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Add nitride Silicon Substrate
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Add Poly0 Silicon Substrate
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1st level mask (Poly0) using Photolithography
Patterning through 1st level mask (Poly0) using Photolithography Patterned Photoresist Photoresist Silicon Substrate
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Removal of Unwanted Poly0 using Reactive Ion Etching
Silicon Substrate Patterned Photoresist
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1st Oxide Deposition using LPCVD Silicon Substrate
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2nd level mask (Dimple) using Photolithography...
Patterning through 2nd level mask (Dimple) using Photolithography... and Deep RIE Photoresist Silicon Substrate
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3rd level mask (Anchor) using Photolithography
Patterning through 3rd level mask (Anchor) using Photolithography and Deep RIE Photoresist Silicon Substrate
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Blanket un-doped polysilicon deposition(Poly1) using LPCVD...
followed by PSG deposition and annealing Silicon Substrate
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using Photolithography...
Patterning through 4th level mask (Poly1) using Photolithography... and Deep RIE Photoresist Silicon Substrate
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Deposition of 2nd Oxide Layer Silicon Substrate
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Patterning through 5th level mask using photolithography and deep RIE
Silicon Substrate
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Patterning through 6th level mask using photolithography and deep RIE
Silicon Substrate
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Deposition of undoped polysilicon,
followed by PSG hardmask layer, then anneal Silicon Substrate
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Patterning through 7th level mask using photolithography and deep RIE
Silicon Substrate
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Patterning through 8th level mask using photolithography and liftoff,
followed by removal of unwanted resist and metal in solvent bath Silicon Substrate
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Release of structures using HF
Silicon Substrate
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