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X-ray Pump-Probe Instrument
David Fritz - XPP Instrument Scientist J Brian Langton - XPP Lead Engineer July 15, 2009
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XPP Goals and Physics Requirements XPP Instrument Overview
Outline XPP Science XPP Goals and Physics Requirements XPP Instrument Overview WBS 1.2 Scope Early Science Instrument Major Component Status Engineering/Design/Fabrication Status Critical Path Cost & Schedule Performance Progress since April Status Review Milestones Summary
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Time Resolved Scattering
The x-ray pump-probe instrument will take advantage of the ultrashort pulse duration of the LCLS to take snapshots of a photo-induced phenomena. In general, the experiments performed as this endstation will use an ultrafast laser pulse to initiate a transient response in a system. The system will be probed using various x-ray scattering techniques. The time evolution of the response will be mapped by variably delaying the arrival time of the x-ray pulse with respect to the pump laser pulse. The success of this end station will depend upon the ability to accommodate a wide variety of laser excitation techniques, samples, sample environments and x-ray scattering methods. C. Siders
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X-ray Pump-Probe Science
Phase Transitions - Order / Disorder - Metal/Insulator Charge Transfer Reactions - Photosynthesis - Photovoltaics - Vision Vibrational Dynamics Energy Dissipation and Flow photo- excitation Stampfli and Bennemann Phys. Rev. B 49, 7299 (1994) photo- excitation Page 4
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XPP Instrument Goals\Requirements
Facilitate time-resolved X-ray scattering/spectroscopy using LCLS coherent hard x-rays (4-25 keV) 80 fs rms temporal resolution Global Requirements (SP ) Capable of running in a shared beam mode using a future beam splitting monochromator Instrument must be accessible while beam is delivered to FEH Tailor and characterize X-ray and optical beam parameters Spatial profile Intensity Repetition rate Spectral bandwidth Wavelength (optical laser) Temporal profile (optical laser) <1x10-7 Torr beamline vacuum
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XPP Instrument Overview
Near Experimental Hall X-ray Transport Tunnel XPP Endstation Far Experimental Hall Page 6
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XPP Instrument Overview
Control Room XPP Endstation
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XPP Instrument Overview
Photon Shutter Intensity Monitor Requirement Device Tailor X-ray spatial profile ( > 50 microns) X-ray Slits Tailor X-ray spatial profile ( < 50 microns ) X-ray Focusing Lenses Tailor X-ray intensity and spectrum Attenuators Tailor X-ray repetition rate Pulse Picker Tailor X-ray spectrum Harmonic Rejection Mirrors Large Offset Monochromator Characterize X-ray pulse intensity Intensity Monitor Characterize X-ray spatial profile Profile Monitor Sample orientation Sample goniometer Position X-ray area detector Detector Mover Measure X-ray scattering pattern Detector Photoexcitation of samples Laser System Characterize spatial profile, temporal profile, spectrum, intensity at a virtual sample Laser Diagnostics Slits Profile Monitor Monochromator Intensity Monitor Slits Focusing Lenses Attenuators Pulse Picker Mirrors Slits Intensity Monitor Profile Monitor Sample Goniometer Detector Mover Profile Monitor Intensity Monitor Photon Shutter
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WBS 1.2 – Early Science/CD-4 Deliverables
CD-4 or Earlier 1.2.01 XPP System Integration & Design 1.3.01 XPP System Integration & Design 1.3.02 XPP X-ray Optics & Support Tables 1.2.03 XPP Laser System 1.2.03 XPP Laser System Optics, Optomechanics & Diagnostics Ti:Sapphire Laser Optics & Optomechanics Multipass Amplifier Laser Diagnostics Temporal Pulse Shaper Hutch Optical Table System Optical Parametric Amplifier Optical Experiments Laser Containment System 1.2.04 XPP Detector System (BNL) XPP 1.2.05 XPP Sample Environment & Diffractometer System XPP Sample Goniometer XPP Detector Mover 1.2.06 XPP Hutch Facilities 1.2.07 XPP Vacuum System XPP Vacuum Equipment XPP Vacuum Hardware XPP Spools & Bellows XPP Vacuum Supports 1.2.08 XPP Installation 1.2.08 XPP Installation 1.5 Diagnostics and Common Optics 1.5 Diagnostics and Common Optics Pop-in Profile Monitor Large Offset Monochromator DCO Pop-In Intensity Monitor X-ray Focusing Lenses Intensity-Position Monitor Harmonic Rejection Mirrors Slit System Attenuators / Filters Pulse Picker Controls 1.6 Controls and Data Acquisition 1.6 Controls and Data Acquisition Early Science: Installation Early Finish – July 2010 CD-4: Installation Early Finish – May 2011
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XPP Instrument Overview
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X-ray Optics and Diagnostics
Photon Shutter Intensity Monitor Slits Profile Monitor Monochromator Intensity Monitor Slits Focusing Lenses Attenuators Pulse Picker Requirement Device Tailor X-ray spatial profile ( > 50 microns) X-ray Slits Tailor X-ray spatial profile ( < 50 microns ) X-ray Focusing Lenses Tailor X-ray intensity and spectrum Attenuators Tailor X-ray repetition rate Pulse Picker Tailor X-ray spectrum Harmonic Rejection Mirrors Large Offset Monochromator Characterize X-ray pulse intensity Intensity Monitor Characterize X-ray spatial profile Profile Monitor Mirrors Slits Intensity Monitor Profile Monitor Sample Goniometer Detector Mover Profile Monitor Intensity Monitor Photon Shutter DCO Details will be Discussed in the breakout
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X-ray Optics Tables (1.2.2) Purpose
Support X-ray optics and diagnostics Horizontally translate X-ray optics and diagnostics 600 mm Engineering/Design/Fabrication Status PDR completed August 27, 2008 FDR completed November 14, 2008 Earthquake analysis complete Fabrication drawings completed Granite PO placed April 14, 2009 Expected to be delivered in July w/ rails installed Other parts procured in May and June Anchor holes for the earthquake restraints already drilled
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XPP Ultrafast Laser System (1.2.3)
Purpose Sample photoexcitation Engineering/Design/Fabrication Status Laser containment and optical table system Design review November 14, 2008 Laser tables are fabricated and are in storage in the control room. Anchor holes are drilled and tables are ready to be installed once granite is installed Enclosure PO placed April 20, 2009
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1.2.3 XPP Ultrafast Laser System
Engineering/Design/Fabrication Status Laser diagnostics RFP issued for 20 Ghz Oscilloscope Bids are in and vendor selection in process Optics and optomechanics Various PO’s in process Much more to be procured over the next 6 months Multipass amplifier Planning requisition in process for the pump lasers Procurement authorization granted with CD3 approval Optical parametric amplifier Planning requisition in process for OPA
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1.2.4 XPP 2D Detector from BNL by MOU
Purpose Detect X-ray scattering pattern Engineering/Design/Fabrication status Sensor, ASIC and readout electronic design complete ASIC is fabicated 512 x 512 sensor fabricated Detector housing preliminary design is complete Close coordination with the XPP team Detector program on schedule for March 2010 delivery to SLAC
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1.2.5 Sample Goniometer Purpose Engineering/Design/Fabrication Status
Sample orientation Engineering/Design/Fabrication Status Received advanced procurement authorization Dec. 18, 2008 Goniometer PO awarded to Huber April 1, 2009 Expected to be delivered in April 1, 2010 Vendor site visit scheduled for July 17, 2009
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Detector Mover (1.2.5) Purpose Engineering/Design/Fabrication Status
Position XPP detector Engineering/Design/Fabrication Status Motion tests of a industrial 6-axis robot performed August 12-13, 2008 Received advanced procurement authorization Dec. 18, 2008 Robot basing design study completed in January, 2009 Robot PO awarded March 31, 2009 Robot delivered June 25, 2009 Robot support design review held May 22, 2009 Detailed fabrication drawings completed Requisition in process Robot software PO awarded July 2
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Hutch Facilities (1.2.6) Purpose Status
Tool and equipment storage, cable management, etc… Status Work benches and storage cabinets received and installed Tools and tool boxes received and installed Raised floor PO awarded June 24, 2009 Installation in August Cable trays are here
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XPP Critical Path
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Progress Since April Status Review
Design Reviews Robot support design review completed May 22 Fabrication X-ray support tables and associated hardware fabricated or in process XPP detector positioner Laser tables Laser containment system Workbenches and tool storage 20 GHz oscilloscope Various laser optics and optomechanics Procurement Raised floor system contract awarded Planning requisitions for optical parametric amplifier and pump lasers Key project Milestones Preliminary Instrument Design Review Dec 2007 CD July 2008 Advanced Procurement Review Nov 2008 Final Instrument Design Review Feb 2009 Early Science Procurement Authorization Mar 2009 Ready for Early Science July 2010 Ready for CD May 2011 Page 20
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Cost & Schedule Performance
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Summary Instrument accommodates a wide variety of cutting edge research capabilities and fulfills the CD-0 mission XPP design is very mature Risks are identified and monitored in the risk registry Major risks associated with the sample goniometer but are being actively mitigated Final Instrument Design Review completed February 2009 XPP received fabrication authorization March 2009 > 50% of procurements complete ARRA funding advanced completion of: X-ray focusing lenses Harmonic rejection mirror system Multipass amplifier Optical Parametric Amplifier First call for proposals Fall 2009 User operation start planned for Fall 2010 Page 22
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