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Professor Ronald L. Carter ronc@uta.edu http://www.uta.edu/ronc/
Semiconductor Device Modeling and Characterization EE5342, Lecture 5-Spring 2005 Professor Ronald L. Carter L5 February 02
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Equipartition theorem
The thermodynamic energy per degree of freedom is kT/2 Consequently, L5 February 02
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Carrier velocity saturation1
The mobility relationship v = mE is limited to “low” fields v < vth = (3kT/m*)1/2 defines “low” v = moE[1+(E/Ec)b]-1/b, mo = v1/Ec for Si parameter electrons holes v1 (cm/s) E9 T E8 T-0.52 Ec (V/cm) T T1.68 b E-2 T T0.17 L5 February 02
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vdrift [cm/s] vs. E [V/cm] (Sze2, fig. 29a)
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Carrier velocity saturation (cont.)
At 300K, for electrons, mo = v1/Ec = 1.53E9(300)-0.87/1.01(300) = 1504 cm2/V-s, the low-field mobility The maximum velocity (300K) is vsat = moEc = v1 = 1.53E9 (300) = 1.07E7 cm/s L5 February 02
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Diffusion of carriers In a gradient of electrons or holes, p and n are not zero Diffusion current,`J =`Jp +`Jn (note Dp and Dn are diffusion coefficients) L5 February 02
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Diffusion of carriers (cont.)
Note (p)x has the magnitude of dp/dx and points in the direction of increasing p (uphill) The diffusion current points in the direction of decreasing p or n (downhill) and hence the - sign in the definition of`Jp and the + sign in the definition of`Jn L5 February 02
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Diffusion of Carriers (cont.)
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Current density components
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Total current density L5 February 02
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Doping gradient induced E-field
If N = Nd-Na = N(x), then so is Ef-Efi Define f = (Ef-Efi)/q = (kT/q)ln(no/ni) For equilibrium, Efi = constant, but for dN/dx not equal to zero, Ex = -df/dx =- [d(Ef-Efi)/dx](kT/q) = -(kT/q) d[ln(no/ni)]/dx = -(kT/q) (1/no)[dno/dx] = -(kT/q) (1/N)[dN/dx], N > 0 L5 February 02
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Induced E-field (continued)
Let Vt = kT/q, then since nopo = ni2 gives no/ni = ni/po Ex = - Vt d[ln(no/ni)]/dx = - Vt d[ln(ni/po)]/dx = - Vt d[ln(ni/|N|)]/dx, N = -Na < 0 Ex = - Vt (-1/po)dpo/dx = Vt(1/po)dpo/dx = Vt(1/Na)dNa/dx L5 February 02
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The Einstein relationship
For Ex = - Vt (1/no)dno/dx, and Jn,x = nqmnEx + qDn(dn/dx) = 0 This requires that nqmn[Vt (1/n)dn/dx] = qDn(dn/dx) Which is satisfied if L5 February 02
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Direct carrier gen/recomb
k Ec Ev (Excitation can be by light) gen rec - + Ev Ec Ef Efi L5 February 02
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Direct gen/rec of excess carriers
Generation rates, Gn0 = Gp0 Recombination rates, Rn0 = Rp0 In equilibrium: Gn0 = Gp0 = Rn0 = Rp0 In non-equilibrium condition: n = no + dn and p = po + dp, where nopo=ni2 and for dn and dp > 0, the recombination rates increase to R’n and R’p L5 February 02
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Direct rec for low-level injection
Define low-level injection as dn = dp < no, for n-type, and dn = dp < po, for p-type The recombination rates then are R’n = R’p = dn(t)/tn0, for p-type, and R’n = R’p = dp(t)/tp0, for n-type Where tn0 and tp0 are the minority-carrier lifetimes L5 February 02
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Shockley-Read- Hall Recomb
Indirect, like Si, so intermediate state Ec Ec ET Ef Efi Ev Ev k L5 February 02
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S-R-H trap characteristics1
The Shockley-Read-Hall Theory requires an intermediate “trap” site in order to conserve both E and p If trap neutral when orbited (filled) by an excess electron - “donor-like” Gives up electron with energy Ec - ET “Donor-like” trap which has given up the extra electron is +q and “empty” L5 February 02
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S-R-H trap char. (cont.) If trap neutral when orbited (filled) by an excess hole - “acceptor-like” Gives up hole with energy ET - Ev “Acceptor-like” trap which has given up the extra hole is -q and “empty” Balance of 4 processes of electron capture/emission and hole capture/ emission gives the recomb rates L5 February 02
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tpo = (Ntvthsn)-1, where sn~p(rBohr)2
S-R-H recombination Recombination rate determined by: Nt (trap conc.), vth (thermal vel of the carriers), sn (capture cross sect for electrons), sp (capture cross sect for holes), with tno = (Ntvthsn)-1, and tpo = (Ntvthsn)-1, where sn~p(rBohr)2 L5 February 02
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S-R-H recomb. (cont.) In the special case where tno = tpo = to the net recombination rate, U is L5 February 02
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S-R-H “U” function characteristics
The numerator, (np-ni2) simplifies in the case of extrinsic material at low level injection (for equil., nopo = ni2) For n-type (no > dn = dp > po = ni2/no): (np-ni2) = (no+dn)(po+dp)-ni2 = nopo - ni2 + nodp + dnpo + dndp ~ nodp (largest term) Similarly, for p-type, (np-ni2) ~ podn L5 February 02
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S-R-H “U” function characteristics (cont)
For n-type, as above, the denominator = to{no+dn+po+dp+2nicosh[(Et-Ei)kT]}, simplifies to the smallest value for Et~Ei, where the denom is tono, giving U = dp/to as the largest (fastest) For p-type, the same argument gives U = dn/to Rec rate, U, fixed by minority carrier L5 February 02
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S-R-H net recom- bination rate, U
In the special case where tno = tpo = to = (Ntvthso)-1 the net rec. rate, U is L5 February 02
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S-R-H rec for excess min carr
For n-type low-level injection and net excess minority carriers, (i.e., no > dn = dp > po = ni2/no), U = dp/to, (prop to exc min carr) For p-type low-level injection and net excess minority carriers, (i.e., po > dn = dp > no = ni2/po), U = dn/to, (prop to exc min carr) L5 February 02
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Minority hole lifetimes. Taken from Shur3, (p.101).
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Minority electron lifetimes. Taken from Shur3, (p.101).
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Parameter example tmin = (45 msec) 1+(7.7E-18cm3)Ni+(4.5E-36cm6)Ni2
For Nd = 1E17cm3, tp = 25 msec Why Nd and tp ? L5 February 02
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S-R-H rec for deficient min carr
If n < ni and p < pi, then the S-R-H net recomb rate becomes (p < po, n < no): U = R - G = - ni/(2t0cosh[(ET-Efi)/kT]) And with the substitution that the gen lifetime, tg = 2t0cosh[(ET-Efi)/kT], and net gen rate U = R - G = - ni/tg The intrinsic concentration drives the return to equilibrium L5 February 02
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The Continuity Equation
The chain rule for the total time derivative dn/dt (the net generation rate of electrons) gives L5 February 02
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The Continuity Equation (cont.)
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The Continuity Equation (cont.)
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The Continuity Equation (cont.)
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The Continuity Equation (cont.)
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The Continuity Equation (cont.)
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The Continuity Equation (cont.)
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References 1Device Electronics for Integrated Circuits, 2 ed., by Muller and Kamins, Wiley, New York, 1986. 2Physics of Semiconductor Devices, by S. M. Sze, Wiley, New York, 1981. 3 Physics of Semiconductor Devices, Shur, Prentice-Hall, 1990. L5 February 02
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