortens time to qualify new processes
Tightens correlation to full production systems
Modular platform for expansion or modification
Successfully implemented by Fab Customers
Designed Chemical MegaBlend System in Modular Platform
Lower Cost base, accommodates modular expansion and retrofits.
18 L/min High Volume Slurry & Chemical Blend/Dispense Platform
12 different slurry and chemical blends with appropriate analytics
Successfully implemented in HVM Fabs
Developed Strategic Alliances with Partners for Ramps & Full Support
Assemblers, Installers & Field Service
Analytics Companies & Slurry Suppliers
Combined Slurry Dispense and Filter into 1 SBD Cabinet
Requested by Key Customer,,
Smallest footprint complete blend and filtration system in the industry

5. 2014 Accomplishments Sales and Service
~3x Increase Revenue 2014 over 2013
Products Shipped to New Major Customers with Excellent Results
Pursuing Customers Outside of Semi
First Turn-Key Contract for CMP Room Management
Expanded Field Service Organization
Operations
No Reportable Safety Incidents
Shipped > 30 Tools, > 70 VMBs, and Ancillary Equipment
Implemented Pure Safety Program
Implemented Concentric Ring Strategy for Growth

6. Integrated Systems, Engineering and R&D
Design Engineering
Manufacturing Engineering
Custom Engineering Specials
Software Design and Testing
Manufacturing
Controls Integration
System Integration
Functional Testing
Field Service & Support
Warranty Support
Spare Parts
Global Support Locations
CAD
ProE Wildfire 5
SolidWorks
ProPipe
AutoCAD (Mechanical and Electrical)
MasterCAM
Windchill Vaulting System
ERP & PLM
Dynamix AX
BlueStar
Windchill
Analysis
AFT Fathom – Fluid System Modeling (flow, pressure, blend, etc.)
MathCAD
JMP
ProMechanica
Controls and Automation
Rockwell, Siemens, Indusoft, Omron, Panasonic
LabView
C, C++, VB

7. Slurry Blending & Distribution Solutions
SBD25
Slurry Blend & Distribution
SBD100
Slurry Blend & Distribution
SA200
Particle Measurement
SF200
Slurry Filtration
SA100
Slurry Analytical

8. Mega Partners with Fabs & Slurry Suppliers
Mega Continuously Optimizing Systems for Fab Performance Demands
Evaluate Slurries in Mega R&D Lab to Optimize Slurry Quality & Tool Availability
Understand and Optimize Blend & Delivery Systems for Slurry Needs
Slurry Particle unique requirements
Developing New Systems to Monitor Slurry Quality
As Fab Needs Evolve, Develop New Supporting Systems, examples:
Particle Distribution in Line (esp. Barrier Slurries)
In-Line H2O2 Concentrations <1%
Continued Learning on Large Particle Analytics
Mega ProQual for Slurry/CMP Process Yield & Cost Optimization
Wet Chemicals – Specialty Cleans and Strips
Slurries – Optimize Dilution, Oxidizers, etc.

9. Research and Development Lab
R&D Lab at Mega Fluid Systems Tualatin, Oregon site
Full-scale tools for process development, analytics and component testing
Complete array of slurry characterization tools to address nanoslurries
Simulation of single and dual global loop configurations and POU consumption (300 meters total with 6 meter rise, up to 20 LPM per loop)
Running several tests in slurry and chemical simultaneously

10. Optimizing Systems for Advanced Slurries
11/17/2018
Optimizing Systems for Advanced Slurries
Example HVM Fab Customer
Simulated operational performance in global loops modeled on customer design for Priority Slurries
Ceria
Slurry with H2O2 and Polymer coated Alumina
Silicas: Cu, Barrier and W
Identified operational outliers and areas of concern that need to be understood and accommodated prior to full production (including Analytics issues)
Worked with Slurry Suppliers for their learning and support
Provided data to customer to utilize in the process of creating operational guidelines to optimize process control and minimize risk factors

11. Example: Tungsten Slurries
Fumed or Colloidal Silica or Polymer Coated Alumina particles with >0.5% H2O2, pH
Process Concern
MFS Addresses Concerns
Explanation
Removal Rate Reproducibility
Engineered tank mixing
Need to keep particles suspended without shear; protect the stern layer for silicas & protect polymer coating for W8xxx slurries.
Removal rates are a function of nominal particle size, particle concentration, pH & H2O2
Mixing in blend/day tanks optimized for the slurry reduces settling & RR variation.
Temperature controlled systems
Precise dilution & chemical dosing (H2O2)
Analytical capability to monitor slurry density, pH, H2O2, chemical concentration, particle size & size distribution, etc.
Dishing / Erosion
Precise chemical dosing (H2O2), dilution and mixing
Dishing & Dielectric Erosion may vary with temperature, particle size, particle concentration, pH & H2O2.
Analytical capability to monitor pH, H2O2, slurry density, etc.
Scratching
Low shear system components and in tank mixing
High shear can cause silica particle agglomeration (or pull polymer of particles), resulting in scratches on wafers. Correct filtration can reduce numbers of large particles without removing “good” particles.
State of the art filtration.
Analytical capability to monitor large particles
Maximize CMP Tool Availability
Near 0 downtime due to system component redundancy
CMP tool availability already difficult with pad life, etc. Slurry delivery should have no negative affect on availability

12. Colloidal Silica Particles with H2O2
Cu Bulk Slurries
Colloidal Silica Particles with H2O2
Process Concern
MFS Addresses Concerns
Explanation
Removal Rate Reproducibility
Engineered tank mixing
Need to keep particles suspended without shear; protect the stern layer – diffuse layer separation that keeps the slurry particles in suspension.
RR is a function of nominal particle size, particle concentration, temperature, pH, chemistry, H2O2 concentration, etc.
Constant temperature systems
Precise dilution & chemical dosing (H2O2)
Analytical capability to monitor slurry density, pH, H2O2, chemical concentration, particle size & size distribution, etc.
Dishing / Corrosion
Precise chemical dosing (H2O2), dilution and mixing
Cu Dishing may change w/ temperature and vary with particle size, particle concentration, pH & H2O2.
Analytical capability to monitor pH, H2O2, slurry density, etc.
Scratching
Low shear system components and in tank mixing
High shear can cause silica particle agglomeration, resulting in scratches on wafers. Correct filtration can reduce numbers of large particles without removing “good” particles.
State of the art filtration.
Analytical capability to monitor large particles
Maximize CMP Tool Availability
Near 0 downtime due to system component redundancy

13. Low concentration colloidal silica particles with <1% H2O2
Cu Barrier Slurries
Low concentration colloidal silica particles with <1% H2O2
Process Concern
MFS Addresses Concerns
Explanation
Removal Rate Reproducibility
Engineered tank mixing
Need to keep particles suspended without shear; protect the stern layer – diffuse layer separation that keeps the slurry particles in suspension.
RR changes w/ pH & temperature, .
Cu:Barrier:Dielectric removal rate ratios are a function of nominal particle size, particle concentration, pH & H2O2
Constant temperature systems
Precise dilution & chemical dosing (H2O2)
Analytical capability to monitor slurry density, pH, H2O2, chemical concentration, particle size & size distribution, etc.
Dishing / Erosion
Precise chemical dosing (H2O2), dilution and mixing
Cu Dishing & Dielectric Erosion may change w/ temperature and vary with particle size, particle concentration, pH & H2O2.
Analytical capability to monitor pH, H2O2, slurry density, etc.
Scratching
Low shear system components and in tank mixing
High shear can cause silica particle agglomeration, resulting in scratches on wafers. Correct filtration can reduce numbers of large particles without removing “good” particles.
State of the art filtration.
Analytical capability to monitor large particles
Maximize CMP Tool Availability
Near 0 downtime due to system component redundancy

14. CMP Slurry Analytics Particle Monitoring
Large Particle (e.g., Slurry Agglomerate) Monitoring
Particle Measuring Systems for 0.5 μm or 0.2 μm (minimum)
Vantage in-line SlurryScope (typical 1 μm minimum, but also monitors trends)
Other Techniques in R&D
Additive Concentration
Conductivity pH
Index of Refraction (Entegris Jetalon)
Auto-Titrator
KPatents H2O2 Analysis
New Proprietary System in Development

15. R&D Roadmap – Performance Driven
Parameter
 Year 
pre-2012
2014
2015
Particle size, precision
mean +/-0.5nm offline
size distribution online
Large particle count (slurry)
>0.5um dilution
≥1um non-dilution
>0.5um non-dilution
Specific gravity, precision +/ +/ +/
pH, precision
+/- 0.1 A/D far from probe
+/ digital
+/ digital
conductivity, precision
+/- 20 uS/cm A/D far from probe
+/- 5 uS/cm digital
+/- 2 uS/cm digital
Peroxide concentration, on-line accuracy
N/A
within 3% of manual titration
<0.5% H2O2
+/- 0.1%, within 2% manual titration

16. Summary of Mega Advantages
Highest Availability Slurry & Chemical Systems with Redundancy and Auto-Switching within Each System
Systems Optimized for Large, Medium or Small Blend and/or Distribution of Chemistries & Slurries
Extensive Knowledge/Insight into Slurry and Analyticals to Monitor Slurry Quality
Continued Development of Analytics for Monitoring and Measuring Slurry Quality
Understanding the Impact of Blend and Distribution Systems
Optimization of Blend & Dispense Systems to Optimize Slurry at CMP Tool POU
Working to Improve Both Performance & Yield for the Fab

17. Quality Policy We ensure compliance to our Quality Management System.
We empower our employees with the authority & responsibility to effect change to meet or exceed customer expectations.
We manage our systems and processes to provide safe, consistent and predictable results, with the speed and flexibility ensuring customer satisfaction.
We monitor performance and drive continual improvement to achieve greater results, securing Mega Fluid Systems as an industry leader.

18. We Are Mega Fluid Systems