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Published byLuiz Gustavo Felgueiras Álvares Modified over 6 years ago
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Nanolithography using DI Nanolithography Software for Explorer
PMMA C6 spun at 4000 RPM onto a Si(100) Substrate: thickness ~ 200 nm Baked at 115oC for 30 seconds Pattern scratched onto surface: Previously used NSC A tip did the actual writing T-B ~ -5 nA, Setpoint = 5 nA With feedback off, a relative z offset of 100 nm was added to the z scanner to move the tip closer to the surface Write speed was 1mm/s Before After
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Nanolithography: OU Symbol
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Nanolithography: OU Symbol - Zoom in
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Nanolithography: OU Symbol - Line Scan
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Nanolithography: OU Symbol - 3D View
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Nanolithography: Luke -first write
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Nanolithography: Vertical and Horizontal lines
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Nanolithography: Tip image Before and After
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