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Batch 12 wafer 7 summary comparison to baseline. N+ Sheet Resistance (  / ) Wide structure method, Target = 30  /

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Presentation on theme: "Batch 12 wafer 7 summary comparison to baseline. N+ Sheet Resistance (  / ) Wide structure method, Target = 30  /"— Presentation transcript:

1 batch 12 wafer 7 summary comparison to baseline

2 N+ Sheet Resistance (  / ) Wide structure method, Target = 30  /

3 N+ Sheet Resistance wafer map wafer flat

4 N+ sheet resistance statistics

5 P+ Sheet Resistance (  /) Wide structure method, Target = 39  /

6 P+ sheet resistance statistics

7 Poly Sheet Resistance (  /) Wide structure method, Target = 49  /

8 Poly Sheet Resistance wafer map wafer flat

9 Poly wide sheet resistance statistics

10 Poly CD Narrow #1 & #2 (  m) Target = 2  m

11 Poly CD statistics

12 Poly COMB leakage (A) Target = 1E-12 A

13 Poly COMB leakage statistics

14 Poly Serpentine Resistance (  ) Target = 166 k 

15 Poly serpentine resistance statistics

16 NMOS & PMOS Threshold Voltage (V) W=5  m, L=varying*

17 NMOS & PMOS Threshold Voltage (V) W=10  m, L=varying*

18 VT w=10, l=5um statistics

19 NMOS & PMOS Threshold Voltage (V) W=50  m, L=varying*

20 NMOS & PMOS Saturation Current (A) W=5  m, L=varying*, Log10 scale

21 NMOS & PMOS Saturation Current (A) W=10  m, L=varying*, Log10 scale

22 NMOS & PMOS Saturation Current (A) W=50  m, L=varying*, Log10 scale

23 NMOS & PMOS Off Current (A) W=5  m, L=varying*, Log10 scale

24 NMOS & PMOS Off Current (A) W=10  m, L=varying*, Log10 scale

25 NMOS & PMOS Off Current (A) W=50  m, L=varying*, Log10 scale

26 N+ Contact Resistance (  ) Target = 0.1 

27 N+ contact resistance statistics

28 N+ Contact Chain Resistance (  ) Target = 5k 

29 N+ contact chain resistance statistics

30 P+ Contact Resistance (  ) Target = 1 

31 P+ contact resistance statistics

32 P+ Contact Chain Resistance (  ) Target = 4 k 

33 P+ contact chain resistance statistics

34 Poly Contact Resistance (  ) Target = 0.1 

35 poly contact resistance statistics

36 Poly Contact Chain Resistance (  ) Target = 4.9 k 

37 poly contact chain resistance statistics

38 M1 COMB leakage (A) Target = 1E-12A

39 M1 COMB leakage statistics

40 M1 Serpentine Resistance (  ) Target = 85 

41 M1 Serpentine Resistance wafer map

42 M1 serpentine resistance statistics

43 M1 Van der Pauw Sheet Resistance (m  /) target = 56.7 m  / very high resistance

44 M1 sheet resistance statistics

45 M2 to M1 Via Resistance (  ) Target = 0.1  Batch 4 & 5 did not receive M2 processing

46 Via1 resistance statistics

47 M2 to M1 Via Chain Resistance (  ) Target = 19 

48 Via1 contact chain resistance statistics

49 M2 Van der Pauw Sheet Resistance (m  /) target = 42.5 m  / very high resistance batches 4 & 5 didn’t receive M2 processing

50 M2 sheet resistance statistics


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