1. “Bottoms-up Nanoscale Design”
  Ion Beam Lithography
“Bottoms-up Nanoscale Design”
Brian Ellis
First investigated by Goodenough in 1987, Lithium metal phosphate offer a good solution for the problems faced.
Due to the inductive effects of the bulky phosphate groups, the potential of the (Fe2+/Fe3+) couple is raised relative to the Standard Oxide making this a structure very attractive possibility
It is a Light, benign and relatively inexpensive Material with a good electrode potential compared to graphite
It is Non-Hygroscopic and the bulky phosphate groups also offer a stable framework which remains intact during cycling

2. Lithography Process Replication of a master pattern onto a substrate
Coat the substrate with a radiation-sensitive polymer film (a resist)
Expose specific area of film to radiation, which alters properties (solubility) of film
First investigated by Goodenough in 1987, Lithium metal phosphate offer a good solution for the problems faced.
Due to the inductive effects of the bulky phosphate groups, the potential of the (Fe2+/Fe3+) couple is raised relative to the Standard Oxide making this a structure very attractive possibility
It is a Light, benign and relatively inexpensive Material with a good electrode potential compared to graphite
It is Non-Hygroscopic and the bulky phosphate groups also offer a stable framework which remains intact during cycling

3. Ion Beam Lithography (IBL)
Ion beams: H+, He+, Ga+
Several implementations:
Focused IBL (direct writing)
Masked IBL (beam passes through ion-transparent membrane, patterned with absorber material, positioned close to coated substrate)
Resists: Polymethylmethacrylate (PMMA) is most common, Poly(butene-1-sulfone), Poly(2,2,2-trifluoroethyl-α-chloroacrylate)
Penetration of the particle beam is small, compared to electron beam
reduce blurring resulting from beam scattering (reduce proximity effect; increase localization, precision)
First investigated by Goodenough in 1987, Lithium metal phosphate offer a good solution for the problems faced.
Due to the inductive effects of the bulky phosphate groups, the potential of the (Fe2+/Fe3+) couple is raised relative to the Standard Oxide making this a structure very attractive possibility
It is a Light, benign and relatively inexpensive Material with a good electrode potential compared to graphite
It is Non-Hygroscopic and the bulky phosphate groups also offer a stable framework which remains intact during cycling

4. Ion Beam (H+, He+) Ionization region: plasma formed
Potential placed at extraction region removes ions from chamber
J. Melngailis et al. J. Vac. Sci. Tech. 16 (1998), 927.

5. Gallium Ion Beam Ion source: tungsten wetted with gallium
Ion extraction is observed by applying kV (VEXT)
Aperatures focus beam
Deflector directs the beam onto substrate
<1000 Å spots can be obtained
R. L. Kubena et al. App. Phys. Lett. 34 (1979), 310.

6. Etching a Gold Substrate
R. L. Kubena et al. J. Vac. Sci. Tech. 16 (1979), 1610.
First investigated by Goodenough in 1987, Lithium metal phosphate offer a good solution for the problems faced.
Due to the inductive effects of the bulky phosphate groups, the potential of the (Fe2+/Fe3+) couple is raised relative to the Standard Oxide making this a structure very attractive possibility
It is a Light, benign and relatively inexpensive Material with a good electrode potential compared to graphite
It is Non-Hygroscopic and the bulky phosphate groups also offer a stable framework which remains intact during cycling