1. Update on Chemical WG Proposal
4/9/ :57 PM
SIA in the US
Update on Chemical WG Proposal
Shanghai, China
February 21-23, 2011
Reed Content
GLOBALFOUNDRIES
Talking Points

2. Proposal (From Kobe Meeting)
Background
Governments in several regions are creating chemical regulations that have the potential to affect IC production and products:
EU – REACH
US - TSCA Rewrite
Japan - reform of the Chemical Control Law
Regardless of regulations source region, these impact IC manufacturing globally
It is increasingly difficult to understand impact of new chemical regulations to operations and products
Benefit
It is important to understand how our chemical and raw material uses impact human health and the environment. This information should be considered precompetitive.
Working collectively to understand these regulations and their impacts will more quickly help us to determine:
Criticality
Uses and controls
Voluntary agreements for use elimination
Raw material supply protection until replacement
ESH Task Force, PFOS Working Group Proposal

3. Proposal (From Kobe Meeting)
We anticipate the majority of PFOS activity will conclude in 2011 and chemical use and control expert resources will become more available to work on a larger variety of issues
Beginning in 2011 a shorter amount of time can be provided in the PFOS WG to begin formal work on identifying global chemical risk issues
As PFOS work diminishes, global chemical work can increase while PFOS is worked to its conclusion
A risk assessment will be used to push real issues to the surface for expert review while assessing a wide variety of chemical risk issues
The PFOS Working Group would change names to the Chemical Working Group
Proposed Meeting Schedule
Activity
Feb-11
Jun-11
Sep-11
Feb-12
Sep-12
Feb-13
Jun-13
Sep-13
PFOS Report
75%
Report
25%
10% 0%
Chemical Risk Model 5%
Identified chemical issues
30%
45%
50%
Consider collective actions
15%
20%
35%
ESH Task Force, PFOS Working Group Proposal

4. Proposed New Chemical WG Charter (From Kobe Meeting)
Purpose/Scope: Identify potential regulation risks and develop policy positions for chemicals used in semiconductor manufacturing and products.
Team deliverable/product
The team will continue reporting PFOS activities until Voluntary Agreement commitments are fulfilled, and the potential risk to the environment is greatly diminished.
The team will create a chemical risk assessment process that identifies global regulatory listings that could impede or limit supply of critical chemicals and materials used in semiconductor manufacturing. A status report will be presented at each ESH Task Force meeting.
The team will consider high risk chemicals and create a case for action that may include voluntary agreements or development of technical information in support of establishing an industry-wide policy.
Measures of success
Robust risk evaluation process that considers eco and human toxicity, impending regulations, supply concerns, manufacturing use and final product considerations. The process will be considered and improved at each WG meeting to ensure effectiveness and keep pace with evolving risk criteria.
Regional SIA’s are confident that issues are being identified with enough time to determine the appropriate courses of action without severe impact to manufacturing operations.
Maintain a positive reputation for environmental stewardship in the Semiconductor industry, consistent with our demonstrated record of successful management of chemical risks.
ESH Task Force, PFOS Working Group Proposal

5. Action Item from Kobe ESH TF Meeting
“ESH TF agreed to review example chemical concern topics and consider value derived for each association. If value is agreed the TF will determine the need for formal Chemical WG activity in Shanghai.”
Issue Examples
Responses of SIA in each region
CHINA
CHINESE TAIPEI
EUROPE
JAPAN
KOREA US
CA Green Chemistry Law
Yes No
India RoHS
Maybe
China RoHS
Nanomaterials
REACH SVHCs-products
Conflict / critical metals
ESH Task Force, PFOS Working Group Proposal