1. ALE APPLICATIONS
In Corial 210IL

2. ICP-RIE equipment for ALE applications
Corial 210IL
12/5/2018
ICP-RIE equipment for ALE applications
Enlarged functionality with capability to etch silicon, GaN, 2D materials, … at the atomic scale
Support time-multiplexed processes in conventional dry etch reactor
Smaller wafer pieces up to full 200 mm wafer
Corial 210IL ALE Applications

3. performances atomic scale etching on corial 210IL with cosma pulse software

4. Atomic scale process reminder
12/5/2018
Process Steps
Adsorption step
Formation of reactive monolayer
Purge step
Evacuation of the excess adsorbent species
Desorption step
Exposure of the reactive monolayer to form volatile species
Cleaning the reactor of all species
KEREN J. KANARIK et. al., Moving atomic layer etch from lab to fab, Solid State Technology 2014
Applications of Atomic Scale Etching
Power and RF&MW electronics
R&D, nanotechnology
nm-scale IC technology…
Corial 210IL ALE Applications

5. Atomic scale etching of silicon
12/5/2018
Process Steps
Advanced tuning of RF pulsing (red) to control ion energy
Independent and rapid pulsing of chlorine (blue) and argon (green) flows during adsorption and desorption steps
The laser signal shows an etch rate of
1.68 Å/cycle
Corial 210IL ALE Applications

6. Atomic scale etching of silicon
12/5/2018
Performances
Si wafer before etching
Roughness = nm
Si wafer after etching of 0.5 µm
Roughness = nm
Corial 210IL ALE Applications

7. Atomic scale etching of gan
12/5/2018
Process Steps
CORIAL process steps for GaN recess etch
Process steps
RF Power
(W)
Pressure
(mT)
Chemistry
Pulsed parameters
Step 1 - Adsorption 10 25
Cl2 Ar
Chlorine
Step 2 - Purge
Step 3 - Desorption
100
RF power
Weak RF plasma activation of Cl2 is used to enhance chlorination of GaN surface
Desorption of by-products is achieved in RIE mode by Ar+
Corial 210IL ALE Applications

8. CORIAL process steps for GaN recess etch
Atomic scale etching of gan
12/5/2018
Process Steps
CORIAL process steps for GaN recess etch
Corial 210IL ALE Applications

9. Atomic scale etching of gan
12/5/2018
Performances
2’’ Sapphire wafer
AlxGa1-xN / AlxGa1-xN <Si> / AlN stack
GaN
50 A
1.2 µm
Recess etch
CORIAL process performances
Process
Total process duration
(min)
Number of cycles
Period
(s)
Etch depth
(Å)
Etch rate
(Å/cycle)
(Å/min)
ALE GaN recess etch 20
300 6 50
0.4 4
Corial 210IL ALE Applications

10. Atomic scale etching of gan
12/5/2018
Performances
HEMT Transistor performances before (left curves) and after recess etching (right curves)
Higher transconductance is obtained
No deterioration of the drain current is obtained after ALE-like recess etching
Corial 210IL ALE Applications

11. Software description cosma pulse

12. COSMA Pulse is a control software that broadens conventional tools’ process capabilities to enable time-multiplexed processes

13. Cost effective upgrade
Cosma pulse benefits
12/5/2018
Advanced Process Control
Enhanced functionality
ALL PARAMETERS
CAN BE CONTROLLED AND PULSED
Short step times
10 ms
DATA AQUISITION
Cost effective upgrade
FOR CORIAL SYSTEMS INSTALLED AT CUSTOMERS’ SITES
Advanced process editing
SET TO, RAMP TO AND PULSE FUNCTIONS
+/-0,1%
ACCURACY
ON BIAS FINE TUNING
Corial 210IL ALE Applications

14. System description Corial 210IL

15. Corial 210IL ALE Applications
System description
12/5/2018
General View
THE MOST
COMPACT
MACHINE
ON THE MARKET
ICP source
960
750
360
1570
600
420
390
490
30 %
SMALLER FOOTPRINT
Corial 210IL ALE Applications

16. Corial 210IL ALE Applications
System description
12/5/2018
Detailed View
EPD with laser
ICP reactor
Load lock
Pumping system
(TMP 500l/s and dry pump 110 m3/h)
Chiller / Heater
HV and LV power supplies
ICP generator
(2 Mhz)
RF generator
(13,56 Mhz)
Process controller
Corial 210IL ALE Applications

17. < 180 s Vacuum robot Shuttle System description Loading 12/5/2018
LOADING TIME
Vacuum robot
FAST AND REPEATABLE LOAD AND UNLOAD
Shuttle
EASY EXCHANGE BETWEEN SUBSTRATE SHAPE AND SIZE
Corial 210IL ALE Applications

18. Shuttle holding approach corial 210IL

19. Shuttle holding approach
12/5/2018
Portfolio
Clamping ring
Quartz shuttle
Wafers
Wafer
Moving plate
O’rings
O’ring
Base plate
Aluminum table
Guaranteed no wafer damage due to SOFT wafer clamping
Corial 210IL ALE Applications

20. Shuttle holding approach
12/5/2018
Benefits
Quick adaptation to sample shape and size
Optimum process conditions with NO modification of process chamber
Limited cross contamination between processes by using dedicated shuttles
Shuttles for single wafer treatment: 1 x 2”, 1 x 3”, 1 x 4”, 1 x 6”, 1 x 8”
Shuttles for batch processing : 7 x 2”, 3 x 3”
Customized shuttles are available (4” x 4”, 5” x 5”, etc)
Corial 210IL ALE Applications

21. usability corial 210IL

22. Process control software
12/5/2018
COSMA
COSMA
CORIAL OPERATING SYSTEM FOR MACHINE
The simplest, most efficient software to develop processes, operate, and maintain CORIAL systems
DESKTOP APPLICATION
Process Editing I Process Adjustment I Process Operation I Process Tracability I System Maintenance
REMOTE CONTROL
MOBILE APPLICATION
Module & Process Follow-Up I Alarms & Warnings Connected Users
NEW
2018
Corial 210IL ALE Applications

23. Reprocessing software
12/5/2018
COSMA RS
DISPLAY UP TO 4
PARAMETERS FROM A RUN
Simple and efficient software to analyze process runs and accelerate process development
REMOTE
ANALYSIS OF RUNS
DRAG AND DROP
CURVES TO CHECK PROCESS REPEATABILITY
Corial 210IL ALE Applications

24. End point detection EPD with laser Real-Time etch rate measurement
12/5/2018
EPD with laser
A CCD camera and laser diode, in the same measuring head, enables simultaneous visualization of the wafer surface and the laser beam impact on it. A 20 µm diameter laser spot facilitates the record of interference signals.
Real-Time etch rate measurement
Real-Time etched depth measurement
Corial 210IL ALE Applications

25. ICP-RIE equipment for ALE applications
Corial 210IL
12/5/2018
ICP-RIE equipment for ALE applications
Enlarged functionality with capability to etch silicon, GaN, 2D materials, … at the atomic scale
Support time-multiplexed processes in conventional dry etch reactor
Smaller wafer pieces up to full 200 mm wafer
Corial 210IL ALE Applications