1. SIA in the US Association Update Shanghai, China February 21-23, 2011
12/31/2018 7:17 PM
SIA in the US
Association Update
Shanghai, China
February 21-23, 2011
Reed Content
GLOBALFOUNDRIES
Talking Points

2. SIA in US Update, ESH TF Shanghai, China, Feb. 21-23, 2011
12/31/2018 7:17 PM
Agenda
SIA in US ESH TF Delegation in Shanghai
Changes in the SIA in the United States
PFCs/Climate Issues
Completion of SIA’s Worker Health Study
India and China RoHS Advocacy
IHTESH 2011
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SIA in US Update, ESH TF Shanghai, China, Feb , 2011

3. SIA in US WSC ESH TF DELEGATION
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SIA in US WSC ESH TF DELEGATION
Reed Content, GLOBALFOUNDRIES – Chair, ESH-TF
Tim Yeakley, TI – Chair, PFOS WG
David Harman, Intel – Chair, PFCs WG
Dave Speed, IBM – PFOS WG
Bob Leet, Intel
Molly Gavin, Qualcomm
David Isaacs, SIA in US – Energy WG
Basil Falcone, JSR/SEMI (Observer)
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SIA in US Update, ESH TF Shanghai, China, Feb , 2011

4. SIA in US Update, ESH TF Shanghai, China, Feb. 21-23, 2011
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Changes at the SIA in US
EHS program
New staff – David Isaacs
Evaluate and set priorities, increase activity and results, improve structure and process
David’s previous experience:
Senior Vice President, Government Relations, Solazyme Inc.,
Renewable energy startup based in South San Francisco, CA
Director, Government Affairs for Hewlett-Packard Company
Directed HP’s global advocacy and policy efforts on environmental and energy issues, including product recycling, climate change and energy efficiency, material restrictions, and other matters  
EHS Director at the Electronic Industries Alliance (EIA)
Washington trade association representing all sectors of the electronics industry, directing the association’s environmental and energy policy initiatives at the state, federal, and global levels  
David Isaacs directs the Environment, Health and Safety activities of the Semiconductor Industry Association (SIA) in the United States.  Before joining SIA, David was Senior Vice President, Government Relations of Solazyme Inc., a leading renewable energy startup based in South San Francisco, California.  In that capacity he was responsible for securing government support for to advance Solazyme’s commercialization and research objectives.  He previously served as Director, Government Affairs for Hewlett-Packard Company, directing HP’s global advocacy and policy efforts on environmental and energy issues, including product recycling, climate change and energy efficiency, material restrictions, and other matters.  He began his work with the high tech industry with the Electronic Industries Alliance, a trade association representing all sectors of the electronics industry, directing the association’s environmental and energy policy initiatives at the state, federal, and global levels.  He started his career practicing environmental law in Washington, DC. 
David is a graduate of Tufts University and Columbia University School of Law, and he lives with his family in Washington, DC. 
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SIA in US Update, ESH TF Shanghai, China, Feb , 2011

5. PFCs/Climate Change Issues
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PFCs/Climate Change Issues
Climate legislation is unlikely in the current political landscape
Continued regulatory activity at EPA - Two primary EPA rules impacting the semiconductor industry
Greenhouse Gas Reporting Rule
SIA request for withdrawal of rule – denied
SIA filed two formal challenges January 31: Petition for review – legal challenge and Petition for reconsideration – agency review based on “new” objections
Ongoing discussions with EPA staff to reach an agreement on a revised rule
“Tailoring” Rule
Permitting rules and delay incompatible with rapid s/c industry innovation
SIA Goal – EPA to adopt an alternative approach to applying permitting to the S/C industry or provide an exemption; defer application for 3 years
SIA Actions include:
CEO meeting with the President
Ongoing discussions with White House staff
Numerous meetings with EPA staff to discuss SIA concerns and proposed solutions
High level attention from the Administration and EPA; ongoing discussions to address our concerns
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SIA in US Update, ESH TF Shanghai, China, Feb , 2011

6. WORKER HEALTH PROJECT OUTCOME
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WORKER HEALTH PROJECT OUTCOME
Published in The Journal of Occupational and Environmental Medicine (JOEM)
SIA Press Release - 11/10/2010: “VANDERBILT STUDY SHOWS NO INCREASED CANCER RISK FOR SEMICONDUCTOR INDUSTRY CLEANROOM WORKERS”
The study involved a review of work histories and assessment of chemical exposures for 100,081 workers employed in U.S. semiconductor companies between 1968 and 2002.
The principal finding of the study as stated by the researchers:
“Work in the US semiconductor industry, including semiconductor wafer fabrication in cleanrooms, was not associated with increased cancer mortality overall or mortality from any specific form of cancer.”
The study also found no evidence of increased mortality from all causes or from all cancers when comparing employees working in cleanrooms to non-fabrication workers.
12/31/2018
SIA in US Update, ESH TF Shanghai, China, Feb , 2011

7. SIA in US Update, ESH TF Shanghai, China, Feb. 21-23, 2011
India RoHS update
Progress to date
6 substances (vs 20 substances originally proposed)
Exemptions included
Exclusions for medical devices, large scale industrial products included
Compliance declaration not required
Concerns remain
De minimis threshold not included
Listing of product ingredient constituents; no CBI protection
Lacks exclusions for spare parts, R&D/test vehicles
Timeline
Final draft released informally in Dec 2010
Date of finalization uncertain
Influencing strategy
Continue to work via FICCI (local association)
Ramping up engagement with USG in advance of March WTO meets (opportunity for others to weigh-in with India before finalized too?)
Implementation workshop being considered (channel to address issues unresolved in regulatory process)
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SIA in US Update, ESH TF Shanghai, China, Feb , 2011

8. SIA in US Update, ESH TF Shanghai, China, Feb. 21-23, 2011
China RoHS update
Certification
We have been informed that there may be multiple forms of certification methods. Voluntary, compulsory and some other model.
The voluntary model is likely to be finalized in April 2011
Working parts of the voluntary model will be considered for the compulsory model – will likely inform the preferred procurement program
There is some agreement that IEC methods are being considered for alignment with China methods.
China will adopt some parts of the method as required that are currently in addendums of the current IEC standard
These will be required to be tested in labs certified by China
Data will be posted in a data storehouse – connection from raw material to finished product will not be stored but used to prove compliance – this is to address IP concerns
China is working to address industry concerns
We propose to amend our harmonization statement to add focus to IEC and ISO certified labs
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SIA in US Update, ESH TF Shanghai, China, Feb , 2011

9. Proposal for your consideration
RoHS Harmonization Statement - WSC Joint Statement:
The WSC agrees that responsible stewardship of the content of our electronic products is good for human health and the environment. However, the WSC also recommends that any government developing and implementing any program or supporting systems or programs for RoHS compliance certification would prove most effective when that government works with industry during the program development.
The WSC recommends harmonization between any mandatory or voluntary certification procedures already in place in the global community. This would include the recommendation for the use of test results from any internationally certified testing laboratory.
New text proposed – “This would include the recommendation for the use of IEC test results from any ISO certified international test laboratory.”
Additionally the WSC is concerned that production delays could result when mandatory and voluntary programs are established that require compliance certification prior to product shipment. In addition, some of the information describing the material used by our industry are considered to be company specific intellectual property, know how and trade secrets.
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SIA in US Update, ESH TF Shanghai, China, Feb , 2011

10. SIA in US Update, ESH TF Shanghai, China, Feb. 21-23, 2011
IHTESH 2011
SIA in the United States will host the IHTESH 2011
The conference will be held jointly with the SESHA Symposium (Semiconductor Environmental Safety and Health Association)
Location: Hilton Scottsdale Resort and Villas, Scottsdale AZ
Dates: May 16-20, 2011
Each country/regional SIA is asked to assist with the following:
Attend and provide an Association Update
Encourage members to submit abstracts and attend
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SIA in US Update, ESH TF Shanghai, China, Feb , 2011