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Resistive bulks industrialization Status report 2 OCTOBER 2012 Fabien Jeanneau | PAGE 1 RD51 Collaboration meeting | Stony Brook University | October 2012
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INDUSTRIALIZATION FOR THE NSW | PAGE 2 RD51 Collaboration meeting | Stony Brook University | October 2012 Goal ( see talk by Joerg Wotschack in WG1 ) -Large resistive detectors (bulk?) of 0.5x1 m 2 for end-2012/begin-2013 -During 2013: technical adaptation (investment in machines) for a width of 1 m to achieve areas of 1 x 2 m 2 -Production during 2014/2015 Road map ( NSW milestones ) -July 2012: delivery of BXY 10x10 cm 2 and tests (CERN/Saclay) -End 2012: towards large areas (0,5x1 m 2 ) replacement of MBTS on ATLAS (48 to 96 chambres of 0,6x0,8 m 2 )? Geoazur project (P. Salin) -2013/2014: towards nominal areas (1 x 2 m 2 ) Industrial partners ELVIA / CIREA (France), ELTOS (Italy), Triangle Labs (Nevada, US)
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ELVIA / CEA PARTNERSHIP Common fundings since one year (ANR) to develop large area detectors protected against sparks (SPLAM) COMPASS: large pixel MM detector with buried resistors ( see the talk by Damien Neyret and Florian Thibault, WG2 ) CLAS12: large bulk on thin pcb (resistive solution also studied for the forward) Other PCB studies | PAGE 3 RD51 Collaboration meeting | Stony Brook University | October 2012 PLV bulks
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FIRST STEP: SMALL BULK XY | PAGE 4 RD51 Collaboration meeting | Stony Brook University | October 2012 Use of already existing layout Resistive bulk (50 to 100 Mohms along the strips) X-Y readout Active area: 10 x 10 cm 2 Geometry: strip pitch 250 µm strip width 150 µm Y readout X readout Coverlay FR-4 128 um Bulk Mesh
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BXY1 : FIRST BATCH (JULY 2012) | PAGE 5 RD51 Collaboration meeting | Stony Brook University | October 2012 Visit to CIREA (Cholet) in order to make the voltage tests The visual inspection shows waves on the mesh Diagnostic: the mesh is not stretch enough 3 detectors are delivered at the beginning of July Measurements in gas give 55 Fe spectrum with low energy resolution and evidence of an inhomogenous amplification gap (due to stretching)
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BXY1 : RESISTIVITY MEASUREMENTS BY ELVIA / CIREA | PAGE 6 RD51 Collaboration meeting | Stony Brook University | October 2012 MOhms One measure every 10 strips average #1 #3 #2 #4 Measurement device: Megger MIT 420
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BXY1 : STRETCHING OF THE MESH | PAGE 7 RD51 Collaboration meeting | Stony Brook University | October 2012 ~ 1 ° Microscope measurements
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BXY1 : VOLTAGE MEASUREMENTS BY ELVIA / CIREA #1#2#3 (washed)#4 500 V4 nA5 nA 600 V6 nA7 nA 700 V7 nA30 nA8 nA 800 V10 nA (unstable) spark10 nA10 nA (unstable) | PAGE 8 RD51 Collaboration meeting | Stony Brook University | October 2012
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BXY1 : 55 FE CALIBRATION | PAGE 9 RD51 Collaboration meeting | Stony Brook University | October 2012 Setup Gas: Ar+10% CO2 Preamp: Ortec 142B Amp: Ortec 472A MCA HV mesh: 520 V HV drift: 750 V
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BXY2 : SECOND BATCH (SEPTEMBER 2012) Contact with SERITEC (Switzerland) Stretching with a tension of 15 N.cm | PAGE 10 RD51 Collaboration meeting | Stony Brook University | October 2012 3 detectors delivered at Saclay at the beginning of september
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MEASUREMENTS BY ELVIA / CIREA | PAGE 11 RD51 Collaboration meeting | Stony Brook University | October 2012 MOhms One measure every 10 strips average F1 F3 F4 F1F3F4 500 V71 nA65 nA25 nA 600 V85 nA82 nA30 nA 700 V98 nA127 nA41 nA 800 V111 nAunstable68 nA 850 V150 nAunstable 900 V160 nA 1 kVunstable
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ELVIA / CIREA DETECTOR SECTION | PAGE 12 RD51 Collaboration meeting | Stony Brook University | October 2012 PCB multi-layer Resitive bulk XY section: pillar 449 µm 201 µm 187µm Nominal numbers Coverlay: 64 µm Amp gap: 128 µm Pillar above mesh: 64 µm Total pillar height: 192 µm Resist. thickness: 35 µm Mesh : 45/18 µm (30 µm) 97µm 38 µm 355 µm resistive strip wires
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RECEPTION IN SACLAY F1F3F4 500 V27 nA31 nA24 nA 12 nA 750 V40 nA100/200 nA40 nA 20 nA 900 V200 nA (2 µA)overflow 950 Voverflow | PAGE 13 RD51 Collaboration meeting | Stony Brook University | October 2012 The mesh is well stretched (no more waves) Voltage test in air far from the nominal values Voltage test in gas improved (few nA at 500/600 V) drying?
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FIRST GAIN MEASUREMENT ON F4 | PAGE 14 RD51 Collaboration meeting | Stony Brook University | October 2012 Without source With source Same setup than before HVm: 580 V HVd: 780 V Gain ~ 8000 dE/E ~ 26 % 6 keV
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F4 AFTER WASHING Washing in pure water Nitrogen drying Oven curing (50°C) for one night | PAGE 15 RD51 Collaboration meeting | Stony Brook University | October 2012 HVm: 550 HVd: 650 Gain: 7500 dE/E ~ 18% Transparency
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THE OTHER DETECTORS Same washing program than for the F4 but no improvement Visually the mesh seems to be not attached to the pillars except in the corners | PAGE 16 RD51 Collaboration meeting | Stony Brook University | October 2012 F1F3
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CONCLUSION Diagnostic -Mesh floating on two of the detectors due to a lack of insolation the pillars are not attached to the plane of strips -The coverlay is not enough cured except for the F4 oven malfunctionning Very promising -The detector F4 is ready to operate -Mesh stretching problem is solved -Resistivity is homogenous -Fine tuning to improve the process (insolation time and coverlay curing) What next? -2 operational detectors are still needed for RD51 (already in the working flow) -Large PCBs (1 and 2 x 0.6 m 2 ) have been ordered -Next step: larger size | PAGE 17 RD51 Collaboration meeting | Stony Brook University | October 2012
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DSM IRFU SEDI Commissariat à l’énergie atomique et aux énergies alternatives Centre de Saclay | 91191 Gif-sur-Yvette Cedex T. +33 (0)1 69 08 39 65 | F. +33 (0)1 69 08 56 69 Etablissement public à caractère industriel et commercial | RCS Paris B 775 685 019 | PAGE 18 RD51 Collaboration meeting | Stony Brook University | October 2012 Thank you !
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