Download presentation
Presentation is loading. Please wait.
1
Professor Ronald L. Carter ronc@uta.edu http://www.uta.edu/ronc/
Semiconductor Device Modeling and Characterization EE5342, Lecture 14 -Sp 2002 Professor Ronald L. Carter L14 28Feb02
2
npn BJT currents (F A region, ©RLC)
IC = JCAC IB=-(IE+IC ) JnE JnC IE = -JEAE JRB=JnE-JnC JpE JGC JRE JpC L14 28Feb02
3
Ebers-Moll Model (Neglecting G-R curr)
Fig. 9.30* -JEAE = IE JCAC = IC E B C aRIR aFIF L14 28Feb02
4
E-M model equations L14 28Feb02
5
Linking current version of E-M model
L14 28Feb02
6
Linking current E-M model (cont)
L14 28Feb02
7
Linking current E-M circuit model
L14 28Feb02
8
Hybrid-pi circuit model
Adapted from linking current version of E-M model with parasitic Rs and CSubstr C-E branch is linking current B-E branch is the reduced B-E diode with diffusion (for and rev) resistance and capacitance and junction cap. B-C branch is the reduced B-C diode with diffusion (for and rev) resistance and capacitance and junction cap. L14 28Feb02
9
Hybrid-pi Circuit model
Fig 9.33* L14 28Feb02
10
Ebers-Moll npn injection current circuit model
L14 28Feb02
11
Ebers-Moll npn transport current circuit model
L14 28Feb02
12
Ebers-Moll npn linking current circuit model
L14 28Feb02
13
Non-ideal effects in BJTs
Base-width modulation (FA: xB changes with changes in VBC) Current crowding in 2-dim base High-level injection (minority carriers g.t. dopant - especially in the base). Emitter Bandgap narrowing (NE ~ density of states at cond. band. edge) Junction breakdown at BC junction L14 28Feb02
14
Charge components in the BJT
From Getreau, Modeling the Bipolar Transistor, Tektronix, Inc. L14 28Feb02
15
Gummel-Poon Static npn Circuit Model
B RBB ILC IBR ICC - IEC = IS(exp(vBE/NFVt - exp(vBC/NRVt)/QB B’ ILE IBF RE E L14 28Feb02
16
Gummel-Poon Model General Form
QXXXXXXX NC NB NE <NS> MNAME <AREA> <OFF> <IC=VBE, VCE> <TEMP=T> Netlist Examples Q Q2N3904 IC=0.6, 5.0 Q QNPN .67 NC, NB and NE are the collector, base and emitter nodes NS is the optional substrate node; if unspecified, the ground is used. MNAME is the model name, AREA is the area factor, and TEMP is the temperature at which this device operates, and overrides the specification in the Analog Options dialog. L14 28Feb02
17
Gummel-Poon Static Model
Gummel Poon Model Parameters (NPN/PNP) Adaptation of the integral charge control model of Gummel and Poon. Extends the original model to include effects at high bias levels. Simplifies to Ebers-Moll model when certain parameters not specified. Defined by parameters IS, BF, NF, ISE, IKF, NE determine forward characteristics IS, BR, NR, ISC, IKR, NC determine reverse characteristics VAF and VAR determine output conductance for for and rev RB(depends on iB), RC, and RE are also included L14 28Feb02
18
Gummel-Poon Static Par.
NAME PARAMETER UNIT DEFAULT IS transport saturation current A 1.0e-16 BF ideal maximum forward beta - 100 NF forward current emission coef VAF forward Early voltage V infinite ISE B-E leakage saturation current A 0 NE B-E leakage emission coefficient - 1.5 BR ideal maximum reverse beta - 1 NR reverse current emission coefficient - 1 VAR reverse Early voltage V infinite ISC B-C leakage saturation current A 0 NC B-C leakage emission coefficient - 2 EG energy gap (IS dep on T) eV 1.11 XTI temperature exponent for IS - 3 L14 28Feb02
19
Gummel-Poon Static Model Parameters
NAME PARAMETER UNIT DEFAULT IKF corner for forward beta A infinite high current roll-off IKR corner for reverse beta A infinite RB zero bias base resistance W 0 IRB current where base resistance A infinite falls halfway to its min value RBM minimum base resistance W RB at high currents RE emitter resistance W 0 RC collector resistance W 0 TNOM parameter - meas. temperature °C 27 L14 28Feb02
20
Gummel Poon npn Model Equations
IBF = ISexpf(vBE/NFVt)/BF ILE = ISEexpf(vBE/NEVt) IBR = ISexpf(vBC/NRVt)/BR ILC = ISCexpf(vBC/NCVt) QB = (1 + vBC/VAF + vBE/VAR ) { + [ + (BFIBF/IKF + BRIBR/IKR)]1/2 } L14 28Feb02
21
Gummel Poon Base Resistance
If IRB = 0, RBB = RBM+(RB-RBM)/QB If IRB > 0 RB = RBM + 3(RB-RBM)(tan(z)-z)/(ztan2(z)) [1+144iB/(p2IRB)]1/2-1 z = (24/p2)(iB/IRB)1/2 Regarding (i) RBB and (x) RTh on slide 22, RBB = Rbmin + Rbmax/(1 + iB/IRB)aRB L14 28Feb02
22
BJT Characterization Forward Gummel
iC RC iB RE RB vBEx vBC vBE + - vBCx= 0 = vBC + iBRB - iCRC vBEx = vBE +iBRB +(iB+iC)RE iB = IBF + ILE = ISexpf(vBE/NFVt)/BF + ISEexpf(vBE/NEVt) iC = bFIBF/QB = ISexpf(vBE/NFVt)/QB L14 28Feb02
23
Ideal F-G Data iC and iB (A) vs. vBE (V) N = 1 1/slope = 59.5 mV/dec
L14 28Feb02
24
BJT Characterization Reverse Gummel
iE RC iB RE RB vBCx vBC vBE + - vBEx= 0 = vBE + iBRB - iERE vBCx = vBC +iBRB +(iB+iE)RC iB = IBR + ILC = ISexpf(vBC/NRVt)/BR + ISCexpf(vBC/NCVt) iE = bRIBR/QB = ISexpf(vBC/NRVt)/QB L14 28Feb02
25
Ideal R-G Data iE and iB (A) vs. vBE (V) N = 1 1/slope = 59.5 mV/dec
L14 28Feb02
26
Distributed resis- tance in a planar BJT
emitter base collector reg 4 reg 3 reg 2 reg 1 coll base & emitter contact regions The base current must flow lateral to the wafer surface Assume E & C cur-rents perpendicular Each region of the base adds a term of lateral res. vBE diminishes as current flows L14 28Feb02
27
Simulation of 2- dim. current flow
= DV Both sources have same current iB1 = iB. The effective value of the 2-dim. base resistance is Rbb’(iB) = DV/iB = RBBTh Distributed device is repr. by Q1, Q2, … Qn Area of Q is same as the total area of the distributed device. Both devices have the same vCE = VCC L14 28Feb02
28
Analytical solution for distributed Rbb
Analytical solution and SPICE simulation both fit RBB = Rbmin + Rbmax/(1 + iB/IRB)aRB L14 28Feb02
29
Distributed base resistance function
Normalized base resis-tance vs. current. (i) RBB/RBmax, (ii) RBBSPICE/RBmax, after fitting RBB and RBBSPICE to RBBTh (x) RBBTh/RBmax. FromAn Accurate Mathematical Model for the Intrinsic Base Resistance of Bipolar Transistors, by Ciubotaru and Carter, Sol.-St.Electr. 41, pp , 1997. L14 28Feb02
30
References * Semiconductor Physics & Devices, by Donald A. Neamen, Irwin, Chicago, 1997. L14 28Feb02
Similar presentations
© 2025 SlidePlayer.com. Inc.
All rights reserved.