1. GV10x Downstream Asher

2. GV10x Downstream Asher GV10x Source Plasma Element Patented Q Tube
Gas Air or O2
Power 10 to 99 Watts
Operating Pressure Range 2 Torr to <5 mT
Tuning Capacitor Adjust
Dimensions: H 6.2/157, W 3.1/79, D 7.5/180
Weight 5 lbs/2.3kg
Gas inlet fitting 1/8 compression/ 0.5 µm filter
Shutoff Leakage [internal] 1x10-8 Torr l/s
Shutoff Leakage [external] 1x10-10 Torr l/s
Mounting Connection KF 40

3. GV10x Source
GV10x KF40 Mounting

4. GV10x Source Outline
Source Dimensions

5. System Controller/RF Generator
GV10x Downstream Asher
System Controller/RF Generator
Remote Control via Com Port RS 232 I/O
Retentive Menus RF On/Off, Time, Power Level
Power Requirements VAC 50/60 Hz
Power Consumption VA
Impedance Ohms
Dimensions H 6 1/4" W 8" D 17"
AC Connector IEC-10EEA 1 EMI Filter
Frequency MHz at 100 Watts max
Impedance Rating Ohms

6. GV10x Downstream Asher Controller
Front Panel

7. Remote Control GUI

8. Pressure/Flow Control
GV10x plasma Source produces O0, atomic oxygen from 2 Torr to < 5 mT
The number of turns open of the Source Variable Constriction [precision needle valve] gas inlet sets the gas flow which establishes system pressure.
The downstream plasma can be initialized through 2 Torr to < 5 mT operating pressure range.
The orifice of the VC is set to accommodate chamber: pump speed, volume and conductance. The chamber & plasma operating pressure can be increased or decreased by adjusting the VC orifice
Ashing hydrocarbons can be accomplished at low or high pressure!
Low GV10x operating pressure:
- will not load the TMP and cause system software crashes
- increases O0 mean free path that increases diffusion for more uniform large volume cleaning
- fast recover time from ashing pressure to operating pressure
High GV10x operating pressure:
- will maximize O0 density in the local volume for efficient specimen cleaning
- increases efficacy of removing surface contamination

9. Pressure/Power Performance Envelope

10. Variable Constrictions & 0.5 µm Filter
Pressure Control
Variable Constrictions & 0.5 µm Filter

11. Variable Constriction Pressures vs Turns Open

12. GV10x Downstream Asher Operation
The GV10x operator selects the optimum cleaning pressure by observing which pressure results in best cleaning. The optimum cleaning pressure is a function of chamber volume, origination of contamination and whether contamination is in gas phase or on surfaces. Pressure changes are made manually. Power and time are set at the Controller or remotely by the GUI.
The operator also selects 10 to 90 Watts plasma power – higher power more O0 density for greater HC ashing efficiency.
The Source is mounted by KF40 quick connector. An optional isolation valve between the source and chamber allows quick shifting Source among different chambers since several vacuum chamber can be maintained HC free with one GV10x system.
The Source may also be mounted on an ancillary chamber like the Gentle Asher Chamber for specimen pre-cleaning.

13. GV10x/GA Specimen Cleaner

14. Low & High Pressure Cleaning
GV10x plasma density from 10 to 99 W in 8" Gentle Asher Chamber pumped by:
71 l/s TMP – low pressure 5 E-3 Torr
60 l/m Scroll – high pressure E-2 Torr

15. Ashing Watts 10 lp & 10 hp
8" Ø GA Chamber

16. Ashing Watts 20 lp & 20 hp
8" Ø GA Chamber

17. Ashing Watts 30 lp & 30 hp
8" Ø GA Chamber

18. Ashing Watts 50 lp & 50 hp
8" Ø GA Chamber

19. Ashing Watts 70 lp & 70 hp
8" Ø GA Chamber

20. Ashing Watts 90 lp & 90 hp
8" Ø GA Chamber

21. GV10x DS Asher Theory
Downstream Plasma is initiated in the GV10x Source by RF power. Recombination of energetic ions and electrons created in the Source is complete ~ 4" from the outlet.
In the Downstream, a few inches beyond the Source exhaust there are no energetic species. Plasma electrons and ions lose energy quickly and NO and N2O molecules slowly.  Energy loss results from collisions with chamber walls, recombination, and energy transfer with other species. The long-lived radical loss process is called deactivation. 

22. GV10x Temperature Experiment
RTDs 1", 4" & 7" from GV10x Source
in 8" Ø Gentle Asher Chamber

23. RTD Temperature at 92, 45 & 92 Watts
Temperature raise becomes asymptotic at end of
92W, 45W and 92W regimes at 5 E-3 T
5 E-3 Torr at 92 Watts, 1 E-2 Torr at 45 Watts and back to 92 Watts

24. Source & Controller Rear Panels

25. GV10x DS Asher is not a ‘plasma cleaner’
The GV10x Downstream Asher is not a ‘plasma cleaner’. Plasma cleaners sputter and generate heat that can potentially damage detectors, mirrors and delicate surfaces.
The GV10x Downstream plasma delicately and uniformly ashers [oxidizes] hydrocarbons into CO, CO2 and H2O. These molecules are pumped out of the chamber. Unlike cold trapping hydrocarbons are permanently removed from the chamber not just captured to be reintroduced when venting.
Silver objects oxidize in the downstream and organics like plastic light guides can be slowly etched. Small silver items like dabs of silver paint on tin foil placed around the chamber can be used to observe the extent and effectiveness of the DS Process.
Elevated surface temperatures volatize surface HCs so baking before or during the DS Process is suggested for heavily contaminate surfaces.

26. GV10x DS Asher CE Certification
CB Test Certificate Ref. Numbers:
US/5120/ITS Issued:
US/5120/ITS-M1 Issued: (revised)
SEMI S / S Certificate of Compliance
Document Number: F Issued:
Document Number: MPK Issued: (revised)

27. Conclusion
Thank You
ibss Group, Inc Anza Boulevard • Suite 110 Burlingame • CA