1. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 1 The Ultimate Semiconductor Process and Machine Enhancement Tool Specific TadiGuard MRC-Eclipse Information TadiGuard

2. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 2 Typical TadiGuard Eclipse Real-time Alarms: Missing Index (No rotation, double–process) Skipped Index (Skipped station, no process) All stations: Pod Pressure (Throttle valves failure) All targets: Current, Voltage Base Pressure (Ion Gauges) Wafer handling Etch: Forward Power, Reflected Power, Bias Many more

3. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 3 Next, see typical TadiGuard Eclipse analysis screens TadiGuard’s most prominent contribution is its real-time watchdog features that cuts scrap, rework, maintenance, tests, test wafers, material, calibration, etc. With overall reduced Cost Of Ownership

4. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 4 Sput :1 typical Pod Pressure, Voltage, Current, Date, Time, Recipe, Lot#

5. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 5 Sput :2 typical Pod Pressure, Voltage, Current, Date, Time, Recipe, Lot#

6. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 6 Sput :3 typical Pod Pressure, Voltage, Current, Date, Time, Recipe, Lot#

7. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 7 Sput 1 Voltage / Current / Pod Press overlay (waterfall)

8. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 8 Sput 3 Voltage trend, SPC X-chart. Number of wafers: 9934

9. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 9 Sput 1 Volts, Current, Pod-Pressure X-Y-Z Correlation

10. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 10 Sput 1 Plasma Impedance calculated as V/I

11. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 11 Sput 3 voltage trend: Note target changes at pre-set voltage level. Number of wafers: 9934

12. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 12 Sput 1 Power, W, Lot#, Recipe over 12 Hours, 373 Wafers.

13. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 13 Sput 1 Current trend, 14796 wafers

14. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 14 Correlation graph of Sput1 #1 Volts Vs. Current (745 wafers).

15. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 15 Sput 1 Current and Voltage long-term (3 months) trend, with target changes.

16. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 16 Sput 2 Current and Voltage, Target change and 39 conditioning wafers

17. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 17 Sputter machine performance and capacity measurements: Average 33.491 wafers per hour.

18. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 18 Sputter Etch chamber pump-down curve.

19. Tadin for Process and Equipment Optimization May 2003Tadin Tal Advanced Instruments Ltd. www.tadin.com 19 Sputter Etch chamber measured pumping speed.