1. Attempts to deposit Nb3Sn by sputtering
and diffusing multilayers of Nb and Sn
S. Deambrosis, G. Keppel, V. Palmieri, N. Patron, R.G. Sharma
Thin films and new ideas for pushing the limits of RF superconductivity, Legnaro 9-12 October 2006

2. Experimental setup: sputtering
Section view of
experimental
device
Experimental design
sputtering system
Balanced Magnetron sources
Target-Substrate distance 60 mm
2 inches target diameter
Thin films and new ideas for pushing the limits of RF superconductivity, Legnaro 9-12 October 2006

3. Thickness Nb = 4.5 Thickness Sn
Thin film grown
Condition of deposition
P base = 1.5x10-6 mbar
P sputtering = 4.0x10-3 mbar
Sputtering Target
Voltage
(V)
Current
(A)
Power
(W) Sn
613
0.18
108 Nb
407
1.99
800
Thickness Nb = 4.5 Thickness Sn
Time of sputtering:
2 minutes Nb
30 minutes multilayers deposition
1 turn of sample
every 13 seconds
Annealed after sputtering for 3 hours at 975 °C
Thin films and new ideas for pushing the limits of RF superconductivity, Legnaro 9-12 October 2006

4. Results: X-ray diffraction
Sample M2 as deposited
Sample M2 after annealing
Sample M2 as deposited
Sample M2 after annealing
Thin films and new ideas for pushing the limits of RF superconductivity, Legnaro 9-12 October 2006

5. Results: Superconductive characteristic
Tc=
16.98 K
DTc=
0.23
RRR=
2.13
Thin films and new ideas for pushing the limits of RF superconductivity, Legnaro 9-12 October 2006

6. Thanks for your patience…
Thin films and new ideas for pushing the limits of RF superconductivity, Legnaro 9-12 October 2006

7. Nb3Sn Phase diagram
Thin films and new ideas for pushing the limits of RF superconductivity, Legnaro 9-12 October 2006