1. Buying a PEALD reactor for TaN deposition for Aalto University Buying a PEALD reactor for TaN deposition for Aalto University 9.3.2010

2. Outline TaN Market research Supplier Budget On-site arrangements

3. Steps of the process

4. Tantalum Nitride Applications –Diffusion barrier layers –Gate electrodes –Passivation layers –Protective coatings Deposition (ALD vs. PEALD) –Lower resistivity –Higher density –Higher purity –Safety Properties –Purity –Density –Resistivity –Stability –Adhesion

5. Oxford Instruments Oxford Instruments is a global company operating since 1959 with offices and manufacturing sites in over 25 locations. Oxford Instruments Head Office Tubney Woods, Abingdon, Oxfordshire, OX13 5QX, UK.

6. Picosun Picosun is an international equipment manufacturer with a world-wide sales and service organization. Has continuously designed ALD systems since 1975. Headquarter: Picosun Oy Tietotie 3 FI-02150 Espoo Finland

7. Beneq Beneq was established in May 2005 Activity is focused on equipment and technology for functional coatings Main office: Beneq Oy P.O. Box 262 FI-01511 Vantaa Finland

9. Supplier: Beneq Oy Close partnership Long experience with their equipement in our clean room Our old ALDs don’t have a standard PEALD option Easy communication Easy delivery = lower costs

10. Beneq TFS 200 for research Direct and remote PEALD Growth of various films possible Price 303,600 € for TaN growth

11. Budget TFS 200 system for TaN growth: 303,600 € Vacuum pump, other appliances and installation costs: 30 k€ Additional sources: 6900 – 18700 € each Operating costs: 20 k€ / year

12. On-site arrangements delivery installation testing trainings TaN processing HAPPY RESEARCHER