1. Fig. 4 “Editing”—Write-erase-rewrite using PLE.
“Editing”—Write-erase-rewrite using PLE. (A) A 3 × 3 fluorescent array deposited using a PDMS PLE pen (dt = 500 nm, db = 22 μm, and h = 38 μm). (B to D) Partial consecutive erasing of patterns along the diagonal. (E) Complete erasing of the fluorescent dots along the diagonal. (F) Demonstration of the rectification process of the patterns. AU, arbitrary units. (G) A schematic of the agarose PLE erasing mechanism showing partial erasing. The optical micrographs of the PDMS PLE pen (H) and agarose PLE eraser (I) in contact with the surface, as seen through the microscope. Scale bars, 25 μm (H and I).
Pradeep Ramiah Rajasekaran et al. Sci Adv 2017;3:e
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