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Properties of Dielectrics
Lecture 6.0 Properties of Dielectrics
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Dielectric use in Silicon Chips
Capacitors On chip On Circuit Board Insulators Transistor gate Interconnects Materials Oxides SiO2 Boro-Silicate Glass Nitrides BN polymers
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Importance of Dielectrics to Silicon Chips
Size of devices Electron Tunneling dimension Chip Cooling- Device Density Heat Capacity Thermal Conductivity Chip Speed Capacitance in RC interconnects
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Band theory of Dielectrics
Forbidden Zone–Energy Gap-LARGE Conduction Band Valence Band
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Difference between Semiconductors and Dielectrics
kBT = eV at 298˚K Material Eg(eV) Ge 0.67 Si 1.12 GaAs 1.43 SiO2 8 UO2 5.2 Ga2O3 4.6 Fe2O3 3.1 ZnO 3.2 NiO 4.2 Al2O3
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Fermi-Dirac Probability Distribution for electron energy, E
Probability, F(E)= (e{[E-Ef]/kBT}+1)-1 Ef is the Fermi Energy
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Number of Occupied States
Density of States Fermi-Dirac T>1000K only
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Probability of electrons in Conduction Band
Lowest Energy in CB E-Ef Eg/2 Probability in CB F(E)= (exp{[E-Ef]/kBT} +1)-1 ) = (exp{Eg/2kBT} +1)-1 exp{-Eg/2kBT} for Eg>1 298K exp{-(4eV)/2kBT}= 298K kBT = eV at 298˚K
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Intrinsic Conductivity of Dielectric
Charge Carriers Electrons Holes Ions, M+i, O-2 = ne e e + nh e h # electrons = # holes ne e (e+ h) ne C exp{-Eg/2kBT}
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Non-Stoichiometric Dielectrics
Metal Excess M1+x O Metal with Multiple valence Metal Deficiency M1-x O Reaction Equilibrium Keq (PO2)±x/2 +3 +4 +2 +3
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Density Changes with Po2
SrTi1-xO3
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Non-Stoichiometric Dielectrics
Excess M1+x O Deficient M1-x O
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Non-Stoichiometric Dielectrics
Ki=[h+][e-] K”F=[O”i][V”O] Conductivity =f(Po2 ) Density =f(Po2 )
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Dielectric Conduction due to Non-stoichiometry
N-type P-type
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Dielectric Intrinsic Conduction due to Non-stoichiometry
N-type P-type + h + h Excess Zn1+xO Deficient Cu2-xO
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Extrinsic Conductivity
Donor Doping Acceptor Doping n-type p-type Ed = -m*e e4/(8 (o)2 h2) Ef=Eg-Ed/2 Ef=Eg+Ea/2
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Extrinsic Conductivity of Non-stoichiometry oxides
Acceptor Doping p-type p= 2(2 m*h kBT/h2)3/2 exp(-Ef/kBT) Law of Mass Action, Nipi=ndpd or =nndn @ 10 atom % Li in NiO conductivity increases by 8 orders of magnitude @ 10 atom % Cr in NiO no change in conductivity
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Capacitance C=oA/d =C/Co =1+e e = electric susceptibility
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Polarization P = e E e = atomic polarizability
Induced polarization P=(N/V)q
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Polar regions align with E field
P=(N/V) Eloc i(Ni/V) i=3 o (-1)/(+2)
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Local E Field Local Electric Field Eloc=E’ + E E’ = due to
surrounding dipoles Eloc=(1/3)(+2)E
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Ionic Polarization P=Pe+Pi Pe = electronic Pi= ionic Pi=(N/V)eA
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Thermal vibrations prevent alignment with E field
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Polar region follows E field
opt= (Vel/c)2 opt= n2 n=Refractive index
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Dielectric Constant Material (=0) opt=n2 Diamond 5.68 5.66 NaCl
5.90 2.34 LiCl 11.95 2.78 TiO2 94 6.8 Quartz(SiO2) 3.85 2.13
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Resonant Absorption/dipole relaxation
Dielectric Constant imaginary number ’ real part dielectric storage ” imaginary part dielectric loss o natural frequency
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Dipole Relaxation Resonant frequency,o Relaxation time,
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Relaxation Time,
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Dielectric Constant vs. Frequency
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Avalanche Breakdown
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Avalanche Breakdown Like nuclear fission
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