1. A very brief introduction to beam manipulation
John Power

2. Why do Beam Manipulation?
May eliminate the need for the
electron damping ring for the ILC and
replace it a RF photocathode based injector system
ILC requirement 
g(ex, ey, ez) = (8, 0.02, 3000) mm
e6D=(ex*ey*ez)1/3 = 10 mm
RF Photoinjector capability 
(ex, ey, ez) = (5, 5, 8) mm
e6D=(ex*ey*ez)1/3 = 5 mm
Can we manipulate the RF Photoinjector phase space to put the emittance where we need it?

3. Can we replace the ILC electron damping ring with an RF photoinjector?
Yes, maybe, on paper  flat-beam transformation + emittance exchange
round-to-flat-beam transformation
(5, 5, 8)  (1250, 0.02, 8)  (8, 0.02, 1250)
Emittance exchange

4. EEX experiment at the AWA
ex= 5 mm
ey=18 mm
ez= 21 mm
ex=21 mm
ey=17 mm
ez= 3 mm
Emittance Exchanger
Gun
Linac
TQ1,TQ2,TQ3
TM110
ILC requirement:
g(ex, ey, ez) = (8, 0.02, 3000) mm
e6D=g (ex*ey*ez)1/3 = 10 mm
RF Photoinjector capability:
g(ex, ey, ez) = (5, 5, 8) mm
ge6D=gex*ey*ez = 5 mm
in collaboration with FNAL/NIU

5. Original MaRIE 50-keV XFEL Baseline Concept
Electron Injector
Linear Accelerator
Bunch Compressor
Undulator
X-rays Beam
Electron Beam Dump
Wavelength
0.024 nm
Beam energy
35.3 GeV
Pulse length
74 fs
Bunch charge
0.25 nC
Peak current
3.4 kA
Normalized
rms emittance
0.2 mm
rms Energy spread
0.01%
Undulator period
3 cm
Undulator Krms
2.624
Undulator type
Length
Planar hybrid PM
120 m
Probably wouldn’t work –
ISR leads to energy spread

6. MaRIE 50-keV XFEL using Beam Manipulation
2-cm period wiggler
S-band linac to 20 GeV
S-band linac to 1 GeV
EEX or Stupakov echo
Emittance manipulation stage
Prebunch stage
FBT 1: L=0 mm
ex ~ 3.5 mm
ey ~ 0.14 mm
ez ~ 1.4 mm
EEX 1: L=20 mm
ey ~ 1.4 mm
ez ~ 0.14 mm
EEX 3: L=0 mm
ex ~ 100 mm
ey ~ 0.14 mm
ez ~ 0.14 mm
EEX 4: L=0 mm
ex ~ 0.14 mm
ez ~ 100 mm
0.25 nC (prebunched)
FBT 2: L=0 mm
ex ~ 35 mm
ey ~ 0.14 mm
ez ~ 0.14 mm
EEX 2: L=0 mm
ex ~ 0.14 mm
ez ~ 35 mm
500 kV DC injector
or AFEL copy
or CTF3 copy
0.50 nC, L=1.75 mm
ex ~ 0.7 mm
ey ~ 0.7 mm
ez ~ 1.4 mm

7. High frequency bunch train generation
spatial
temporal Dt
TM110
1/f Dx
e-beam mask + Exchanger
Advantage: High Q potential since the mask is after space charge regime
Disadvantage: Difficult to independently control the intensity of the drive and witness
*in collaboration with P. Piot at NIU

8. High frequency bunch train generation
beam loading in PWFA Dt Dx
laser mask
NDF
Ramp
TM110
Exchanger
Advantage:
Easy to control spatial profile of the laser
Independent control of drive and witness intensity
Disadvantage: Difficult to control space charge effects in gun

9. High frequency bunch train generation
laser mask Dt
TM110 Dx
1/f Dx
e-beam mask
Advantage: Allows possibility of High Charge and easy to control witness

10. Summary
Beam Manipulation is being studied for light sources and linear colliders, many other applications may benefit too.
Beam Manipulation Experiments are underway at Fermilab and Argonne