1. Weir PSFM Zspin side analysis II Dataset:Integrated_FEM_V_S4_Modified.csv Features:Focus Dose Matrix TEA Systems Corp. 65 Schlossburg St. Alburtis, PA 18011 610 682 4146 TZavecz@TEAsystems.com www.TEAsystems.com March 29, 2005

2. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -2- Zspin, site in field center X & Y Calibration

3. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -3- Upper left corner Y slope is a lot noisier. Could be mask or Archer

4. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -4- Offset/ full field (mean offset)

5. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -5- Offset response Xreg = meanYreg +

6. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -6- Higher-Order Response Variation from Mean response Chart (above) shows variation in slope as a function of its height on field. ?More slope variation in top row

7. TEA Systems Corp. Confidential ZSPIN Principle: Illustration of systematic errors due to patterning 1 st Exposure: reference pattern 2 nd Exposure: focus sensitive pattern with pinhole offset Resulting behavior through focus: - + 0 + - offset focus Black: Individual calibration curve with pinhole aligned Blue and Red: Individual calibration curve with pinhole misalignment Dashed Green: Calibration after combining both calibration curves for any case of misalignment

8. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -8- Calibration (assume its the Xleft & Xright data) + - offset focus =Xreg-average =(Xleft – Xright)/2 ONLY <> if there is a mask-hole mialignment Simply subtracting is more sensitive to the metrology errors. Better to add in both curves, negate the values of the 2 nd reading and then fit the curve to the result.

9. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -9- Plotting all points Best response analysis is to include all points Theyll be calibrated out anyway Splitting from: Local aberration of lens or Metrology tool (Y-axis noise) Mask-tool stripe error flat response from: Local aberration of lens or Exposure-tool focus stepping error

10. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -10- Calibration Summary Calibration stability Focus estimation, one sigma, is only (1.8, 1.3) uncertainty! Focus & Uncertainty

11. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -11- Calibration Residuals

12. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -12- X & Y Focus response X slit Y-Scan

13. TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -13- Mean Focus response