1. DiPamat Direct Patterning Materials
Etch / Plating Resist

2. What is resist is NOT washed away during resist development Remark:
A photo resist is a chemical product that, under the influence of UV light, changes its chemical nature.
Resist without UV:
is washed away during resist development
Resist with UV:
is NOT washed away during resist development
protects the copper in the etch batch
is stripped away after etching
Remark:
1 Etch resist: print & etch of inner layers
2 Plating resist: print, plate & etch of outer layers
Eric Janssens May 2013

3. What is resist Liquid photo resist (20%) Dry photo resist (80%)
Curtain, roller- or spray coated
Thickness: µm
Pro: high resolution
Contra: dust inclusions and chemical sensitivity
Dry photo resist (80%)
Cold, hot or wet laminated
Thickness: µm
Pro: high yield and good tenting
Contra: line width
Tenting:
Via’s must be tented
to avoid resist getting in the via
Eric Janssens May 2013

4. Traditional resist printing
Workflow:
Design
Image and develop film, check
Coat, laminate resist
Image resist
If laminated: peel cover layer
Develop resist
Etch
Strip
Working with resist is:
A time consuming process step
Expensive
Fixed data
Ecological unfriendly
Eric Janssens May 2013

5. Inkjet resist printing
Principle:
apply etch / plating resist
directly on the panel
using a set of Inkjet nozzles mounted on a XY table
ie without the use of a phototool or screen
Workflow:
Design
Print (with pin curing)
Curing (thermal and/or UV)
Etch
Strip
Eric Janssens May 2013

6. Inkjet resit printing Advantages: Reduce cost
no phototool, less production steps
shorter production cycle, higher yields
Registration panel per panel / distortion compensation
front-to-back
outer layer to inner layer
Design changes & variable data per board
Fast (no set up)
Ecology
Eric Janssens May 2013

7. Quid May 2013 R&D project is in progress
Jetability and etch resistance: OK
Stripability: concepts are tested
Planning
One ER fieldtest in operation by end 2013
Proliferation of ER in 2014
Concept study PR
Eric Janssens May 2013

8. Quid May 2013
Eric Janssens May 2013

9. Quid May 2013
Eric Janssens May 2013

10. Quid May 2013
Eric Janssens May 2013

11. Competition: Dow (Rohm and Haas)
Phase shift ink
Eric Janssens May 2013

12. Competition: MacDermid
Eric Janssens May 2013

13. Competition: MuTracx www.mutracx.com
Spin-off from OCE Technologies (Canon)
Announces Lunaris: print system and etch resist for IL
Phase shift inkl
Uses Predict
Fieldtest summer 2010 in EU
Commercially available by mid 2011
Eric Janssens May 2013

14. Competition: MuTracx
Eric Janssens May 2013

15. System supplier: MuTracx
lunaris animation.avi
Eric Janssens May 2013

16. Inform your customers and prospects on our plans
Conclusion
Inform your customers and prospects on our plans
Gather as much information as possible
Don't forget film
Eric Janssens May 2013