1. Deuterium retention for sample temperature of 500 K
MPT/1-1: A. Kreter et al "Influence of Plasma Impurities on the Fuel Retention in Tungsten"
Exposure in linear plasma device PSI-2
Incident ion flux: ~ 1022 m-2s-1
Incident ion fluence: ( )1026 m-2
Sample temperatures: 500 and 770 K
Incident ion energy: 70 eV (above W sputtering threshold for Ar, Ne and N, but below it for D and He)
Seeded impurities (fraction): Pure D (reference), He (3%), Ar (7%), He (3%) + Ar (7%), Ne (10%), N (5%)
Deuterium retention for sample temperature of 500 K
4.0
3.5
3.0
2.5
D retention [1021 D/m2]
2.0
1.5
1.0
0.5
pure D
D+He
D+Ar
D+He+Ar
D+Ne
D+N
Value for pure D exposure is in agreement with available database
Helium reduces D retention by a factor of
Argon and neon increase D retention by a factor of 2 (on average)
For D+He+Ar exposure, D retention is similar to pure D exposure  Ar overrides the effect of He
Nitrogen increases D retention by a factor of 7 - 8